Morphology-Controlled Reststrahlen Band and Infrared Plasmon Polariton in GaN Nanostructures.

Due to ultrabright and stable blue light emission, GaN has emerged as one of the most famous semiconductors of the modern era, useful for light-emitting diodes, power electronics, and optoelectronic applications. Extending GaN's optical resonance from visible to mid- and-far-infrared spectral ranges will enable novel applications in many emerging technologies. Here we show hexagonal honeycomb-shaped GaN nanowall networks and vertically standing nanorods exhibiting morphology-dependent Reststrahlen band and plasmon polaritons that could be harnessed for infrared nanophotonics. Surface-induced dipoles at the edges and asperities in molecular beam epitaxy-deposited nanostructures lead to phonon absorption inside the Reststrahlen band, altering its shape from rectangular to right-trapezoidal. Excitation of such surface polariton modes provides a novel pathway to achieve far-infrared optical resonance in GaN. Additionally, surface defects in nanostructures lead to high carrier concentrations, resulting in tunable mid-infrared plasmon polaritons with high-quality factors. Demonstration of morphology-controlled Reststrahlen band and plasmon polaritons make GaN nanostructures attractive for infrared nanophotonics.

Polar Semiconducting Scandium Nitride as an Infrared Plasmon and Phonon-Polaritonic Material.

The interaction of light with collective charge oscillations, called plasmon-polariton, and with polar lattice vibrations, called phonon-polariton, are essential for confining light at deep subwavelength dimensions and achieving strong resonances. Traditionally, doped-semiconductors and conducting metal oxides (CMO) are used to achieve plasmon-polaritons in the near-to-mid infrared (IR), while polar dielectrics are utilized for realizing phonon-polaritons in the long-wavelength IR (LWIR) spectral regions. However, demonstrating low-loss plasmon- and phonon-polaritons in one host material will make it attractive for practical applications. Here, we demonstrate high-quality tunable short-wavelength IR (SWIR) plasmon-polariton and LWIR phonon-polariton in complementary metal-oxide-semiconductor compatible group III-V polar semiconducting scandium nitride (ScN) thin films. We achieve both resonances by utilizing n-type (oxygen) and p-type (magnesium) doping in ScN that allows modulation of carrier concentration from 5 × 1018 to 1.6 × 1021 cm-3. Our work enables infrared nanophotonics with an epitaxial group III semiconducting nitride, opening the possibility for practical applications.

Refractory Plasmonic Hafnium Nitride and Zirconium Nitride Thin Films as Alternatives to Silver for Solar Mirror Applications.

Harnessing solar energy by employing concentrated solar power (CSP) systems requires materials with high electrical conductivity and optical reflectivity. Silver, with its excellent optical reflectance, is traditionally used as a reflective layer in solar mirrors for CSP technologies. However, silver is soft and expensive, quickly tarnishes, and requires a protective layer of glass for practical applications. Moreover, supply-side constraints and high-temperature instability of silver have led to the search for alternative materials that exhibit high solar and infrared reflectance. Transition metal nitrides, such as titanium nitride, have emerged as alternative plasmonic materials to gold starting from a spectral range of ∼500 nm. However, to achieve high solar reflection (∼320-2500 nm), materials with epsilon-near-zero starting from the near-ultraviolet (UV) spectral region are required. Here, we show the development of refractory epitaxial hafnium nitride (HfN) and zirconium nitride (ZrN) thin films as excellent mirrors with a solar reflectivity of ∼90.3% and an infrared reflectivity of ∼95%. Low-loss and high-quality epsilon-near-zero resonance at near-UV (∼340-380 nm) spectral regions are achieved in HfN and ZrN by carefully controlling the stoichiometry, leading to a sharp increase in the reflection edge that is on par with silver. Temperature-dependent reflectivity and dielectric constants are further measured to demonstrate their high-temperature suitability. The development of refractory epitaxial HfN and ZrN thin films with high solar and infrared reflectance makes them excellent alternative plasmonic materials to silver and would pave their applications in CSP, daytime radiative cooling, and others.