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Antisymmetric planar Hall effect in rutile oxide films induced by the Lorentz force.
Cui, Yongwei; Li, Zhaoqing; Chen, Haoran; Wu, Yunzhuo; Chen, Yue; Pei, Ke; Wu, Tong; Xie, Nian; Che, Renchao; Qiu, Xuepeng; Liu, Yi; Yuan, Zhe; Wu, Yizheng.
Afiliação
  • Cui Y; Department of Physics, State Key Laboratory of Surface Physics, Fudan University, Shanghai 200433, China.
  • Li Z; Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China; Interdisciplinary Center for Theoretical Physics and Information Sciences, Fudan University, Shanghai 200433, China.
  • Chen H; Department of Physics, State Key Laboratory of Surface Physics, Fudan University, Shanghai 200433, China.
  • Wu Y; Department of Physics, State Key Laboratory of Surface Physics, Fudan University, Shanghai 200433, China.
  • Chen Y; Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China; Interdisciplinary Center for Theoretical Physics and Information Sciences, Fudan University, Shanghai 200433, China; Center for Advanced Quantum Studies and Department of Physics, Beijing Normal Uni
  • Pei K; Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai 200438, China.
  • Wu T; Department of Physics, State Key Laboratory of Surface Physics, Fudan University, Shanghai 200433, China.
  • Xie N; Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China.
  • Che R; Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai 200438, China; Zhejiang Laboratory, Hangzhou 311100, China.
  • Qiu X; Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China.
  • Liu Y; Center for Advanced Quantum Studies and Department of Physics, Beijing Normal University, Beijing 100875, China.
  • Yuan Z; Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China; Interdisciplinary Center for Theoretical Physics and Information Sciences, Fudan University, Shanghai 200433, China. Electronic address: yuanz@fudan.edu.cn.
  • Wu Y; Department of Physics, State Key Laboratory of Surface Physics, Fudan University, Shanghai 200433, China; Shanghai Research Center for Quantum Sciences, Shanghai 201315, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China. Electronic addres
Sci Bull (Beijing) ; 69(15): 2362-2369, 2024 Aug 15.
Article em En | MEDLINE | ID: mdl-38944633
ABSTRACT
The conventional Hall effect is linearly proportional to the field component or magnetization component perpendicular to a film. Despite the increasing theoretical proposals on the Hall effect to the in-plane field or magnetization in various special systems induced by the Berry curvature, such an unconventional Hall effect has only been experimentally reported in Weyl semimetals and in a heterodimensional superlattice. Here, we report an unambiguous experimental observation of the antisymmetric planar Hall effect (APHE) with respect to the in-plane magnetic field in centrosymmetric rutile RuO2 and IrO2 single-crystal films. The measured Hall resistivity is found to be linearly proportional to the component of the applied in-plane magnetic field along a particular crystal axis and to be independent of the current direction or temperature. Both the experimental observations and theoretical calculations confirm that the APHE in rutile oxide films is induced by the Lorentz force. Our findings can be generalized to ferromagnetic materials for the discovery of anomalous Hall effects and quantum anomalous Hall effects induced by in-plane magnetization. In addition to significantly expanding knowledge of the Hall effect, this work opens the door to explore new members in the Hall effect family.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article País de afiliação: China

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article País de afiliação: China