Atomic Resolution SE Imaging in a 30-200 keV Aberration-corrected UHV STEM.

Hotz, M T; Martis, J; Radlicka, T; Bacon, N J; Dellby, N; Lovejoy, T C; Quillin, S C; Hwang, H Y; Singh, P; Krivanek, O L

Hotz, M T; Martis, J; Radlicka, T; Bacon, N J; Dellby, N; Lovejoy, T C; Quillin, S C; Hwang, H Y; Singh, P; Krivanek, O L.

Afiliación

Hotz MT; Nion R&D, 11511 NE 118th St, Kirkland, WA, USA.
Martis J; Nion R&D, 11511 NE 118th St, Kirkland, WA, USA.
Radlicka T; Department of Mechanical Engineering, Stanford University, Stanford, CA, USA.
Bacon NJ; Institute of Scientific Instruments of CAS, Královopolská 147, Brno, Czech Republic.
Dellby N; Nion R&D, 11511 NE 118th St, Kirkland, WA, USA.
Lovejoy TC; Nion R&D, 11511 NE 118th St, Kirkland, WA, USA.
Quillin SC; Nion R&D, 11511 NE 118th St, Kirkland, WA, USA.
Hwang HY; Nion R&D, 11511 NE 118th St, Kirkland, WA, USA.
Singh P; Department of Applied Physics, Stanford University, Stanford, CA, USA.
Krivanek OL; Department of Applied Physics, Stanford University, Stanford, CA, USA.

Microsc Microanal ; 29(Supplement_1): 2064-2065, 2023 Jul 22.

Article en En | MEDLINE | ID: mdl-37612905

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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Microsc Microanal Año: 2023 Tipo del documento: Article País de afiliación: Estados Unidos

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