ABSTRACT
The study described in this paper was conducted in the framework of the European nPSize project (EMPIR program) with the main objective of proposing new reference certified nanomaterials for the market in order to improve the reliability and traceability of nanoparticle size measurements. For this purpose, bimodal populations as well as complexly shaped nanoparticles (bipyramids, cubes, and rods) were synthesized. An inter-laboratory comparison was organized for comparing the size measurements of the selected nanoparticle samples performed with electron microscopy (TEM, SEM, and TSEM), scanning probe microscopy (AFM), or small-angle X-ray scattering (SAXS). The results demonstrate good consistency of the measured size by the different techniques in cases where special care was taken for sample preparation, instrument calibration, and the clear definition of the measurand. For each characterization method, the calibration process is described and a semi-quantitative table grouping the main error sources is proposed for estimating the uncertainties associated with the measurements. Regarding microscopy-based techniques applied to complexly shaped nanoparticles, data dispersion can be observed when the size measurements are affected by the orientation of the nanoparticles on the substrate. For the most complex materials, hybrid approaches combining several complementary techniques were tested, with the outcome being that the reliability of the size results was improved.
ABSTRACT
Optical resonators are essential for fundamental science, applications in sensing and metrology, particle cooling, and quantum information processing. Cavities can significantly enhance interactions between light and matter. For many applications they perform this task best if the mode confinement is tight and the photon lifetime is long. Free access to the mode center is important in the design to admit atoms, molecules, nanoparticles, or solids into the light field. Here, we demonstrate how to machine microcavity arrays of extremely high quality in pristine silicon. Etched to an almost perfect parabolic shape with a surface roughness on the level of 2 Å and coated to a finesse exceeding F = 500,000, these new devices can have lengths below 17 µm, confining the photons to 5 µm waists in a mode volume of 88λ3. Extending the cavity length to 150 µm, on the order of the radius of curvature, in a symmetric mirror configuration yields a waist smaller than 7 µm, with photon lifetimes exceeding 64 ns. Parallelized cleanroom fabrication delivers an entire microcavity array in a single process. Photolithographic precision furthermore yields alignment structures that result in mechanically robust, pre-aligned, symmetric microcavity arrays, representing a light-matter interface with unprecedented performance.