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Patternable Mesoporous Thin Film Quantum Materials via Block Copolymer Self-Assembly: An Emergent Technology?
Yu, Fei; Thedford, R Paxton; Hedderick, Konrad R; Freychet, Guillaume; Zhernenkov, Mikhail; Estroff, Lara A; Nowack, Katja C; Gruner, Sol M; Wiesner, Ulrich B.
Afiliação
  • Yu F; Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, United States.
  • Thedford RP; Department of Chemistry and Chemical Biology, Cornell University, Ithaca, New York 14853, United States.
  • Hedderick KR; Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, United States.
  • Freychet G; Robert Frederick Smith School of Chemical and Biomolecular Engineering, Cornell University, Ithaca, New York 14853, United States.
  • Zhernenkov M; Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, United States.
  • Estroff LA; National Synchrotron Light Source-II, Brookhaven National Laboratory, Upton, New York 11973, United States.
  • Nowack KC; National Synchrotron Light Source-II, Brookhaven National Laboratory, Upton, New York 11973, United States.
  • Gruner SM; Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, United States.
  • Wiesner UB; Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853, United States.
ACS Appl Mater Interfaces ; 13(29): 34732-34741, 2021 Jul 28.
Article em En | MEDLINE | ID: mdl-34279895
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article País de afiliação: Estados Unidos
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article País de afiliação: Estados Unidos