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How the alignment of adsorbed ortho H pairs determines the onset of selective carbon nanotube etching.
Khalilov, U; Bogaerts, A; Xu, B; Kato, T; Kaneko, T; Neyts, E C.
Affiliation
  • Khalilov U; Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk, Antwerp, Belgium. umedjon.khalilov@uantwerpen.be.
  • Bogaerts A; Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk, Antwerp, Belgium. umedjon.khalilov@uantwerpen.be.
  • Xu B; Department of Electronic Engineering, Tohoku University, 6-6-05 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan.
  • Kato T; Department of Electronic Engineering, Tohoku University, 6-6-05 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan.
  • Kaneko T; Department of Electronic Engineering, Tohoku University, 6-6-05 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan.
  • Neyts EC; Department of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk, Antwerp, Belgium. umedjon.khalilov@uantwerpen.be.
Nanoscale ; 9(4): 1653-1661, 2017 Jan 26.
Article in En | MEDLINE | ID: mdl-28074964
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Nanoscale Year: 2017 Type: Article Affiliation country: Belgium
Fulltext
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PubMed Links
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Nanoscale Year: 2017 Type: Article Affiliation country: Belgium