Photonic ADC: overcoming the bottleneck of electronic jitter.

Accurate conversion of wideband multi-GHz analog signals into the digital domain has long been a target of analog-to-digital converter (ADC) developers, driven by applications in radar systems, software radio, medical imaging, and communication systems. Aperture jitter has been a major bottleneck on the way towards higher speeds and better accuracy. Photonic ADCs, which perform sampling using ultra-stable optical pulse trains generated by mode-locked lasers, have been investigated for many years as a promising approach to overcome the jitter problem and bring ADC performance to new levels. This work demonstrates that the photonic approach can deliver on its promise by digitizing a 41 GHz signal with 7.0 effective bits using a photonic ADC built from discrete components. This accuracy corresponds to a timing jitter of 15 fs - a 4-5 times improvement over the performance of the best electronic ADCs which exist today. On the way towards an integrated photonic ADC, a silicon photonic chip with core photonic components was fabricated and used to digitize a 10 GHz signal with 3.5 effective bits. In these experiments, two wavelength channels were implemented, providing the overall sampling rate of 2.1 GSa/s. To show that photonic ADCs with larger channel counts are possible, a dual 20-channel silicon filter bank has been demonstrated.

Three-dimensional photonic crystals by large-area membrane stacking.

We designed and analyzed a "mesh-stack" three-dimensional photonic crystal of a 12.4% bandgap with a dielectric constant ratio of 12 : 1. The mesh-stack consists of four offset identical square-lattice air-hole patterned membranes in each vertical period that is equal to the in-plane period of the square lattice. This design is fully compatible with the membrane-stacking fabrication method, which is based on alignment and stacking of large-area single-crystal membranes containing engineered defects. A bandgap greater than 10% is preserved as long as the membranes are subjected to in-plane misalignment less than 3% of the square period. By introducing a linear defect with a nonsymmorphic symmetry into the mesh-stack, we achieved a single-mode waveguide over a wide bandwidth.

Reconfigurable multi-channel second-order silicon microring-resonator filterbanks for on-chip WDM systems.

We report the fabrication of a reconfigurable wide-band twenty-channel second-order dual filterbank, defined on a silicon-on-insulator (SOI) platform, with tunable channel spacing and 20 GHz single-channel bandwidth. We demonstrate the precise tuning of eleven (out of the twenty) channels, with a channel spacing of 124 GHz (~1 nm) and crosstalk between channels of about -45 dB. The effective thermo-optic tuning efficiency is about 27 µW/GHz/ring. A single channel of a twenty-channel counter-propagating filterbank is also demonstrated, showing that both propagating modes exhibit identical filter responses. Considerations about thermal crosstalk are also presented. These filterbanks are suitable for on-chip wavelength-division-multiplexing applications, and have the largest-to-date reported number of channels built on an SOI platform.

Nanophotonic integration in state-of-the-art CMOS foundries.

We demonstrate a monolithic photonic integration platform that leverages the existing state-of-the-art CMOS foundry infrastructure. In our approach, proven XeF2 post-processing technology and compliance with electronic foundry process flows eliminate the need for specialized substrates or wafer bonding. This approach enables intimate integration of large numbers of nanophotonic devices alongside high-density, high-performance transistors at low initial and incremental cost. We demonstrate this platform by presenting grating-coupled, microring-resonator filter banks fabricated in an unmodified 28 nm bulk-CMOS process by sharing a mask set with standard electronic projects. The lithographic fidelity of this process enables the high-throughput fabrication of second-order, wavelength-division-multiplexing (WDM) filter banks that achieve low insertion loss without post-fabrication trimming.

A three-dimensional optical photonic crystal with designed point defects.

Photonic crystals offer unprecedented opportunities for miniaturization and integration of optical devices. They also exhibit a variety of new physical phenomena, including suppression or enhancement of spontaneous emission, low-threshold lasing, and quantum information processing. Various techniques for the fabrication of three-dimensional (3D) photonic crystals--such as silicon micromachining, wafer fusion bonding, holographic lithography, self-assembly, angled-etching, micromanipulation, glancing-angle deposition and auto-cloning--have been proposed and demonstrated with different levels of success. However, a critical step towards the fabrication of functional 3D devices, that is, the incorporation of microcavities or waveguides in a controllable way, has not been achieved at optical wavelengths. Here we present the fabrication of 3D photonic crystals that are particularly suited for optical device integration using a lithographic layer-by-layer approach. Point-defect microcavities are introduced during the fabrication process and optical measurements show they have resonant signatures around telecommunications wavelengths (1.3-1.5 microm). Measurements of reflectance and transmittance at near-infrared are in good agreement with numerical simulations.

Device architecture and precision nanofabrication of microring-resonator filter banks for integrated photonic systems.

To achieve the maximum benefit of electronic-photonic integrated circuits wavelength-division multiplexing must be used. This requires the design and fabrication of a highly integratable photonic device, capable of performing multiplexing/demultiplexing operations with low loss and minimal crosstalk. A filter bank consisting of high-index-contrast microring-resonator filters, with accurately spaced resonant frequencies can meet these requirements. This paper describes the basic architecture of microring-resonator filter banks, and how to maximize performance while keeping fabrication challenges reasonable. The greatest challenge in fabricating such devices is achieving the dimensional precision, on the scale of tens of picometers, needed to attain accurately spaced resonant frequencies. To do this, a fabrication method based on varying the electron-beam dose during scanning-electron beam lithography is used. This approach is used to create a dual twenty-channel filter bank, comprised of second-order silicon-rich silicon nitride microring resonators. The average resonant frequency spacing is off from the target spacing by only 3 GHz, corresponding to a dimensional precision of 75 pm. This approach is also shown to be compatible with the fabrication process for silicon microring resonators. Furthermore, it is shown that any remaining resonant frequency errors can be corrected with postfabrication thermal tuning. Also, a method of using the contra-propagating mode of a microring-resonator filter is demonstrated, enabling a single filter bank to multiplex/demultiplex two signals at the same time.

Accurate frequency alignment in fabrication of high-order microring-resonator filters.

Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6 GHz to 0.28 GHz.

Reduction of focal-spot size using dichromats in absorbance modulation.

We experimentally verify the focusing characteristics of dichromats, a new class of circular-symmetric diffractive-optical lenses that generate, in the same focal plane, focal spots for one wavelength and ring-shaped spots with central nodes for another wavelength. Using a dichromat, we illuminate a thin photochromic layer and demonstrated point-spread-function compression of the transmitted focal spot.

Synthesis of silicon nanowires and nanofin arrays using interference lithography and catalytic etching.

We report results on the synthesis of silicon nanostructures that were fabricated using a combination of interference lithography and catalytic etching. With this technique, we were able to create nanostructures that are perfectly periodic over very large areas (1 cm(2) or more), where the cross-sectional shapes and the array ordering can be varied. Furthermore this technique can readily and independently control the sizes and spacings of the nanostructures down to spacings of 200 nm or less. These characteristics cannot be achieved using other known techniques.

Absorbance-modulation optical lithography.

We describe a new mode of optical lithography called absorbance-modulation optical lithography (AMOL) in which a thin film of photochromic material is placed on top of a conventional photoresist and illuminated simultaneously by a focal spot of wavelength lambda1 and a ring-shaped illumination of wavelength lambda2. The lambda1 radiation converts the photochromic material from an opaque to a transparent configuration, thereby enabling exposure of the photoresist, while the lambda2 radiation reverses the transformation. As a result of these competing effects, the point-spread function that exposes the resist is strongly compressed, resulting in higher photolithographic resolution and information density. We show by modeling that the point-spread-function compression achieved via AMOL depends only on the absorbance distribution in the photostationary state. In this respect, absorbance modulation represents an optical nonlinearity that depends on the intensity ratio of lambda1 and lambda2 and not on the absolute intensity of either one alone. By inserting material parameters into the model, a lithographic resolution corresponding to lambda1/13 is predicted.

Experimental characterization of focusing by high-numerical-aperture zone plates.

High-numerical-aperture zone plates have important applications in high-resolution optical maskless lithography as well as scanning confocal microscopy. We describe two methods to experimentally characterize the focusing properties, i.e., the point-spread function, of such diffractive lenses. The first method uses spot exposures in photoresist and the second uses a conventional knife-edge scan. The experimental results agree well with rigorous theoretical calculations.

Ultrawide tuning of photonic microcavities via evanescent field perturbation.

Evanescent field perturbation of an integrated microring resonator is examined as a means of achieving high-fidelity reversible tuning of photonic microcavities over large wavelength ranges. A 1.7% wavelength tuning is achieved through the use of a novel silica fiber probe that provides access to the evanescent field of an air-clad high-index-contrast ring resonator. As the microring is perturbed, the probe-ring distance is found through simultaneous nanometric distance calibration and force measurements. Experimental results agree well with theoretical tuning. Possible microelectromechanical systems implementation of this effect is discussed, as well as avenues for improvement of the tuning range.

Multistage high-order microring-resonator add-drop filters.

We propose and demonstrate a multistage design for microphotonic add-drop filters that provides reduced drop-port loss and relaxed tolerances for achieving high in-band extinction. As a result, the first microring-resonator filters with a rectangular notch stopband in the through port (to our knowledge) are shown, with extinctions exceeding 50 dB. Reaching 30 dB beyond previous results, without postfabrication trimming, such extinction levels open the door to microphotonic notch circuits for spectroscopy, wavelength conversion, and quantum cryptography applications. Combined with a low-loss, high-index-contrast electromagnetic design in SiN and frequency-matched microring resonators, this approach led to the first demonstration of flattop microphotonic filters meeting the stringent criteria for high-spectral-efficiency integrated add-drop multiplexers. The 40 GHz wide filters show a 20 nm free spectral range, 2 dB drop loss, and suppression of adjacent channels by over 30 dB.

Photon-sieve lithography.

We present the first lithography results that use high-numerical-aperture photon sieves as focusing elements in a scanning-optical-beam-lithography system [J. Vac. Sci. Technol. B 21, 2810 (2003)]. Photon sieves are novel optical elements that offer the advantages of higher resolution and improved image contrast compared with traditional diffractive optics such as zone plates [Nature 414, 184 (2001)]. We fabricated the highest-numerical-aperture photon sieves reported to date and experimentally verified their focusing characteristics. We propose two new designs of the photon sieve that have the potential to significantly increase focusing efficiency.

High resolution printing of DNA feature on poly(methyl methacrylate) substrates using supramolecular nano-stamping.

In recent years, a large number of devices based on organic and biological materials have been developed. To scale-up the production of these systems to industrially acceptable standards, there is a need to develop soft-material stamping approaches with the needed resolution, complexity, and versatility. We have recently developed a DNA-based stamping method (supramolecular nano-stamping, SuNS) that has superior resolution and can print multiple molecules at the same time. A similar technique was independently developed by Crooks and co-workers. Here we show that SuNS can be used to efficiently print DNA features on a polymeric substrate (poly(methyl methacrylate), PMMA) with a 40 nm point resolution and a coverage that exceeds 100 mum2. The stamped PMMA substrate was also used as a master to print on a gold substrate. With PMMA being optically clear and electrically insulating, future applications of SuNS to print DNA micro- and nanoarrays are envisioned.

Supramolecular nanostamping: using DNA as movable type.

Here we present a novel printing technique (that we call supramolecular nanostamping), based on the replication of single-stranded DNA features through a hybridization-contact-dehybridization cycle. On a surface containing features each made of single-stranded DNA molecules of known sequence, the complementary DNA molecules are hybridized, spontaneously assembling onto the original pattern due to sequence-specific interactions. These complementary DNA strands, on the end that is assembled far from the original surface, are 5' modified with chemical groups ("sticky ends") that can form bonds with a target surface that is brought into contact. Heating induces dehybridization between DNA strands, leaving the original pattern on the original surface and the copied pattern on the secondary substrate, and thus stamping (see Figure 1). Molecular recognition provides the unique and disruptive ability of transferring large amounts of information in a single printing cycle, that is the simultaneous stamping of spatial information (i.e., the patterns) and of chemical information (i.e., the features' DNA sequence--their chemical composition). This method combines high resolution (<40 nm) with the advantage of an exponential increase in the number of masters; in fact, any printed substrate can be reused as a master. Patterns fabricated via very different lithographic techniques can be replicated.