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Ultra-high-throughput Production of III-V/Si Wafer for Electronic and Photonic Applications.
Geum, Dae-Myeong; Park, Min-Su; Lim, Ju Young; Yang, Hyun-Duk; Song, Jin Dong; Kim, Chang Zoo; Yoon, Euijoon; Kim, SangHyeon; Choi, Won Jun.
Afiliación
  • Geum DM; Korea Institute of Science and Technology (KIST), Hwarangno 14-gil 5, Seongbuk-gu, Seoul, 136-791, Korea.
  • Park MS; Department of Materials Science and Engineering, Seoul National University, Gwanak-gu, Seoul, 151-742, Korea.
  • Lim JY; Korea Institute of Science and Technology (KIST), Hwarangno 14-gil 5, Seongbuk-gu, Seoul, 136-791, Korea.
  • Yang HD; Korea Photonics Technology Institute (KOPTI), Cheomdan venture-ro 108-gil 9, Buk-gu, Gwanju-si, 500-799, Korea.
  • Song JD; Korea Institute of Science and Technology (KIST), Hwarangno 14-gil 5, Seongbuk-gu, Seoul, 136-791, Korea.
  • Kim CZ; Korea Institute of Science and Technology (KIST), Hwarangno 14-gil 5, Seongbuk-gu, Seoul, 136-791, Korea.
  • Yoon E; Korea Advanced Nanofab Center (KANC), Gwanggyo-ro 109, Yeongtong-gu, Suwon-si, Gyeonggi-do, 443-270, Korea.
  • Kim S; Department of Materials Science and Engineering, Seoul National University, Gwanak-gu, Seoul, 151-742, Korea.
  • Choi WJ; Korea Institute of Science and Technology (KIST), Hwarangno 14-gil 5, Seongbuk-gu, Seoul, 136-791, Korea.
Sci Rep ; 6: 20610, 2016 Feb 11.
Article en En | MEDLINE | ID: mdl-26864968

Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: Sci Rep Año: 2016 Tipo del documento: Article

Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: Sci Rep Año: 2016 Tipo del documento: Article