Illumination uniformity improvement in digital micromirror device based scanning photolithography system.
Opt Express
; 26(14): 18597-18607, 2018 Jul 09.
Article
in En
| MEDLINE
| ID: mdl-30114036
ABSTRACT
Illumination uniformity in photolithography systems determines the dimensional difference across the entire lithographic substrate. However, traditional lithography system relies on expensive and complex illumination system for achieving uniform illumination. In this paper, we propose a simple and cost-effective method based on the modulation of digital micromirror device to improve illumination uniformity. The modulation according to a digital mask achieved via an iteration program improves the uniformity to be above 95%. We demonstrate the effectiveness of the method by experimentally fabricating a linear grating. By implementing this method, the maximum dimensional difference is decreased from 3.3µm to 0.3µm. Further simulations indicate that higher uniformity is achievable once the field of view on the DMD is divided into smaller subregions.
Full text:
1
Collection:
01-internacional
Database:
MEDLINE
Type of study:
Clinical_trials
Language:
En
Journal:
Opt Express
Journal subject:
OFTALMOLOGIA
Year:
2018
Type:
Article