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Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching.
Yeom, Hee-Jung; Yoon, Min Young; Choi, Daehan; Lee, Youngseok; Kim, Jung-Hyung; You, Shin-Jae; Lee, Hyo-Chang.
Afiliação
  • Yeom HJ; Korea Research Institute of Standards and Science, Daejeon 34113, Republic of Korea.
  • Yoon MY; Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
  • Choi D; Korea Research Institute of Standards and Science, Daejeon 34113, Republic of Korea.
  • Lee Y; Korea Research Institute of Standards and Science, Daejeon 34113, Republic of Korea.
  • Kim JH; Institute of Quantum System (IQS), Chungnam National University, Daejeon 34134, Republic of Korea.
  • You SJ; Korea Research Institute of Standards and Science, Daejeon 34113, Republic of Korea.
  • Lee HC; Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
ACS Omega ; 8(36): 32450-32457, 2023 Sep 12.
Article em En | MEDLINE | ID: mdl-37720774
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Omega Ano de publicação: 2023 Tipo de documento: Article
Texto completo
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XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Omega Ano de publicação: 2023 Tipo de documento: Article