Some aspects of substrate pretreatment for epitaxial Si nanowire growth.
Nanotechnology
; 19(48): 485606, 2008 Dec 03.
Article
in En
| MEDLINE
| ID: mdl-21836307
Full text:
1
Collection:
01-internacional
Database:
MEDLINE
Language:
En
Journal:
Nanotechnology
Year:
2008
Type:
Article
Affiliation country:
Austria