van der Waals density functionals built upon the electron-gas tradition: facing the challenge of competing interactions.

Berland, Kristian; Arter, Calvin A; Cooper, Valentino R; Lee, Kyuho; Lundqvist, Bengt I; Schröder, Elsebeth; Thonhauser, T; Hyldgaard, Per

Berland, Kristian; Arter, Calvin A; Cooper, Valentino R; Lee, Kyuho; Lundqvist, Bengt I; Schröder, Elsebeth; Thonhauser, T; Hyldgaard, Per.

Afiliación

Berland K; Microtechnology and Nanoscience, MC2, Chalmers University of Technology, SE-412 96 Göteborg, Sweden.
Arter CA; Department of Physics, Wake Forest University, Winston-Salem, North Carolina 27109, USA.
Cooper VR; Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6114, USA.
Lee K; Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.
Lundqvist BI; Department of Applied Physics, Chalmers University of Technology, SE-412 96 Göteborg, Sweden.
Schröder E; Microtechnology and Nanoscience, MC2, Chalmers University of Technology, SE-412 96 Göteborg, Sweden.
Thonhauser T; Department of Physics, Wake Forest University, Winston-Salem, North Carolina 27109, USA.
Hyldgaard P; Microtechnology and Nanoscience, MC2, Chalmers University of Technology, SE-412 96 Göteborg, Sweden.

J Chem Phys ; 140(18): 18A539, 2014 May 14.

Article en En | MEDLINE | ID: mdl-24832347

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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: J Chem Phys Año: 2014 Tipo del documento: Article País de afiliación: Suecia

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