Chemical vapor deposition merges MoS<sub>2</sub> grains into high-quality and centimeter-scale films on Si/SiO<sub>2</sub>.

Chemical vapor deposition merges MoS₂ grains into high-quality and centimeter-scale films on Si/SiO₂.

Singh, Mukesh; Ghosh, Rapti; Chen, Yu-Siang; Yen, Zhi-Long; Hofmann, Mario; Chen, Yang-Fang; Hsieh, Ya-Ping.

Afiliação

Singh M; Department of Physics, National Taiwan University Taipei 106 Taiwan.
Ghosh R; Department of Physics, National Central University Chung Li 320 Taiwan.
Chen YS; Institute of Atomic and Molecular Sciences, Academia Sinica Taipei 115 Taiwan yphsieh@gate.sinica.edu.tw.
Yen ZL; Molecular Science and Technology, Taiwan International Graduate Program, Academia Sinica Taipei 115 Taiwan.
Hofmann M; Institute of Atomic and Molecular Sciences, Academia Sinica Taipei 115 Taiwan yphsieh@gate.sinica.edu.tw.
Chen YF; Department of Physics, National Taiwan University Taipei 106 Taiwan.
Hsieh YP; Department of Physics, National Taiwan University Taipei 106 Taiwan.

RSC Adv ; 12(10): 5990-5996, 2022 Feb 16.

Article em En | MEDLINE | ID: mdl-35424587

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article