Tin oxide nanostructure fabrication via sequential infiltration synthesis in block copolymer thin films.

Barick, Barun K; Simon, Assaf; Weisbord, Inbal; Shomrat, Neta; Segal-Peretz, Tamar

Barick, Barun K; Simon, Assaf; Weisbord, Inbal; Shomrat, Neta; Segal-Peretz, Tamar.

Afiliação

Barick BK; Department of Chemical Engineering, Technion, Haifa 3200003, Israel.
Simon A; Department of Chemical Engineering, Technion, Haifa 3200003, Israel.
Weisbord I; Department of Chemical Engineering, Technion, Haifa 3200003, Israel.
Shomrat N; Department of Chemical Engineering, Technion, Haifa 3200003, Israel.
Segal-Peretz T; Department of Chemical Engineering, Technion, Haifa 3200003, Israel. Electronic address: tamarps@technion.ac.il.

J Colloid Interface Sci ; 557: 537-545, 2019 Dec 01.

Article em En | MEDLINE | ID: mdl-31550646

Palavras-chave

Atomic layer deposition; Block copolymer; Sequential infiltration synthesis; Tin oxide

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: J Colloid Interface Sci Ano de publicação: 2019 Tipo de documento: Article País de afiliação: Israel

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