Plasmonic properties of aluminium nanowires in amorphous silicon.

Plasmonic structures can help enhance optical activity in the ultraviolet (UV) region and therefore enhancing photocatalytic reactions and the detection of organic and biological species. Most plasmonic structures are composed of Ag or Au. However, producing structures small enough for optical activity in the UV region has proved difficult. In this study, we demonstrate that aluminium nanowires are an excellent alternative. We investigated the plasmonic properties of the Al nanowires as well as the optoelectronic properties of the surroundinga - Simatrix by combining scanning transmission electron microscopy imaging, electron energy loss spectroscopy and electrodynamic modelling. We have found that the Al nanowires have distinct plasmonic modes in the UV and far UV region, from 0.75 eV to 13 eV. In addition, simulated results found that the size and spacing of the Al nanowires, as well as the embedding material were shown to have a large impact on the type of surface plasmon energies that can be generated in the material. Using electromagnetic modelling, we have identified the modes and illustrated how they could be tuned further.

Disorder-Induced Ordering in Gallium Oxide Polymorphs.

Polymorphs are common in nature and can be stabilized by applying external pressure in materials. The pressure and strain can also be induced by the gradually accumulated radiation disorder. However, in semiconductors, the radiation disorder accumulation typically results in the amorphization instead of engaging polymorphism. By studying these phenomena in gallium oxide we found that the amorphization may be prominently suppressed by the monoclinic to orthorhombic phase transition. Utilizing this discovery, a highly oriented single-phase orthorhombic film on the top of the monoclinic gallium oxide substrate was fabricated. Exploring this system, a novel mode of the lateral polymorphic regrowth, not previously observed in solids, was detected. In combination, these data envisage a new direction of research on polymorphs in Ga_{2}O_{3} and, potentially, for similar polymorphic families in other materials.

Nitrogen-Doped Cu2O Thin Films for Photovoltaic Applications.

Cuprous oxide (Cu2O) is a p-type semiconductor with high optical absorption and a direct bandgap of about 2.1 eV, making it an attractive material for photovoltaic applications. For a high-performance photovoltaic device, the formation of low-resistivity contacts on Cu2O thin films is a prerequisite, which can be achieved by, for instance, nitrogen doping of Cu2O in order to increase the carrier concentration. In this work, nitrogen-doped p-type Cu2O thin films were prepared on quartz substrates by magnetron sputter deposition. By adding N2 gas during the deposition process, a nitrogen concentration of up to 2.3 × 1021 atoms/cm3 in the Cu2O thin films was achieved, as determined from secondary ion mass spectroscopy measurements. The effect of nitrogen doping on the structural, optical, and electrical properties of the Cu2O thin films was investigated. X-ray diffraction measurements suggest a preservation of the Cu2O phase for the nitrogen doped thin films, whereas spectrophotometric measurements show that the optical properties were not significantly altered by incorporation of nitrogen into the Cu2O matrix. A significant conductivity enhancement was achieved for the nitrogen-doped Cu2O thin films, based on Hall effect measurements, i.e., the hole concentration was increased from 4 × 1015 to 3 × 1019 cm-3 and the resistivity was reduced from 190 to 1.9 Ω⋅cm by adding nitrogen to the Cu2O thin films.

Metal Oxide Thin-Film Heterojunctions for Photovoltaic Applications.

Silicon-based tandem solar cells incorporating low-cost, abundant, and non-toxic metal oxide materials can increase the conversion efficiency of silicon solar cells beyond their conventional limitations with obvious economic and environmental benefits. In this work, the electrical characteristics of a metal oxide thin-film heterojunction solar cell based on a cuprous oxide (Cu2O) absorber layer were investigated. Highly Al-doped n-type ZnO (AZO) and undoped p-type Cu2O thin films were prepared on quartz substrates by magnetron sputter deposition. The electrical and optical properties of these thin films were determined from Hall effect measurements and spectroscopic ellipsometry. After annealing the Cu2O film at 900 °C, the majority carrier (hole) mobility and the resistivity were measured at 50 cm²/V·s and 200 Ω·cm, respectively. Numerical modeling was carried out to investigate the effect of band alignment and interface defects on the electrical characteristics of the AZO/Cu2O heterojunction. The analysis suggests that the incorporation of a buffer layer can enhance the performance of the heterojunction solar cell as a result of reduced conduction band offset.

Improving carrier transport in Cu2O thin films by rapid thermal annealing.

Cuprous oxide (Cu2O) is a promising material for large scale photovoltaic applications. The efficiencies of thin film structures are, however, currently lower than those for structures based on Cu2O sheets, possibly due to their poorer transport properties. This study shows that post-deposition rapid thermal annealing (RTA) of Cu2O films is an effective approach for improving carrier transport in films prepared by reactive magnetron sputtering. The as-deposited Cu2O films were poly-crystalline, p-type, with weak near band edge (NBE) emission in photoluminescence spectra, a grain size of ~100 nm and a hole mobility of 2-18 cm2 V-1 s-1. Subsequent RTA (3 min) at a pressure of 50 Pa and temperatures of 600-1000 °C enhanced the NBE by 2-3 orders of magnitude, evidencing improved crystalline quality and reduction of non-radiative carrier recombination. Both grain size and hole mobility were increased considerably upon RTA, reaching values above 1 µm and up to 58 cm2 V-1 s-1, respectively, for films annealed at 900-1000 °C. These films also exhibited a resistivity of ~50-200 Ω cm, a hole concentration of ~1015 cm-3 at room temperature, and a transmittance above 80%.

Diffusivity of the double negatively charged mono-vacancy in silicon.

Lightly-doped silicon (Si) samples of n-type conductivity have been irradiated with 2.0 MeV [Formula: see text] ions at a temperature of 30 K and characterized in situ by deep level transient spectroscopy (DLTS) measurements using an on-line setup. Migration of the Si mono-vacancy in its double negative charge state (V 2-) starts to occur at temperatures above ∼70 K and is monitored via trapping of V 2- by interstitial oxygen impurity atoms ([Formula: see text]), leading to the growth of the prominent vacancy-oxygen ([Formula: see text]) center. The [Formula: see text] center gives rise to an acceptor level located at ∼0.17 eV below the conduction band edge (E c ) and is readily detected by DLTS measurements. Post-irradiation isothermal anneals at temperatures in the range of 70 to 90 K reveal first-order kinetics for the reaction [Formula: see text] in both Czochralski-grown and Float-zone samples subjected to low fluences of [Formula: see text] ions, i.e. the irradiation-induced V concentration is dilute ([Formula: see text]1013 cm-3). On the basis of these kinetics data and the content of [Formula: see text], the diffusivity of V 2- can be determined quantitatively and is found to exhibit an activation energy for migration of ∼0.18 eV with a pre-exponential factor of ∼[Formula: see text] cm2 s-1. The latter value evidences a simple jump process without any entropy effects for the motion of V 2-. No deep level in the bandgap to be associated with V 2- is observed but the results suggest that the level is situated deeper than ∼0.19 eV below E c , corroborating results reported previously in the literature.