Alloyed 2D Metal-Semiconductor Atomic Layer Junctions.

Kim, Ah Ra; Kim, Yonghun; Nam, Jaewook; Chung, Hee-Suk; Kim, Dong Jae; Kwon, Jung-Dae; Park, Sang Won; Park, Jucheol; Choi, Sun Young; Lee, Byoung Hun; Park, Ji Hyeon; Lee, Kyu Hwan; Kim, Dong-Ho; Choi, Sung Mook; Ajayan, Pulickel M; Hahm, Myung Gwan; Cho, Byungjin

Kim, Ah Ra; Kim, Yonghun; Nam, Jaewook; Chung, Hee-Suk; Kim, Dong Jae; Kwon, Jung-Dae; Park, Sang Won; Park, Jucheol; Choi, Sun Young; Lee, Byoung Hun; Park, Ji Hyeon; Lee, Kyu Hwan; Kim, Dong-Ho; Choi, Sung Mook; Ajayan, Pulickel M; Hahm, Myung Gwan; Cho, Byungjin.

Afiliação

Kim AR; Department of Advanced Functional Thin Films, Surface Technology Division, Korea Institute of Materials Science , 797 Changwondaero, Sungsan-Gu, Changwon, Gyeongnam 51508, Republic of Korea.
Kim Y; Department of Advanced Functional Thin Films, Surface Technology Division, Korea Institute of Materials Science , 797 Changwondaero, Sungsan-Gu, Changwon, Gyeongnam 51508, Republic of Korea.
Nam J; School of Materials Science and Engineering, Gwanju Institute of Science and Technology (GIST) , 261 Cheomdan-gwangiro, Buk-Gu, Gwangju 61005, Republic of Korea.
Chung HS; School of Chemical Engineering, Sungkyunkwan University , 300 Cheongcheon-dong, Suwon, Gyeonggi-do 16419, Republic of Korea.
Kim DJ; Jeonju Center, Korea Basic Science Institute , Jeonju, Jeollabuk-do 54907, Republic of Korea.
Kwon JD; School of Chemical Engineering, Sungkyunkwan University , 300 Cheongcheon-dong, Suwon, Gyeonggi-do 16419, Republic of Korea.
Park SW; Department of Advanced Functional Thin Films, Surface Technology Division, Korea Institute of Materials Science , 797 Changwondaero, Sungsan-Gu, Changwon, Gyeongnam 51508, Republic of Korea.
Park J; Department of Advanced Functional Thin Films, Surface Technology Division, Korea Institute of Materials Science , 797 Changwondaero, Sungsan-Gu, Changwon, Gyeongnam 51508, Republic of Korea.
Choi SY; Structure Analysis Group, Gyeongbuk Science & Technology Promotion Center, Future Strategy Research Institute , 17 Cheomdangieop 1-ro, Sangdong-myeon, Gumi, Gyeongbuk 39171, Republic of Korea.
Lee BH; Department of Advanced Functional Thin Films, Surface Technology Division, Korea Institute of Materials Science , 797 Changwondaero, Sungsan-Gu, Changwon, Gyeongnam 51508, Republic of Korea.
Park JH; School of Materials Science and Engineering, Gwanju Institute of Science and Technology (GIST) , 261 Cheomdan-gwangiro, Buk-Gu, Gwangju 61005, Republic of Korea.
Lee KH; Department of Electricity and Electronic Engineering, University of Ulsan , 93 Daehak-ro, Nam-gu, Ulsan 44610, Republic of Korea.
Kim DH; Electrochemistry Department, Surface Technology Division, Korea Institute of Materials Science (KIMS) , 797 Changwondaero, Sungsan-gu, Changwon, Gyeongnam 51508, Republic of Korea.
Choi SM; Department of Advanced Functional Thin Films, Surface Technology Division, Korea Institute of Materials Science , 797 Changwondaero, Sungsan-Gu, Changwon, Gyeongnam 51508, Republic of Korea.
Ajayan PM; Electrochemistry Department, Surface Technology Division, Korea Institute of Materials Science (KIMS) , 797 Changwondaero, Sungsan-gu, Changwon, Gyeongnam 51508, Republic of Korea.
Hahm MG; Department of Materials Science and NanoEngineering, Rice University , 6100 Main Street, Houston, Texas 77005, United States .
Cho B; School of Materials Science and Engineering, Inha University , 100 Inharo, Nam-Gu, Incheon 22212, Republic of Korea.