In-situ synchrotron radiation photoemission spectroscopy study of the initial atomic layer deposition of Al2O3 film on Si(001) substrate.

Kim, S H; Lee, B K; Baik, J; Jeon, C; Lee, S S; Lee, J; Hwang, H N; Hwang, C C; Park, C Y; An, K S.

Affiliation

Kim SH; Device Materials Research Center, Advanced Materials Division, Korea Research Institute of Chemical Technology, Yuseong, PO Box 107, Daejeon 305-600, Korea.

J Nanosci Nanotechnol ; 11(5): 4328-32, 2011 May.

Article in En | MEDLINE | ID: mdl-21780451

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Collection: 01-internacional Database: MEDLINE Language: En Journal: J Nanosci Nanotechnol Year: 2011 Type: Article

Collection: 01-internacional Database: MEDLINE Language: En Journal: J Nanosci Nanotechnol Year: 2011 Type: Article