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Resistless EUV lithography: Photon-induced oxide patterning on silicon.
Tseng, Li-Ting; Karadan, Prajith; Kazazis, Dimitrios; Constantinou, Procopios C; Stock, Taylor J Z; Curson, Neil J; Schofield, Steven R; Muntwiler, Matthias; Aeppli, Gabriel; Ekinci, Yasin.
Afiliación
  • Tseng LT; Paul Scherrer Institute, 5232 Villigen PSI, Switzerland.
  • Karadan P; Paul Scherrer Institute, 5232 Villigen PSI, Switzerland.
  • Kazazis D; Paul Scherrer Institute, 5232 Villigen PSI, Switzerland.
  • Constantinou PC; Paul Scherrer Institute, 5232 Villigen PSI, Switzerland.
  • Stock TJZ; London Centre for Nanotechnology, University College London, London WC1H 0AH, UK.
  • Curson NJ; Department of Electronic and Electrical Engineering, University College London, London WC1E 7JE, UK.
  • Schofield SR; London Centre for Nanotechnology, University College London, London WC1H 0AH, UK.
  • Muntwiler M; Department of Electronic and Electrical Engineering, University College London, London WC1E 7JE, UK.
  • Aeppli G; London Centre for Nanotechnology, University College London, London WC1H 0AH, UK.
  • Ekinci Y; Department of Physics and Astronomy, University College London, London WC1E 6BT, UK.
Sci Adv ; 9(16): eadf5997, 2023 Apr 21.
Article en En | MEDLINE | ID: mdl-37075116
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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Sci Adv Año: 2023 Tipo del documento: Article País de afiliación: Suiza
Texto completo
Imprimir
XML
PubMed Links
Buscar en Google

Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Sci Adv Año: 2023 Tipo del documento: Article País de afiliación: Suiza