A Review: Laser Interference Lithography for Diffraction Gratings and Their Applications in Encoders and Spectrometers.

The unique diffractive properties of gratings have made them essential in a wide range of applications, including spectral analysis, precision measurement, optical data storage, laser technology, and biomedical imaging. With advancements in micro- and nanotechnologies, the demand for more precise and efficient grating fabrication has increased. This review discusses the latest advancements in grating manufacturing techniques, particularly highlighting laser interference lithography, which excels in sub-beam generation through wavefront and amplitude division. Techniques such as Lloyd's mirror configurations produce stable interference fringe fields for grating patterning in a single exposure. Orthogonal and non-orthogonal, two-axis Lloyd's mirror interferometers have advanced the fabrication of two-dimensional gratings and large-area gratings, respectively, while laser interference combined with concave lenses enables the creation of concave gratings. Grating interferometry, utilizing optical interference principles, allows for highly precise measurements of minute displacements at the nanometer to sub-nanometer scale. This review also examines the application of grating interferometry in high-precision, absolute, and multi-degree-of-freedom measurement systems. Progress in grating fabrication has significantly advanced spectrometer technology, with integrated structures such as concave gratings, Fresnel gratings, and grating-microlens arrays driving the miniaturization of spectrometers and expanding their use in compact analytical instruments.

A Review: High-Precision Angle Measurement Technologies.

Angle measurement is an essential component of precision measurement and serves as a crucial prerequisite for high-end manufacturing. It guides the implementation of precision manufacturing and assembly. The current angle measurement methods mainly focus on multiple axes, high precision, and large measurement ranges. This article introduces the technology of angle measurement from the perspectives of single-axis and multi-axis measurement schemes. Firstly, the single-axis measurement scheme is primarily achieved through optical methods, such as encoder discs that measure energy changes and interferometric phase changes, as well as mechanical, electromagnetic, and inertial angle measurement methods, among which interferometric methods offer the highest accuracy, with high cost, and encoder discs provide the largest measurement range with an ordinary price. Secondly, in the multi-axis measurement scheme, autocollimation instruments, including plane mirrors, gratings, and self-designed targets, are the main options. Although grating encoders can achieve three degrees of freedom in angle measurement with an ordinary price, they are limited in terms of measurement range and sensitivity compared to self-designed targets. Lastly, artificial intelligence assistance precision measurement is increasingly being embraced due to significant advancements in computer performance, making it more convenient to identify the relationship between measured values and detection values. In conclusion, angle measurement plays a crucial role in precision manufacturing, and the evolving and improving technologies provide the manufacturing industry with greater choices. The purpose of this review is to help readers quickly find more suitable technical solutions according to current application requirements, such as single/multiple axes, accuracy level, measuring range, budget, etc.

An Ultra-Precision Absolute-Type Multi-Degree-of-Freedom Grating Encoder.

An absolute-type four-degree-of-freedom (four-DOF) grating encoder that can simultaneously measure the three-axis pose (θx, θy, θz) and one-axis out-of-plane position (Z) of an object with high accuracy is demonstrated for the first time in this research. This grating encoder is composed of a stationary reading head and a movable grating reflector. A light beam from the reading head is projected onto the grating, and three diffracted beams (0th-, +1st-, and -1st-order) are generated, collimated, and received by three separate quadrant photodetectors (QPDs). The information of θx, θy, θz, and Z is coded into spot positions of these three diffracted beams on the QPDs. Thus, the modeling and decoupling algorithms were investigated, and an independent calculation of these four-DOF absolute positions was theoretically guaranteed. A prototype was then designed, constructed, and evaluated. Experimental results verified that the proposed grating encoder could achieve the absolute measurement of four-DOF θx, θy, θz, and Z with an accuracy of sub-arcseconds and sub-micrometers. To the best of our knowledge, the proposed encoder in this research is the first one to achieve absolute simultaneous measurements of four-DOF position and pose with a large measurement range. The success of this new grating encoder can benefit various multi-DOF positioning applications, especially for large-scale synthetic aperture optics (SAO), including stitching off-axis parabolic mirrors and pulse compression grating.