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Engineering new limits to magnetostriction through metastability in iron-gallium alloys.
Meisenheimer, P B; Steinhardt, R A; Sung, S H; Williams, L D; Zhuang, S; Nowakowski, M E; Novakov, S; Torunbalci, M M; Prasad, B; Zollner, C J; Wang, Z; Dawley, N M; Schubert, J; Hunter, A H; Manipatruni, S; Nikonov, D E; Young, I A; Chen, L Q; Bokor, J; Bhave, S A; Ramesh, R; Hu, J-M; Kioupakis, E; Hovden, R; Schlom, D G; Heron, J T.
Afiliación
  • Meisenheimer PB; Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.
  • Steinhardt RA; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.
  • Sung SH; Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.
  • Williams LD; Department of Materials Design and Innovation, University at Buffalo - The State University of New York, Buffalo, NY, USA.
  • Zhuang S; Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, USA.
  • Nowakowski ME; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.
  • Novakov S; Department of Physics, University of Michigan, Ann Arbor, MI, USA.
  • Torunbalci MM; OxideMEMS Lab, Purdue University, West Lafayette, IN, USA.
  • Prasad B; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.
  • Zollner CJ; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.
  • Wang Z; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.
  • Dawley NM; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.
  • Schubert J; Peter Grünberg Institute (PGI-9) and JARA Fundamentals of Future Information Technology, Forschungszentrum Jülich GmbH, Jülich, Germany.
  • Hunter AH; Michigan Center for Materials Characterization, University of Michigan, Ann Arbor, MI, USA.
  • Manipatruni S; Components Research, Intel Corporation, Hillsboro, OR, USA.
  • Nikonov DE; Components Research, Intel Corporation, Hillsboro, OR, USA.
  • Young IA; Components Research, Intel Corporation, Hillsboro, OR, USA.
  • Chen LQ; Department of Materials Science and Engineering, Penn State University, State College, PA, USA.
  • Bokor J; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.
  • Bhave SA; OxideMEMS Lab, Purdue University, West Lafayette, IN, USA.
  • Ramesh R; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.
  • Hu JM; Materials Sciences Division, Lawrence Berkeley National Laboratory, CA, USA.
  • Kioupakis E; Department of Physics, University of California, Berkeley, CA, USA.
  • Hovden R; Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, USA.
  • Schlom DG; Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.
  • Heron JT; Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.
Nat Commun ; 12(1): 2757, 2021 May 12.
Article en En | MEDLINE | ID: mdl-33980848
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Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: Nat Commun Asunto de la revista: BIOLOGIA / CIENCIA Año: 2021 Tipo del documento: Article País de afiliación: Estados Unidos
Texto completo
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PubMed Links
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Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: Nat Commun Asunto de la revista: BIOLOGIA / CIENCIA Año: 2021 Tipo del documento: Article País de afiliación: Estados Unidos