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Pass-Transistor Logic Circuits Based on Wafer-Scale 2D Semiconductors.
Wang, Xinyu; Chen, Xinyu; Ma, Jingyi; Gou, Saifei; Guo, Xiaojiao; Tong, Ling; Zhu, Junqiang; Xia, Yin; Wang, Die; Sheng, Chuming; Chen, Honglei; Sun, Zhengzong; Ma, Shunli; Riaud, Antoine; Xu, Zihan; Cong, Chunxiao; Qiu, Zhijun; Zhou, Peng; Xie, Yufeng; Bian, Lifeng; Bao, Wenzhong.
Afiliação
  • Wang X; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Chen X; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Ma J; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Gou S; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Guo X; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Tong L; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Zhu J; School of Information Science and Engineering, Fudan University, Shanghai, 200433, China.
  • Xia Y; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Wang D; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Sheng C; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Chen H; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Sun Z; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Ma S; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Riaud A; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Xu Z; Shenzhen Six Carbon Technology, Shenzhen, 518055, China.
  • Cong C; School of Information Science and Engineering, Fudan University, Shanghai, 200433, China.
  • Qiu Z; School of Information Science and Engineering, Fudan University, Shanghai, 200433, China.
  • Zhou P; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Xie Y; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
  • Bian L; Frontier Institute of Chip and System, Fudan University, Shanghai, 200433, China.
  • Bao W; State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
Adv Mater ; 34(48): e2202472, 2022 Dec.
Article em En | MEDLINE | ID: mdl-35728050
2D semiconductors, such as molybdenum disulfide (MoS2 ), have attracted tremendous attention in constructing advanced monolithic integrated circuits (ICs) for future flexible and energy-efficient electronics. However, the development of large-scale ICs based on 2D materials is still in its early stage, mainly due to the non-uniformity of the individual devices and little investigation of device and circuit-level optimization. Herein, a 4-inch high-quality monolayer MoS2 film is successfully synthesized, which is then used to fabricate top-gated (TG) MoS2 field-effect transistors with wafer-scale uniformity. Some basic circuits such as static random access memory and ring oscillators are examined. A pass-transistor logic configuration based on pseudo-NMOS is then employed to design more complex MoS2 logic circuits, which are successfully fabricated with proper logic functions tested. These preliminary integration efforts show the promising potential of wafer-scale 2D semiconductors for application in complex ICs.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Mater Assunto da revista: BIOFISICA / QUIMICA Ano de publicação: 2022 Tipo de documento: Article País de afiliação: China

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Mater Assunto da revista: BIOFISICA / QUIMICA Ano de publicação: 2022 Tipo de documento: Article País de afiliação: China