Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features.

The next generation of hard disk drive technology for data storage densities beyond 5 Tb/in2 will require single-bit patterning of features with sub-10 nm dimensions by nanoimprint lithography. To address this challenge master templates are fabricated using pattern multiplication with atomic layer deposition (ALD). Sub-10 nm lithography requires a solid understanding of materials and their interactions. In this work we study two important oxide materials, silicon dioxide and titanium dioxide, as the pattern spacer and look at their interactions with carbon, chromium and silicon dioxide. We found that thermal titanium dioxide ALD allows for the conformal deposition of a spacer layer without damaging the carbon mandrel and eliminates the surface modification due to the reactivity of the metal-organic precursor. Finally, using self-assembled block copolymer lithography and thermal titanium dioxide spacer fabrication, we demonstrate pattern doubling with 7.5 nm half-pitch spacer features.

Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses.

Free-electron lasers (FELs) currently represent a step forward on time-resolved investigations on any phase of matter through pump-probe methods involving FELs and laser beams. That class of experiments requires an accurate spatial and temporal superposition of pump and probe beams on the sample, which at present is still a critical procedure. More efficient approaches are demanded to quickly achieve the superposition and synchronization of the beams. Here, we present what we believe is a novel technique based on an integrated device allowing the simultaneous characterization and the fast spatial and temporal overlapping of the beams, reducing the alignment procedure from hours to minutes.

Optimization of 1D ZnO@TiO2 core-shell nanostructures for enhanced photoelectrochemical water splitting under solar light illumination.

A fast and low-cost sol-gel synthesis used to deposit a shell of TiO2 anatase onto an array of vertically aligned ZnO nanowires (NWs) is reported in this paper. The influence of the annealing atmosphere (air or N2) and of the NWs preannealing process, before TiO2 deposition, on both the physicochemical characteristics and photoelectrochemical (PEC) performance of the resulting heterostructure, was studied. The efficient application of the ZnO@TiO2 core-shells for the PEC water-splitting reaction, under simulated solar light illumination (AM 1.5G) solar light illumination in basic media, is here reported for the first time. This application has had a dual function: to enhance the photoactivity of pristine ZnO NWs and to increase the photodegradation stability, because of the protective role of the TiO2 shell. It was found that an air treatment induces a better charge separation and a lower carrier recombination, which in turn are responsible for an improvement in the PEC performance with respect to N2-treated core-shell materials. Finally, a photocurrent of 0.40 mA/cm(2) at 1.23 V versus RHE (2.2 times with respect to the pristine ZnO NWs) was obtained. This achievement can be regarded as a valuable result, considering similar nanostructured electrodes reported in the literature for this application.