1.
Fabrication Characteristics of Silicon Nanowires via the Electrochemical Electroless Etching Method.
J Nanosci Nanotechnol
; 15(7): 5291-4, 2015 Jul.
Artículo
en Inglés
| MEDLINE
| ID: mdl-26373126
RESUMEN
A silicon nanowire structure was fabricated using the electrochemical electroless etching method, involving electroless plating and the electrochemical etching process. The reflection of the absorption layer with the nanowires' structure was about 5%, which is better than a bulk-type solar cell (10%).