Dual-polarization pump rejection filter in silicon nitride technology.

On-chip pump rejection filters are key building blocks in a variety of applications exploiting nonlinear phenomena, including Raman spectroscopy and photon-pair generation. Ultrahigh rejection has been achieved in the silicon technology by non-coherent cascading of modal-engineered Bragg filters. However, this concept cannot be directly applied to silicon nitride waveguides as the comparatively lower index contrast hampers the suppression of residual light propagating in the orthogonal polarization, limiting the achievable rejection. Here, we propose and demonstrate a novel, to the best of our knowledge, strategy to overcome this limitation based on non-coherent cascading of the modal- and polarization-engineered Bragg filters. Based on this concept, we experimentally demonstrate a rejection exceeding 60 dB for both polarizations, with a bandwidth of 4.4 nm. This is the largest rejection reported for silicon nitride Bragg gratings supporting both polarizations.

Broadband behavior of quadratic metalenses with a wide field of view.

Metalenses are attracting a large interest for the implementation of complex optical functionalities in planar and compact devices. However, chromatic and off-axis aberrations remain standing challenges. Here, we experimentally investigate the broadband behavior of metalenses based on quadratic phase profiles. We show that these metalenses do not only guarantee an arbitrarily large field of view but are also inherently tolerant to longitudinal and transverse chromatic aberrations. As such, we demonstrate a single-layer, silicon metalens with a field of view of 86° and a bandwidth up to 140 nm operating at both 1300 nm and 1550 nm telecommunication wavelength bands.

Boosting the SiN nonlinear photonic platform with transition metal dichalcogenide monolayers.

In the past few years, we have witnessed increased interest in the use of 2D materials to produce hybrid photonic nonlinear waveguides. Although graphene has attracted most of the attention, other families of 2D materials such as transition metal dichalcogenides have also shown promising nonlinear performance. In this work, we propose a strategy for designing silicon nitride waveguiding structures with embedded MoS2 for nonlinear applications. The transverse geometry of the hybrid waveguide is optimized for high third-order nonlinear effects using optogeometrical engineering and multiple layers of MoS2. Stacking multiple monolayers results in an improvement of two orders of magnitude compared to standard silicon nitride waveguides. The hybrid waveguide performance is then investigated in terms of four-wave mixing enhancement in micro-ring resonator configurations. A signal/idler conversion efficiency of -6.3 dB is reached for a wavelength of around 1.55 µm with a 5 mW pumping level.

Strong pump rejection filter for polarization-diverse silicon platforms.

Integrated wavelength filters with high optical rejection are key components in several silicon photonics circuits, including quantum photon-pair sources and spectrometers. Non-coherent cascading of modal-engineered Bragg filters allows for remarkable optical rejections in structures that only support transverse-electric (TE) polarized modes such as uncladded 220-nm-thick silicon. However, the restriction to TE-only platforms limits the versatility of the non-coherent cascading approach. Here, we propose and experimentally demonstrate a new, to the best of our knowledge, approach for high-rejection filters in polarization-diverse platforms by combining non-coherent cascading of modal-engineered Bragg filters and anisotropy-engineered metamaterial bends. Bragg filters provide a high rejection of the TE mode, while the metamaterial bends remove any residual power propagating in the transverse-magnetic (TM) mode, without any penalty in terms of insertion loss or device footprint. Based on this strategy, we demonstrate optical rejection exceeding 60 dB in 300-nm-thick, cladded silicon waveguides.

Mid-infrared Fourier-transform spectrometer based on metamaterial lateral cladding suspended silicon waveguides.

Integrated mid-infrared micro-spectrometers have a great potential for applications in environmental monitoring and space exploration. Silicon-on-insulator (SOI) is a promising platform to tackle this integration challenge, owing to its unique capability for large volume and low-cost production of ultra-compact photonic circuits. However, the use of SOI in the mid-infrared is restricted by the strong absorption of the buried oxide layer for wavelengths beyond 4 µm. Here, we overcome this limitation by utilizing metamaterial-cladded suspended silicon waveguides to implement a spatial heterodyne Fourier-transform (SHFT) spectrometer operating at wavelengths near 5.5 µm. The metamaterial-cladded geometry allows removal of the buried oxide layer, yielding measured propagation loss below 2 dB/cm at wavelengths between 5.3 and 5.7 µm. The SHFT spectrometer comprises 19 Mach-Zehnder interferometers with a maximum arm length imbalance of 200 µm, achieving a measured spectral resolution of 13 cm-1 and a free spectral range of 100 cm-1 at wavelengths near 5.5 µm.

Silicon photonic on-chip spatial heterodyne Fourier transform spectrometer exploiting the Jacquinot's advantage.

Silicon photonics on-chip spectrometers are finding important applications in medical diagnostics, pollution monitoring, and astrophysics. Spatial heterodyne Fourier transform spectrometers (SHFTSs) provide a particularly interesting architecture with a powerful passive error correction capability and high spectral resolution. Despite having an intrinsically large optical throughput (étendue, also referred to as Jacquinot's advantage), state-of-the-art silicon SHFTSs have not exploited this advantage yet. Here, we propose and experimentally demonstrate for the first time, to the best of our knowledge, an SHFTS implementing a wide-area light collection system simultaneously feeding an array of 16 interferometers, with an input aperture as large as 90µm×60µm formed by a two-way-fed grating coupler. We experimentally demonstrate 85 pm spectral resolution, 600 pm bandwidth, and 13 dB étendue increase, compared with a device with a conventional grating coupler input. The SHFTS was fabricated using 193 nm deep-UV optical lithography and integrates a large-size input aperture with an interferometer array and monolithic Ge photodetectors, in a 4.5mm2 footprint.

Broadband Fourier-transform silicon nitride spectrometer with wide-area multiaperture input.

Integrated microspectrometers implemented in silicon photonic chips have gathered a great interest for diverse applications such as biological analysis, environmental monitoring, and remote sensing. These applications often demand high spectral resolution, broad operational bandwidth, and large optical throughput. Spatial heterodyne Fourier-transform (SHFT) spectrometers have been proposed to overcome the limited optical throughput of dispersive and speckle-based on-chip spectrometers. However, state-of-the-art SHFT spectrometers in near-infrared achieve large optical throughput only within a narrow operational bandwidth. Here we demonstrate for the first time, to the best of our knowledge, a broadband silicon nitride SHFT spectrometer with the largest light collecting multiaperture input (320×410µm2) ever implemented in an SHFT on-chip spectrometer. The device was fabricated using 248 nm deep-ultraviolet lithography, exhibiting over 13 dB of optical throughput improvement compared to a single-aperture device. The measured resolution varies between 29 and 49 pm within the 1260-1600 nm wavelength range.

Dual-band fiber-chip grating coupler in a 300 mm silicon-on-insulator platform and 193 nm deep-UV lithography.

Surface grating couplers are fundamental building blocks for coupling the light between optical fibers and integrated photonic devices. However, the operational bandwidth of conventional grating couplers is intrinsically limited by their wavelength-dependent radiation angle. The few dual-band grating couplers that have been experimentally demonstrated exhibit low coupling efficiencies and rely on complex fabrication processes. Here we demonstrate for the first time, to the best of our knowledge, the realization of an efficient dual-band grating coupler fabricated using 193 nm deep-ultraviolet lithography for 10 Gbit symmetric passive optical networks. The footprint of the device is 17×10µm2. We measured coupling efficiencies of -4.9 and -5.2dB with a 3-dB bandwidth of 27 and 56 nm at the wavelengths of 1270 and 1577 nm, corresponding to the upstream and downstream channels, respectively.

Erbium-doped hybrid waveguide amplifiers with net optical gain on a fully industrial 300 mm silicon nitride photonic platform.

Recently, erbium-doped integrated waveguide devices have been extensively studied as a CMOS-compatible and stable solution for optical amplification and lasing on the silicon photonic platform. However, erbium-doped waveguide technology still remains relatively immature when it comes to the production of competitive building blocks for the silicon photonics industry. Therefore, further progress is critical in this field to answer the industry's demand for infrared active materials that are not only CMOS-compatible and efficient, but also inexpensive and scalable in terms of large volume production. In this work, we present a novel and simple fabrication method to form cost-effective erbium-doped waveguide amplifiers on silicon. With a single and straightforward active layer deposition, we convert passive silicon nitride strip waveguide channels on a fully industrial 300 mm photonic platform into active waveguide amplifiers. We show net optical gain over sub-cm long waveguide channels that also include grating couplers and mode transition tapers, ultimately demonstrating tremendous progress in developing cost-effective active building blocks on the silicon photonic platform.

Subwavelength engineering for Brillouin gain optimization in silicon optomechanical waveguides.

Brillouin optomechanics has recently emerged as a promising tool to implement new functionalities in silicon photonics, including high-performance opto-RF processing and nonreciprocal light propagation. One key challenge in this field is to maximize the photon-phonon interaction and the phonon lifetime, simultaneously. Here, we propose a new, to the best of our knowledge, strategy that exploits subwavelength engineering of the photonic and phononic modes in silicon membrane waveguides to maximize the Brillouin gain. By properly designing the dimensions of the subwavelength periodic structuration, we tightly confine near-infrared photons and GHz phonons, minimizing leakage losses and maximizing the Brillouin coupling. Our theoretical analysis predicts a high mechanical quality factor of up to 700 and a remarkable Brillouin gain yielding 3500(W⋅m)-1 for minimum feature size of 50 nm, compatible with electron-beam lithography. We believe that the proposed waveguide with subwavelength nanostructure holds great potential for the engineering of Brillouin optomechanical interactions in silicon.

Polarization independent and temperature tolerant AWG based on a silicon nitride platform.

A polarization tolerant optical receiver is a key building block for the development of wavelength division multiplexing based high-speed optical data links. However, the design of a polarization independent demultiplexer is not trivial. In this Letter, we report on the realization of a polarization tolerant arrayed waveguide grating (AWG) on a 300-mm silicon nitride (SiN) photonic platform. By introducing a series of individual polarization rotators in the middle of the waveguide array, the polarization dependence of the AWG has been substantially reduced. Insertion losses below 2.2 dB and a crosstalk level better than -29dB has been obtained for transverse electric and transverse magnetic polarizations on a four-channel coarse AWG. The AWG temperature sensitivity has also been evaluated. Thanks to the low thermo-optical coefficient of SiN, a thermal shift below 12 pm/°C has been demonstrated.

Silicon subwavelength modal Bragg grating filters with narrow bandwidth and high optical rejection.

Waveguide Bragg grating filters with narrow bandwidths and high optical rejections are key functions for several advanced silicon photonics circuits. Here, we propose and demonstrate a new, to the best of our knowledge, Bragg grating geometry that provides a narrowband and high rejection response. It combines the advantages of subwavelength and modal engineering. As a proof-of-concept demonstration, we implement the proposed Bragg filters in 220-nm-thick Si technology with a single etch step. We experimentally show flexible control of the filter selectivity, with measured null-to-null bandwidths below 2 nm, and strength of 60 dB rejection with a null-to-null bandwidth of 1.8 nm.

Sub-decibel silicon grating couplers based on L-shaped waveguides and engineered subwavelength metamaterials.

The availability of low-loss optical interfaces to couple light between standard optical fibers and high-index-contrast silicon waveguides is essential for the development of chip-integrated nanophotonics. Input and output couplers based on diffraction gratings are attractive coupling solutions. Advanced grating coupler designs, with Bragg or metal mirror underneath, low- and high-index overlays, and multi-level or multi-layer layouts, have proven less useful due to customized or complex fabrication, however. In this work, we propose a rather simpler in design of efficient off-chip fiber couplers that provide a simulated efficiency up to 95% (-0.25 dB) at a wavelength of 1.55 µm. These grating couplers are formed with an L-shaped waveguide profile and synthesized subwavelength grating metamaterials. This concept jointly provides sufficient degrees of freedom to simultaneously control the grating directionality and out-radiated field profile of the grating mode. The proposed chip-to-fiber couplers promote robust sub-decibel coupling of light, yet contain device dimensions (> 120 nm) compatible with standard lithographic technologies presently available in silicon nanophotonic foundries. Fabrication imperfections are also investigated. Dimensional offsets of ± 15 nm in shallow-etch depth and ± 10 nm in linewidth's and mask misalignments are tolerated for a 1-dB loss penalty. The proposed concept is meant to be universal, which is an essential prerequisite for developing reliable and low-cost optical couplers. We foresee that the work on L-shaped grating couplers with sub-decibel coupling efficiencies could also be a valuable direction for silicon chip interfacing in integrated nanophotonics.

Engineering third-order optical nonlinearities in hybrid chalcogenide-on-silicon platform.

We demonstrated a class of highly nonlinear hybrid waveguide structures based on infiltration of As2S3 chalcogenide glass into silicon slot waveguides. The nonlinear properties of the hybrid waveguides were precisely quantified via a bidirectional top-hat D-scan method, enabling a direct comparison between properties measured using different device geometries. We experimentally demonstrate hybrid As2S3-Si slot waveguides with a two-photon absorption (TPA) figure of merit exceeding 2 at near infrared wavelengths. These waveguides largely satisfy the critical criterion for efficient nonlinear integrated photonics (FOMTPAwg>1), allowing phase shifts greater than π with minimal overall losses. These results pave the way for efficient and robust ultrafast all-optical devices and circuits in large-scale silicon photonics technology.

Dual-polarization silicon nitride Bragg filters with low thermal sensitivity.

Wideband and polarization-independent wavelength filters with low sensitivity to temperature variations have great potential for wavelength division multiplexing applications. However, simultaneously achieving these metrics is challenging for silicon-on-insulator photonics technology. Here, we harness the reduced index contrast and the low thermo-optic coefficient of silicon nitride to demonstrate waveguide Bragg grating filters with wideband apolar rejection and low thermal sensitivity. Filter birefringence is reduced by judicious design of a triangularly shaped lateral corrugation. Based on this approach, we demonstrate silicon nitride Bragg filters with a measured polarization-independent 40 dB optical rejection with negligible off-band excess loss, and a sensitivity to thermal variations below 20 pm/°C.

Subwavelength engineering and asymmetry: two efficient tools for sub-nanometer-bandwidth silicon Bragg filters.

Bragg filters stand as key building blocks of the silicon-on-insulator (SOI) photonics platform, allowing the implementation of advanced on-chip signal manipulation. However, achieving narrowband Bragg filters with large rejection levels is often hindered by fabrication constraints and imperfections. Here, we show that the combination of single-side corrugation asymmetry and subwavelength engineering provides a narrowband response with large corrugations, overcoming minimum feature size constraints of conventional Si Bragg filters. We comprehensively study the impact of the corrugation asymmetry in conventional and subwavelength single-etched SOI Bragg filters, showing their potential for bandwidth reduction. Finally, we experimentally demonstrate novel subwavelength geometry based on shifted corrugation teeth, achieving null-to-null bandwidths and rejections of 0.8 nm and 40 dB for the symmetric configuration and 0.6 nm and 15 dB for the asymmetric case.

Dispersion control of silicon nanophotonic waveguides using sub-wavelength grating metamaterials in near- and mid-IR wavelengths.

Controlling the group velocity dispersion of silicon nanophotonic waveguides has been recognized as a key ingredient to enhance the development of various on-chip optical applications. However, the strong wavelength dependence of the dispersion in waveguides implemented on the high index contrast silicon-on-insulator (SOI) platform substantially hinders their wideband operation, which in turn, limits their deployment. In this work, we exploit the potential of non-resonant sub-wavelength grating (SWG) nanostructures to perform a flexible and wideband control of dispersion in SOI waveguides. In particular, we demonstrated that the overall dispersion of the SWG-engineered metamaterial waveguides can be tailored across the transparency window of the SOI platform, keeping easy-to-handle single-etch step manufacturing. The SWG silicon waveguides overcladded by silicon nitride exhibit significant reduction of wavelength dependence of dispersion, yet providing intriguing and customizable synthesis of various attractive dispersion profiles. These include large normal up to low anomalous operation regimes, both of which could make a great promise for plethora of emerging applications in silicon photonics.

Integrated waveguide PIN photodiodes exploiting lateral Si/Ge/Si heterojunction.

Germanium photodetectors are considered to be mature components in the silicon photonics device library. They are critical for applications in sensing, communications, or optical interconnects. In this work, we report on design, fabrication, and experimental demonstration of an integrated waveguide PIN photodiode architecture that calls upon lateral double Silicon/Germanium/Silicon (Si/Ge/Si) heterojunctions. This photodiode configuration takes advantage of the compatibility with contact process steps of silicon modulators, yielding reduced fabrication complexity for transmitters and offering high-performance optical characteristics, viable for high-speed and efficient operation near 1.55 µm wavelengths. More specifically, we experimentally obtained at a reverse voltage of 1V a dark current lower than 10 nA, a responsivity higher than 1.1 A/W, and a 3 dB opto-electrical cut-off frequency over 50 GHz. The combined benefits of decreased process complexity and high-performance device operation pave the way towards attractive integration strategies to deploy cost-effective photonic transceivers on silicon-on-insulator substrates.

Silicon nanobeam cavity for ultra-localized light-matter interaction.

In this work, we theoretically and experimentally demonstrate an unusual air mode silicon nanobeam cavity design with dielectric mirrors. This design combines an extremely strong localization of light-matter interaction in the cavity center and a reduced sensitivity of the resonator wavelength to temperature or top cladding material refractive index variations. The proposed approach allows accurate control of the resonator cavity quality factor combined with flexible choice of the cavity effective mode volume. Q-factors higher than 50,000 have been determined for such cavities and mode volumes smaller than (λ/n)3 were achieved in the investigated configurations. Such a cavity design provides a robust approach to study the hybrid integration of various active materials in the silicon platform, including carbon nanotubes, III-V nanowires, graphene, etc., for light emission, modulation, or detection.

Optical pump-rejection filter based on silicon sub-wavelength engineered photonic structures.

The high index contrast of the silicon-on-insulator (SOI) platform allows the realization of ultra-compact photonic circuits. However, this high contrast hinders the implementation of narrow-band Bragg filters. These typically require corrugation widths of a few nanometers or double-etch geometries, hampering device fabrication. Here we report, for the first time, to the best of our knowledge, on the realization of SOI Bragg filters based on sub-wavelength index engineering in a differential corrugation width configuration. The proposed double periodicity structure allows narrow-band rejection with a single etch step and relaxed width constraints. Based on this concept, we experimentally demonstrate a single-etch, 220 nm thick, Si Bragg filter featuring a corrugation width of 150 nm, a rejection bandwidth of 1.1 nm, and an extinction ratio exceeding 40 dB. This represents a 10-fold width increase, compared to conventional single-periodicity, single-etch counterparts with similar bandwidths.