RESUMO
The experimental procedure for obtaining the point spread function (PSF) of a focusing beam generated using an X-ray multilayer zone plate (MZP) with a narrow annular aperture has been developed. It was possible to reconstruct the PSF by applying the tomographic process to the measured dataset consisting of line spread functions (LSFs) in every radial direction on the focal plane. The LSFs were measured by a knife-edge scanning method of detecting scattered intensity. In the experimental work, quasi-monochromatic undulator radiation with a first harmonic energy of 20â keV was directly focused without a monochromator by the MZP, and the PSF was measured using this procedure. As a result, a near diffraction-limited focused beam size of 46â nm full width at half-maximum was obtained.
RESUMO
We have developed a broadband multilayer mirror for photon energies between 35 and 65 eV. This extreme ultraviolet (EUV) mirror has an almost flat reflectivity profile at normal incidence, and the average reflectivity is 8%. The bandwidth of this mirror is 30 eV centered around 50 eV, 1.5 times broader than conventional multilayer mirrors in this energy region. This new mirror can be used in a variety of applications using supercontinuum EUV light sources including attosecond metrology.
RESUMO
A circular multilayer zone plate (MZP) was fabricated and its focusing performance was evaluated using 20-keV x-rays. MoSi(2) and Si layers were alternately deposited by DC magnetron sputtering on a wire core; all the interfaces satisfied the Fresnel zone condition. The measured line spread function was converted to a point spread function by tomographic reconstruction. The results suggest that the MZP has the potential to realize the diffraction-limited resolving power, which is calculated to be 35 nm using the diffraction integral. Furthermore, scanning transmission microscopy using the MZP could resolve a 50-nm line-and-space pattern.
RESUMO
We briefly report on the performance and stability of periodic multilayer mirrors containing Y(2)O(3) and Al layers designed for normal incidence reflection at the He-II emission line (30.4 nm). We found that Y(2)O(3)∕Al multilayer coatings had higher reflectivity (24.9%) at 30.4 nm and significantly lower reflectivity (1.3%) at 58.4 nm than the conventional coatings such as Mo∕Si. Furthermore, we investigated the temporal stability of the Y(2)O(3)∕Al multilayer coatings. Our sample was kept under vacuum, dry N(2) purge, and normal atmosphere for over three months, and there were no measurable changes in the reflectivity. These results suggest that we can use Y(2)O(3)∕Al multilayer coatings as standard mirrors for the He-II radiation.
RESUMO
W/C and Co/SiO(2) multilayer gratings have been fabricated by depositing a multilayer coating on the surface of laminar-type holographic master gratings. The diffraction efficiency was measured by reflectometers in the energy region of 0.6-8.0 keV at synchrotron radiation facilities as well as with an x-ray diffractometer at 8.05 keV. The Co/SiO(2) and W/C multilayer gratings showed peak diffraction efficiencies of 0.47 and 0.38 at 6.0 and 8.0 keV, respectively. To our knowledge, the peak efficiency of the W/C multilayer grating is the highest measured with hard x rays. The diffraction efficiency of the Co/SiO(2) multilayer gratings was higher than that of the W/C multilayer grating in the energy range of 2.5-6.0 keV. However, it decreased significantly in the energy above the K absorption edge of Co (7.71 keV). For the Co/SiO(2) multilayer grating, the measured diffraction efficiencies agreed with the calculated curves assuming a rms roughness of approximately 1 nm.
RESUMO
Reflection measurements in the 25-35 nm region were made for Mg/SiC and Mg/Y2O3 multilayers kept in a low-humidity atmosphere for 4 or 5 years. Aged Mg/SiC multilayers keep their reflectances, and the reflectance value at 31.2 nm is 0.44 at 10 degrees of the normal angle of incidence. Aged Mg/Y2O3 multilayers change reflectance as top layer materials, and the best value at 30.1 nm is 0.40 at 10 degrees. Reflection measurements are also made for Mg-based multilayers that are annealed from room temperature to 400 degrees C at 50 degrees C intervals. Both multilayers keep their reflectance at annealing temperatures of 200 degrees C. These results suggest that both Mg-based multilayers can be applied to practical optics.