Micrograph contrast in low-voltage SEM and cryo-SEM.

Liberman, Lucy; Kleinerman, Olga; Davidovich, Irina; Talmon, Yeshayahu

Liberman, Lucy; Kleinerman, Olga; Davidovich, Irina; Talmon, Yeshayahu.

Afiliação

Liberman L; Department of Chemical Engineering and the Russell Berrie Nanotechnology Institute (RBNI), Technion-Israel Institute of Technology, Haifa 3200003, Israel.
Kleinerman O; Department of Materials Science & Engineering, Technion-Israel Institute of Technology, Haifa 3200003, Israel.
Davidovich I; Department of Chemical Engineering and the Russell Berrie Nanotechnology Institute (RBNI), Technion-Israel Institute of Technology, Haifa 3200003, Israel.
Talmon Y; Department of Chemical Engineering and the Russell Berrie Nanotechnology Institute (RBNI), Technion-Israel Institute of Technology, Haifa 3200003, Israel. Electronic address: ishi@technion.ac.il.

Ultramicroscopy ; 218: 113085, 2020 11.

Article em En | MEDLINE | ID: mdl-32771863

Assuntos

Microscopia Crioeletrônica/métodos; Aumento da Imagem/métodos; Microscopia Eletrônica de Varredura/métodos; Nanotubos de Carbono/ultraestrutura; Manejo de Espécimes/métodos; Artefatos; Eletroquímica

Palavras-chave

Cryo-SEM; Electron beam accelerating voltage; Low-voltage SEM; Picture contrast

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Assunto principal: Manejo de Espécimes / Microscopia Eletrônica de Varredura / Aumento da Imagem / Microscopia Crioeletrônica / Nanotubos de Carbono Idioma: En Revista: Ultramicroscopy Ano de publicação: 2020 Tipo de documento: Article País de afiliação: Israel

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