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Scaling and Confinement in Ultrathin Chalcogenide Films as Exemplified by GeTe.
Kerres, Peter; Zhou, Yiming; Vaishnav, Hetal; Raghuwanshi, Mohit; Wang, Jiangjing; Häser, Maria; Pohlmann, Marc; Cheng, Yudong; Schön, Carl-Friedrich; Jansen, Thomas; Bellin, Christophe; Bürgler, Daniel E; Jalil, Abdur Rehman; Ringkamp, Christoph; Kowalczyk, Hugo; Schneider, Claus M; Shukla, Abhay; Wuttig, Matthias.
Afiliación
  • Kerres P; I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany.
  • Zhou Y; I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany.
  • Vaishnav H; I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany.
  • Raghuwanshi M; Peter Grünberg Institute-JARA-Institute Energy-Efficient Information Technology (PGI-10), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany.
  • Wang J; I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany.
  • Häser M; Peter Grünberg Institute-JARA-Institute Energy-Efficient Information Technology (PGI-10), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany.
  • Pohlmann M; I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany.
  • Cheng Y; Center for Alloy Innovation and Design, Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, 710049, China.
  • Schön CF; I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany.
  • Jansen T; I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany.
  • Bellin C; I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany.
  • Bürgler DE; Center for Alloy Innovation and Design, Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, 710049, China.
  • Jalil AR; I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany.
  • Ringkamp C; Peter Grünberg Institute-Electronic Properties (PGI-6), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany.
  • Kowalczyk H; Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, Sorbonne Université, UMR CNRS 7590, MNHN, Paris, F-75005, France.
  • Schneider CM; Peter Grünberg Institute-Electronic Properties (PGI-6), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany.
  • Shukla A; Peter Grünberg Institute-Semiconductor Nanoelectronics (PGI-6), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany.
  • Wuttig M; Peter Grünberg Institute-Semiconductor Nanoelectronics (PGI-6), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany.
Small ; 18(21): e2201753, 2022 May.
Article en En | MEDLINE | ID: mdl-35491494
ABSTRACT
Chalcogenides such as GeTe, PbTe, Sb2 Te3 , and Bi2 Se3 are characterized by an unconventional combination of properties enabling a plethora of applications ranging from thermo-electrics to phase change materials, topological insulators, and photonic switches. Chalcogenides possess pronounced optical absorption, relatively low effective masses, reasonably high electron mobilities, soft bonds, large bond polarizabilities, and low thermal conductivities. These remarkable characteristics are linked to an unconventional bonding mechanism characterized by a competition between electron delocalization and electron localization. Confinement, that is, the reduction of the sample dimension as realized in thin films should alter this competition and modify chemical bonds and the resulting properties. Here, pronounced changes of optical and vibrational properties are demonstrated for crystalline films of GeTe, while amorphous films of GeTe show no similar thickness dependence. For crystalline films, this thickness dependence persists up to remarkably large thicknesses above 15 nm. X-ray diffraction and accompanying simulations employing density functional theory relate these changes to thickness dependent structural (Peierls) distortions, due to an increased electron localization between adjacent atoms upon reducing the film thickness. A thickness dependence and hence potential to modify film properties for all chalcogenide films with a similar bonding mechanism is expected.
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Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: Small Asunto de la revista: ENGENHARIA BIOMEDICA Año: 2022 Tipo del documento: Article País de afiliación: Alemania

Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: Small Asunto de la revista: ENGENHARIA BIOMEDICA Año: 2022 Tipo del documento: Article País de afiliación: Alemania