RESUMEN
Nanotransfer printing (nTP) is one of the most promising nanopatterning methods given that it can be used to produce nano-to-micro patterns effectively with functionalities for electronic device applications. However, the nTP process is hindered by several critical obstacles, such as sub-20 nm mold technology, reliable large-area replication, and uniform transfer-printing of functional materials. Here, for the first time, a dual nanopatterning process is demonstrated that creates periodic sub-20 nm structures on the eight-inch wafer by the transfer-printing of patterned ultra-thin (<50 nm) block copolymer (BCP) film onto desired substrates. This study shows how to transfer self-assembled BCP patterns from the Si mold onto rigid and/or flexible substrates through a nanopatterning method of thermally assisted nTP (T-nTP) and directed self-assembly (DSA) of Si-containing BCPs. In particular, the successful microscale patternization of well-ordered sub-20 nm SiOx patterns is systematically presented by controlling the self-assembly conditions of BCP and printing temperature. In addition, various complex pattern geometries of nano-in-micro structures are displayed over a large patterning area by T-nTP, such as angular line, wave line, ring, dot-in-hole, and dot-in-honeycomb structures. This advanced BCP-replicated nanopatterning technology is expected to be widely applicable to nanofabrication of nano-to-micro electronic devices with complex circuits.
RESUMEN
Various lithography techniques have been widely used for the fabrication of next-generation device applications. Micro/nanoscale pattern structures formed by lithographic methods significantly improve the performance capabilities of the devices. Here, we introduce a novel method that combines the patterning of nanotransfer printing (nTP) and laser micromachining to fabricate multiscale pattern structures on a wide range of scales. Prior to the formation of various nano-in-micro-in-millimeter (NMM) patterns, the nTP process is employed to obtain periodic nanoscale patterns on the target substrates. Then, an optimum laser-based patterning that effectively engraves various nanopatterned surfaces, in this case, spin-cast soft polymer film, rigid polymer film, a stainless still plate, and a Si substrate, is established. We demonstrate the formation of well-defined square and dot-shaped multiscale NMM-patterned structures by the combined patterning method of nTP and laser processes. Furthermore, we present the generation of unusual text-shaped NMM pattern structures on colorless polyimide (CPI) film, showing optically excellent rainbow luminescence based on the configuration of multiscale patterns from nanoscale to milliscale. We expect that this combined patterning strategy will be extendable to other nano-to-micro fabrication processes for application to various nano/microdevices with complex multiscale pattern geometries.
RESUMEN
High-resolution nanotransfer printing (nTP) technologies have attracted a tremendous amount of attention due to their excellent patternability, high productivity, and cost-effectiveness. However, there is still a need to develop low-cost mold manufacturing methods, because most nTP techniques generally require the use of patterned molds fabricated by high-cost lithography technology. Here, we introduce a novel nTP strategy that uses imprinted metal molds to serve as an alternative to a Si stamp in the transfer printing process. We present a method by which to fabricate rigid surface-patterned metallic molds (Zn, Al, and Ni) based on the process of direct extreme-pressure imprint lithography (EPIL). We also demonstrate the nanoscale pattern formation of functional materials, in this case Au, TiO2, and GST, onto diverse surfaces of SiO2/Si, polished metal, and slippery glass by the versatile nTP method using the imprinted metallic molds with nanopatterns. Furthermore, we show the patterning results of nanoporous crossbar arrays on colorless polyimide (CPI) by a repeated nTP process. We expect that this combined nanopatterning method of EPIL and nTP processes will be extendable to the fabrication of various nanodevices with complex circuits based on micro/nanostructures.
RESUMEN
Superhydrophobic surfaces have great potential for various applications owing to their superior dewetting and mobility of water droplets. However, the physical robustness of nano/microscale rough surface structures supporting superhydrophobicity is critical in real applications. In this study, to create a superhydrophobic surface on copper, we employed copper electrodeposition to create a nano/microscale rough surface structure as an alternative to the nanoneedle CuO structure. The rough electrodeposited copper surface with a thin Teflon coating shows superhydrophobicity. The enhancement of dewetting and mobility of water droplets on copper surfaces by electrodeposition and hydrophobization significantly improved the condensation heat transfer by up to approximately 78% compared to that of copper substrates. Moreover, the nano/microscale rough surface structure of the electrodeposited copper surface exhibits better tolerance to physical rubbing, which destroys the nanoneedle-structured CuO surface. Therefore, the condensation heat transfer of the superhydrophobic electrodeposited copper surface decreased by only less than 10%, while that of the nanoneedle-structured CuO surface decreased by approximately 40%. This suggests that an electrodeposited copper surface can lead to the stable performance of superhydrophobicity for real applications.
RESUMEN
Rotating cylindrical stamp-based nanoimprint technique has many advantages, including the continuous fabrication of intriguing micro/nanostructures and rapid pattern transfer on a large scale. Despite these advantages, the previous nanoimprint lithography has rarely been used for producing sophisticated nanoscale patterns on a non-planar substrate that has many extended applications. Here, the simple integration of nanoimprinting process with a help of a transparent stamp wrapped on the cylindrical roll and UV optical source in the core to enable high-throughput pattern transfer, particularly on a fabric substrate is demonstrated. Moreover, as a functional resin material, this innovative strategy involves a synergistic approach on the synthesis of molecularly imprinted polymer, which are spatially organized free-standing perforated nanostructures such as nano/microscale lines, posts, and holes patterns on various woven or nonwoven blank substrates. The proposed materials can serve as a self-encoded filtration medium for selective separation of formaldehyde molecules. It is envisioned that the combinatorial fabrication process and attractive material paves the way for designing next-generation separation systems in use to capture industrial or household toxic substances.
Asunto(s)
Polímeros Impresos Molecularmente , Nanoestructuras , ImpresiónRESUMEN
The phase change memory (PCM) is one of the key enabling memory technologies for next-generation non-volatile memory device applications due to its high writing speed, excellent endurance, long retention time, and good scalability. However, the high power consumption of PCM devices caused by the high switching current from a high resistive state to a low resistive state is a critical obstacle to be resolved before widespread commercialization can be realized. Here, a useful approach to reduce the writing current of PCM, which depends strongly on the contact area between the heater electrode and active layer, by employing self-assembly process of Si-containing block copolymers (BCPs) is presented. Self-assembled insulative BCP pattern geometries can locally block the current path of the contact between a high resistive film (TiN) and a phase-change material (Ge2 Sb2 Te5 ), resulting in a significant reduction of the writing current. Compared to a conventional PCM cell, the BCP-modified PCM shows excellent switching power reduction up to 1/20 given its use of self-assembled hybrid SiFex Oy /SiOx dot-in-hole nanostructures. This BCP-based bottom-up process can be extended to various applications of other non-volatile memory devices, such as resistive switching memory and magnetic storage devices.
RESUMEN
Nanoimprint lithography (NIL) is typically performed by filling up of molds by heated polymers or UV-curable liquid resists, inevitably requiring subsequent pattern-transfer processes. Although direct NIL techniques have been suggested alternatively, they usually require precursors or ink-type resists containing undesired organic components. Here, we demonstrate extreme-pressure imprint lithography (EPIL) that effectively produces well-defined multiscale structures with a wide range from 10 nm to 10 mm on diverse surfaces even including pure or alloy metals without using any precursors, heating, UV exposure, or pattern transfer. In particular, EPIL is accomplished through precise control of room-temperature plastic deformation in nanoscale volumes, which is elucidated by finite element analyses and molecular dynamics simulations. In addition to scalability to macroscopic areas, we confirm the outstanding versatility of EPIL via its successful applications to Ni, Cu, steel, and organics. We expect that the state-of-the-art EPIL process combined with other emerging nanopatterning technologies will be extendable to the future large-area nanofabrication of various devices.
RESUMEN
Nanotransfer printing (nTP) has attracted much attention due to its high pattern resolution, simple process, and low processing cost for useful nanofabrication. Here, we introduce a thermally assisted nTP (T-nTP) process for the effective fabrication of various periodic three-dimensional (3D) nanosheets, such as concavo-convex lines, spine lines, square domes, and complex multi-line patterns. The T-nTP method allows continuous nanoscale 3D patterns with functionality to be transferred onto both rigid and flexible substrates by heat without any collapse of uniform convex nanostructures with nanochannels. We also show the pattern formation of multi-layered hybrid structures consisting of two or more materials by T-nTP. Furthermore, the formation of silicon oxide nanodots (0D) within a printed metallic nanowave structure (3D) can be achieved by the combined method of T-nTP and the self-assembly of poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) block copolymers. Moreover, we demonstrate how to obtain well-defined oxide-metal hybrid nanostructures (0D-in-3D) through the spontaneous accommodation of PDMS spheres in the confined spaces of an Au-wave nanotemplate. This approach is applicable during the nanofabrication of various high-resolution devices with complex geometrical nanopatterns.
RESUMEN
Various high-performance anode and cathode materials, such as lithium carbonate, lithium titanate, cobalt oxides, silicon, graphite, germanium, and tin, have been widely investigated in an effort to enhance the energy density storage properties of lithium-ion batteries (LIBs). However, the structural manipulation of anode materials to improve the battery performance remains a challenging issue. In LIBs, optimization of the anode material is a key technology affecting not only the power density but also the lifetime of the device. Here, we introduce a novel method by which to obtain nanostructures for LIB anode application on various surfaces via nanotransfer printing (nTP) process. We used a spark plasma sintering (SPS) process to fabricate a sputter target made of Li2CO3, which is used as an anode material for LIBs. Using the nTP process, various Li2CO3 nanoscale patterns, such as line, wave, and dot patterns on a SiO2/Si substrate, were successfully obtained. Furthermore, we show highly ordered Li2CO3 nanostructures on a variety of substrates, such as Al, Al2O3, flexible PET, and 2-Hydroxylethyl Methacrylate (HEMA) contact lens substrates. It is expected that the approach demonstrated here can provide new pathway to generate many other designable structures of various LIB anode materials.
RESUMEN
Molecularly imprinted polymers (MIPs) represent an intriguing class of synthetic materials that can selectively recognize and bind chemical or biological molecules in a variety of value-added applications in sensors, catalysis, drug delivery, antibodies, and receptors. In this context, many advanced methods of implementing functional MIP materials have been actively studied. Herein, we report a robust strategy to produce highly ordered arrays of surface-imprinted polymer patterns with unprecedented regularity for MIP-based sensor platform, which involves the controlled evaporative self-assembly process of MIP precursor solution in a confined geometry consisting of a spherical lens on a flat Si substrate (i.e., sphere-on-flat geometry) to synergistically utilize the "coffee-ring" effect and repetitive stick-slip motions of the three-phase contact line simply by solvent evaporation. Highly ordered arrays of the ring-patterned MIP films are then polymerized under UV irradiation to achieve semi-interpenetrating polymer networks. The extraction of templated target molecules from the surface-imprinted ring-patterned MIP films leaves behind copious cavities for the recognizable specific "memory sites" to efficiently detect small molecules. As a result, the elaborated surface structuring effect, sensitivity, and specific selectivity of the coffee-ring-based MIP sensors are scrutinized by capitalizing on an endocrine-disrupting chemical, 2,4-dichlorophenoxyacetic acid (2,4-D), as an example. Clearly, the evaporative self-assembly of nonvolatile solutes in a confined geometry renders the creation of familiar yet ordered coffee-ring-like patterns for a wide range of applications, including sensors, scaffolds for cell motility, templates, substrates for neuron guidance, etc., thereby dispensing with the need of multistep lithography techniques and external fields.
Asunto(s)
Disruptores Endocrinos , Impresión Molecular , Café , Polimerizacion , PolímerosRESUMEN
Directed self-assembly (DSA) of block copolymers (BCPs) has garnered much attention due to its excellent pattern resolution, simple process, and good compatibility with many other lithography methods for useful nanodevice applications. Here, we present a BCP-based multiple nanopatterning process to achieve three-dimensional (3D) pattern formation of metal/oxide hybrid nanostructures. We employed a self-assembled sub-20 nm SiO x line pattern as a master mold for nanotransfer printing (nTP) to generate a cross-bar array. By using the transfer-printed cross-bar structures as BCP-guiding templates, we can obtain well-ordered BCP microdomains in the distinct spaces of the nanotemplates through a confined BCP self-assembly process. We also demonstrate the morphological evolution of a cylinder-forming BCP by controlling the BCP film thickness, showing a clear morphological transition from cylinders to spheres in the designated nanospaces. Furthermore, we demonstrate how to control the number of BCP spheres within the cross-bar 3D pattern by adjusting the printing angle of the multiple nTP process to provide a suitable area for spontaneous BCP accommodation. This multiple-patterning-based approach is applicable to useful 3D nanofabrication of various devices with complex hybrid nanostructures.
RESUMEN
Polypyrrole nanoparticles (PPy-NPs) with excellent near-infrared absorption are commonly used as photothermal therapy (PTT) agents; however, PTT using PPy-NPs has a limitation in that it is difficult to maximize their therapeutic effect because of the lack of specific targeting. In this study, to overcome the difficulty of targeting, folic acid functionalized carbon dots (FA-CDs) with bright green fluorescence properties were combined with carboxylated PPy-NPs via the EDC/NHS coupling reaction to yield a PTT imaging agent. The synthesized FA-CD/PPy-NPs with excellent photostability performed folate receptor (FR) positive HeLa cancer cell imaging by green fluorescence signals of FA-CDs and exhibited high cell viability (above 90%) even at 500 µg/mL. The viability of HeLa cells incubated with 200 µg/mL FA-CD/PPy-NPs was dramatically decreased to 25.02 ± 1.85% by NIR laser irradiation, through photothermal therapeutic effects of FA-CD/PPy-NPs with high photothermal conversion efficiency (η = 40.80 ± 1.54%). The cancer cell death by FA-CD/PPy-NPs was confirmed by fluorescence imaging of FA-CDs as well as live/dead cell staining assay (calcein-AM/PI). These results demonstrate that the FA-CD/PPy-NPs can be utilized as multifunctional theranostic agents for specific bioimaging and treatment of FR-positive cancer cells.
Asunto(s)
Materiales Biocompatibles/farmacología , Carbono/farmacología , Ácido Fólico/farmacología , Nanopartículas/química , Imagen Óptica , Polímeros/farmacología , Pirroles/farmacología , Puntos Cuánticos/química , Materiales Biocompatibles/química , Carbono/química , Línea Celular , Supervivencia Celular/efectos de los fármacos , Ácido Fólico/química , Humanos , Ensayo de Materiales , Estructura Molecular , Tamaño de la Partícula , Terapia Fototérmica , Polímeros/química , Pirroles/químicaRESUMEN
Nanotransfer printing (nTP) has attracted considerable attention due to its good pattern resolution, process simplicity, and cost-effectiveness. However, the development of a large-area nTP process has been hampered by critical reliability issues related to the uniform replication and regular transfer printing of functional nanomaterials. Here, we present a very practical thermally assisted nanotransfer printing (T-nTP) process that can easily produce well-ordered nanostructures on an 8-inch wafer via the use of a heat-rolling press system that provides both uniform pressure and heat. We also demonstrate various complex pattern geometries, such as wave, square, nut, zigzag, and elliptical nanostructures, on diverse substrates via T-nTP. Furthermore, we demonstrate how to obtain a high-density crossbar metal-insulator-metal memristive array using a combined method of T-nTP and directed self-assembly. We expect that the state-of-the-art T-nTP process presented here combined with other emerging patterning techniques will be especially useful for the large-area nanofabrication of various devices.
RESUMEN
A chemically defined patterned surface was created via a combined process of controlled evaporative self-assembly of concentric polymer stripes and the selective surface modification of polymer brush. The former process involved physical adsorption of poly (methyl methacrylate) (PMMA) segments into silicon oxide surface, thus forming ultrathin PMMA stripes, whereas the latter process was based on the brush treatment of silicon native oxide surface using a hydroxyl-terminated polystyrene (PS-OH). The resulting alternating PMMA- and PS-rich stripes provided energetically favorable regions for self-assembly of high χ polystyrene-block-polydimethylsiloxane (PS-b-PDMS) in a simple and facile manner, dispensing the need for conventional lithography techniques. Subsequently, deep reactive ion etching and oxygen plasma treatment enabled the transition of the PDMS blocks into oxidized groove-shaped nanostructures.
RESUMEN
The templated self-assembly of block copolymers (BCPs) with a high Flory-Huggins interaction parameter (χ) can effectively create ultrafine, well-ordered nanostructures in the range of 5-30 nm. However, the self-assembled BCP patterns remain limited to possible morphological geometries and materials. Here, we introduce a novel and useful self-assembly method of di-BCP blends capable of generating diverse hybrid nanostructures consisting of oxide and metal materials through the rapid microphase separation of A-B/B-C BCP blends. We successfully obtained various hybridized BCP morphologies which cannot be acquired from a single di-BCP, such as hexagonally arranged hybrid dot and dot-in-hole patterns by controlling the mixing ratios of the solvents with a binary solvent annealing process. Furthermore, we demonstrate how the binary solvent vapor annealing process can provide a wide range of pattern geometries to di-BCP blends, showing a well-defined spontaneous one-to-one accommodation in dot-in-hole nanostructures. Specifically, we show clearly how the self-assembled BCPs can be functionalized via selective reduction and/or an oxidation process, resulting in the excellent positioning of confined silica nanodots into each nanospace of a Pt mesh. These results suggest a new method to achieve the pattern formation of more diverse and complex hybrid nanostructures using various blended BCPs.
RESUMEN
Uniform, well-ordered sub-20 nm patterns can be generated by the templated self-assembly of block copolymers (BCPs) with a high Flory-Huggins interaction parameter (χ). However, the self-assembled BCP monolayers remain limited in the possible structural geometries. Here, we introduce a multiple self-assembly method which uses di-BCPs to produce diverse morphologies, such as dot, dot-in-honeycomb, line-on-dot, double-dot, pondering, dot-in-pondering, and line-on-pondering patterns. To improve the diversity of BCP morphological structures, we employed sphere-forming and cylinder-forming poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) BCPs with a high χ. The self-assembled mono-layer and double-layer SiOx dot patterns were modified at a high temperature (â¼800 °C), showing hexagonally arranged (dot) and double-hexagonally arranged (pondering) SiOx patterns, respectively. We successfully obtained additional new nanostructures (big-dot, dot-in-honeycomb, line-on-dot, pondering, dot-in-pondering, and line-on-pondering types) through a second self-assembly of cylinder-forming BCPs using the dot and pondering patterns as guiding templates. This simple approach can likely be extended to the multiple self-assembly of many other BCPs with good functionality, significantly contributing to the development of various nanodevices.
RESUMEN
The crystallization of MAPbI3 perovskite films was purposefully engineered to investigate the governing factors which determine their morphological properties and moisture stability. By modulating nucleation, we obtained a single layer perovskite film with controlled crystal facet orientation and grain size. The lack of perovskite nucleation sites during crystallization allowed us to tailor the resulting crystallization phase. Theoretical calculations indicated that the nucleation sites for perovskite growth are related to the electron density around the oxygen atom (C[double bond, length as m-dash]O and S[double bond, length as m-dash]O) in a Lewis base. A single layer of micrometer-sized and (110)-oriented perovskite crystals was achieved in the optimized MAPbI3 films via suppressing the formation of nucleation sites. We fabricated inverted perovskite solar cells with the structure of glass/ITO/PEDOT:PSS/MAPbI3/PC61BM/Al which exhibited a high power conversion efficiency of 17.5% and a high fill factor over 83%. In addition, a study of the moisture stability indicated that the (110) facet orientation of the perovskite grains plays a more important role in film degradation than grain size.
RESUMEN
A cost-effective fabrication method that can produce a remarkable enhancement in the device efficiency along with a reduction in the fabrication cost is one of the crucial requirements for the commercialization of perovskite-based solar cells. Here, we report a low-cost, printable, and highly effective synchronized-pressing annealing (SPA) method for inverted planar perovskite solar cells. In this method, two films are combined face-to-face for annealing, and separated as in a roll-to-roll process. Consequently, the SPA method provides two homogeneous highly crystalline MAPbI3 films with monolithic millimeter-scale crystalline grains by intermediate-induced crystallization engineering. The grains present a tendency of oriented growth along the <110> direction, parallel to the substrate, which leads to efficient charge transport. The IPSCs fabricated by the SPA method demonstrate a high efficiency of â¼17% with significantly enhanced photocurrents and fill factors. Moreover, the characteristics of both top and bottom devices are very similar, with nearly identical J-V curves and photoresponse spectra. As the SPA method is compatible with the printing technology for mass production, and as it can produce twin devices of high quality via one fabrication process, it can provide a remarkable reduction in the fabrication cost.
RESUMEN
This paper reports designing a novel single composition blue/red color illuminating phosphor followed by fabricating "smart" agricultural/horticultural LED lighting. Color-tunable Eu2+/Mn2+ co-activated alkaline earth phosphates, Na(Sr,Ba)PO4 and Ca3Mg3(PO4)4, are considered, and the stable doping sites for the corresponding activators are identified by using first-principle DFT calculations. We can realize the designated color purity with stable thermal quenching preserved luminescence behavior is induced by the Eu2+ center positioned at different coordination states with intermixed Sr2+/Ba2+ sites in Na(Sr,Ba)PO4 hosts. Moreover, we demonstrate that the resultant LED lighting adopting the proposed novel phosphor composition stimulates the enhanced photosynthesis reaction for indoor hydroponics plants, such as oats and onions, which is superior to the narrow line emission band induced by the mixture of conventional red/green/blue LEDs. Thus, using the color-tunable single composition luminescent material may produce an innovative energy-efficient artificial lighting for indoor plant growth.
Asunto(s)
Europio/química , Iluminación/instrumentación , Sustancias Luminiscentes/química , Manganeso/química , Fosfatos/química , Luminiscencia , Sustancias Luminiscentes/síntesis química , Metales Alcalinotérreos/química , Fosfatos/síntesis química , Desarrollo de la Planta/efectos de la radiaciónRESUMEN
With the recent emergence of flexible and wearable optoelectronic devices, the achievement of sufficient bendability and stretchability of transparent and conducting electrodes (TCEs) has become an important requirement. Although metal-mesh-based structures have been investigated for TCEs because of their excellent performances, the fabrication of mesh or grid structures with a submicron line width is still complex due to the requirements of laborious lithography and pattern transfer steps. Here, we introduce an extremely facile fabrication technique for metal patterns embedded in a flexible substrate based on submicron replication and an area-selective delamination (ASD) pattern. The high-yield, area-specific lift-off process is based on the principle of solvent-assisted delamination of deposited metal thin films and a mechanical triggering effect by soft wiping or ultrasonication. Our fabrication process is very simple, convenient, and cost-effective in that it does not require any lithography/etching steps or sophisticated facilities. Moreover, their outstanding optical and electrical properties (e.g., sheet resistances of 0.43 Ω sq-1 at 94% transmittance), which are markedly superior to those of other flexible TCEs, are demonstrated. Furthermore, there is no significant change of resistance over 1000 repeated bending cycles, with a bending radius of 5 mm, and immersion in various solvents such as salt water and organic solvents. Finally, we demonstrate high-performance transparent heaters and flexible touch panels fabricated using the nanomesh electrode, confirming the long-range electrical conduction and reliability of the electrode.