The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin-Film Transistors Deposited via Atomic Layer Deposition.

Ding, Xingwei; Qin, Cunping; Song, Jiantao; Zhang, Jianhua; Jiang, Xueyin; Zhang, Zhilin.

Afiliação

Ding X; Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, 149 Yanchang Road, Jingan District, Shanghai, 200070, People's Republic of China.
Qin C; School of Mechatronics and Automation, Shanghai University, Shanghai, 200072, China.
Song J; School of Mechatronics and Automation, Shanghai University, Shanghai, 200072, China.
Zhang J; Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, 149 Yanchang Road, Jingan District, Shanghai, 200070, People's Republic of China.
Jiang X; Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, 149 Yanchang Road, Jingan District, Shanghai, 200070, People's Republic of China. dxw1026@126.com.
Zhang Z; School of Mechatronics and Automation, Shanghai University, Shanghai, 200072, China. dxw1026@126.com.

Nanoscale Res Lett ; 12(1): 63, 2017 Dec.

Article em En | MEDLINE | ID: mdl-28116611

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2017 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2017 Tipo de documento: Article