Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography.

Wi, Seong Ju; Jang, Yong Ju; Kim, Haneul; Cho, Kyeongjae; Ahn, Jinho.

Afiliación

Wi SJ; Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Korea.
Jang YJ; EUV-IUCC (Industry University Cooperation Center), Hanuyang University, Seoul 04763, Korea.
Kim H; EUV-IUCC (Industry University Cooperation Center), Hanuyang University, Seoul 04763, Korea.
Cho K; Division of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Korea.
Ahn J; Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Korea.

Membranes (Basel) ; 12(4)2022 Mar 26.

Article en En | MEDLINE | ID: mdl-35448337