Toward Predicting the Formation of Integral-Asymmetric, Isoporous Diblock Copolymer Membranes.

The self-assembly and nonsolvent-induced phase separation (SNIPS) process of block copolymers and solvents enables the fabrication of integral-asymmetric, isoporous membranes. An isoporous top layer is formed by evaporation-induced self-assembly (EISA) and imparts selectivity for ultrafiltration of functional macromolecules or water purification. This selective layer is supported by a macroporous bottom structure that is formed by nonsolvent-induced phase separation (NIPS) providing mechanical stability. Thereby the permeability/selectivity tradeoff is optimized. The SNIPS fabrication involves various physical phenomena-e.g., evaporation, self-assembly, macrophase separation, vitrification - and multiple structural, thermodynamic, kinetic, and process parameters. Optimizing membrane properties and rationally designing fabrication processes is a challenge which particle simulation can significantly contribute to. Using large-scale particle simulations, it is observed that 1) a small incompatibility between matrix-forming block of the copolymer and nonsolvent, 2) a glassy arrest that occurs at a smaller polymer concentration, or 3) a higher dynamical contrast between polymer and solvent results in a finer, spongy substructure, whereas the opposite parameter choice gives rise to larger macropores with an elongated shape. These observations are confirmed by comparison to experiments on polystyrene (PS)-block-poly(4-vinylpyridine) (P4VP) diblock copolymer membranes, varying the chemical nature of the coagulant or the temperature of coagulation bath.

Simulation of Membrane Fabrication via Solvent Evaporation and Nonsolvent-Induced Phase Separation.

Block copolymer membranes offer a bottom-up approach to form isoporous membranes that are useful for ultrafiltration of functional macromolecules, colloids, and water purification. The fabrication of isoporous block copolymer membranes from a mixed film of an asymmetric block copolymer and two solvents involves two stages: First, the volatile solvent evaporates, creating a polymer skin, in which the block copolymer self-assembles into a top layer, comprised of perpendicularly oriented cylinders, via evaporation-induced self-assembly (EISA). This top layer imparts selectivity onto the membrane. Subsequently, the film is brought into contact with a nonsolvent, and the exchange between the remaining nonvolatile solvent and nonsolvent through the self-assembled top layer results in nonsolvent-induced phase separation (NIPS). Thereby, a macroporous support for the functional top layer that imparts mechanical stability onto the system without significantly affecting permeability is fabricated. We use a single, particle-based simulation technique to investigate the sequence of both processes, EISA and NIPS. The simulations identify a process window, which allows for the successful in silico fabrication of integral-asymmetric, isoporous diblock copolymer membranes, and provide direct insights into the spatiotemporal structure formation and arrest. The role of the different thermodynamic (e.g., solvent selectivity for the block copolymer components) and kinetic (e.g., plasticizing effect of the solvent) characteristics is discussed.