High-Performance Screen-Printed Thermoelectric Films on Fabrics.

Printing techniques could offer a scalable approach to fabricate thermoelectric (TE) devices on flexible substrates for power generation used in wearable devices and personalized thermo-regulation. However, typical printing processes need a large concentration of binder additives, which often render a detrimental effect on electrical transport of the printed TE layers. Here, we report scalable screen-printing of TE layers on flexible fiber glass fabrics, by rationally optimizing the printing inks consisting of TE particles (p-type Bi0.5Sb1.5Te3 or n-type Bi2Te2.7Se0.3), binders, and organic solvents. We identified a suitable binder additive, methyl cellulose, which offers suitable viscosity for printability at a very small concentration (0.45-0.60 wt.%), thus minimizing its negative impact on electrical transport. Following printing, the binders were subsequently burnt off via sintering and hot pressing. We found that the nanoscale defects left behind after the binder burnt off became effective phonon scattering centers, leading to low lattice thermal conductivity in the printed n-type material. With the high electrical conductivity and low thermal conductivity, the screen-printed TE layers showed high room-temperature ZT values of 0.65 and 0.81 for p-type and n-type, respectively.

Unusually High and Anisotropic Thermal Conductivity in Amorphous Silicon Nanostructures.

Amorphous Si (a-Si) nanostructures are ubiquitous in numerous electronic and optoelectronic devices. Amorphous materials are considered to possess the lower limit to the thermal conductivity (κ), which is ∼1 W·m-1 K-1 for a-Si. However, recent work suggested that κ of micrometer-thick a-Si films can be greater than 3 W·m-1 K-1, which is contributed to by propagating vibrational modes, referred to as "propagons". However, precise determination of κ in a-Si has been elusive. Here, we used structures of a-Si nanotubes and suspended a-Si films that enabled precise in-plane thermal conductivity (κ∥) measurement within a wide thickness range of 5 nm to 1.7 µm. We showed unexpectedly high κ∥ in a-Si nanostructures, reaching ∼3.0 and 5.3 W·m-1 K-1 at ∼100 nm and 1.7 µm, respectively. Furthermore, the measured κ∥ is significantly higher than the cross-plane κ on the same films. This unusually high and anisotropic thermal conductivity in the amorphous Si nanostructure manifests the surprisingly broad propagon mean free path distribution, which is found to range from 10 nm to 10 µm, in the disordered and atomically isotropic structure. This result provides an unambiguous answer to the century-old problem regarding mean free path distribution of propagons and also sheds light on the design and performance of numerous a-Si based electronic and optoelectronic devices.

Fluid-like Surface Layer and Its Flow Characteristics in Glassy Nanotubes.

We show that amorphous silica and Si nanotubes can flow at room temperature under Giga-Pascal order stress when going to the nanometer scale. This creep behavior is unique for the amorphous nanotubes and is absent in crystalline Si nanotubes of similar dimensions. A core-shell model shows that there exists an approximately 1 nm thick viscoelastic "fluid-like" surface layer, which exhibits a room temperature viscosity equivalent to that of bulk glass above 1000 °C.

Highly stretchable, printable nanowire array optical polarizers.

Designing optical components such as polarizers on substrates with high mechanical deformability have potential to realize new device platforms in photonics, wearable electronics, and sensors. Conventional manufacturing approaches that rely highly on top-down lithography, deposition and the etching process can easily confront compatibility issues and high fabrication complexity. Therefore, an alternative integration scheme is necessary. Here, we demonstrate fabrication of highly flexible and stretchable wire grid polarizers (WGPs) by printing bottom-up grown Ge or Ge/Si core/shell nanowires (NWs) on device substrates in a highly dense and aligned fashion. The maximum contrast ratio of 104 between transverse electric (TE) and transverse magnetic (TM) fields and above 99% (maximum 99.7%) of light blocking efficiency across the visible spectrum range are achieved. Further systematic analyses are performed both in experimental and numerical models to reveal the correspondence between physical factors (coverage ratio of NW arrays and diameter) and polarization efficiency. Moreover, we demonstrate distinctive merits of our approach: (i) high flexibility in the choice of substrates such as glass, plastic, or elastomer; (ii) easy combination with additional novel functionalities, for example, air permeability, flexibility/stretchability, biocompatibility, and a skin-like low mechanical modulus; (iii) selective printing of polarizers on a designated local area.

Thermal transport in Si and Ge nanostructures in the 'confinement' regime.

Reducing semiconductor materials to sizes comparable to the characteristic lengths of phonons, such as the mean-free-path (MFP) and wavelength, has unveiled new physical phenomena and engineering capabilities for thermal energy management and conversion systems. These developments have been enabled by the increasing sophistication of chemical synthesis, microfabrication, and atomistic simulation techniques to understand the underlying mechanisms of phonon transport. Modifying thermal properties by scaling physical size is particularly effective for materials which have large phonon MFPs, such as crystalline Si and Ge. Through nanostructuring, materials that are traditionally good thermal conductors can become good candidates for applications requiring thermal insulation such as thermoelectrics. Precise understanding of nanoscale thermal transport in Si and Ge, the leading materials of the modern semiconductor industry, is increasingly important due to more stringent thermal conditions imposed by ever-increasing complexity and miniaturization of devices. Therefore this Minireview focuses on the recent theoretical and experimental developments related to reduced length effects on thermal transport of Si and Ge with varying size from hundreds to sub-10 nm ranges. Three thermal transport regimes - bulk-like, Casimir, and confinement - are emphasized to describe different governing mechanisms at corresponding length scales.

Sub-amorphous thermal conductivity in ultrathin crystalline silicon nanotubes.

Thermal transport behavior in nanostructures has become increasingly important for understanding and designing next generation electronic and energy devices. This has fueled vibrant research targeting both the causes and ability to induce extraordinary reductions of thermal conductivity in crystalline materials, which has predominantly been achieved by understanding that the phonon mean free path (MFP) is limited by the characteristic size of crystalline nanostructures, known as the boundary scattering or Casimir limit. Herein, by using a highly sensitive measurement system, we show that crystalline Si (c-Si) nanotubes (NTs) with shell thickness as thin as ∼5 nm exhibit a low thermal conductivity of ∼1.1 W m(-1) K(-1). Importantly, this value is lower than the apparent boundary scattering limit and is even about 30% lower than the measured value for amorphous Si (a-Si) NTs with similar geometries. This finding diverges from the prevailing general notion that amorphous materials represent the lower limit of thermal transport but can be explained by the strong elastic softening effect observed in the c-Si NTs, measured as a 6-fold reduction in Young's modulus compared to bulk Si and nearly half that of the a-Si NTs. These results illustrate the potent prospect of employing the elastic softening effect to engineer lower than amorphous, or subamorphous, thermal conductivity in ultrathin crystalline nanostructures.

Selective functionalization and loading of biomolecules in crystalline silicon nanotube field-effect-transistors.

Crystalline silicon nanotubes (Si NTs) provide distinctive advantages as electrical and biochemical analysis scaffolds through their unique morphology and electrical tunability compared to solid nanowires or amorphous/non-conductive nanotubes. Such potential is investigated in this report. Gate-dependent four-probe current-voltage analysis reveals electrical properties such as resistivity to differ by nearly 3 orders of magnitude between crystalline and amorphous Si NTs. Analysis of transistor transfer characteristics yields a field effect mobility of 40.0 cm(2) V(-1) s(-1) in crystalline Si NTs. The hollow morphology also allows selective inner/outer surface functionalization and loading capability either as a carrier for molecular targets or as a nanofluidic channel for biomolecular assays. We present for the first time a demonstration of internalization of fluorescent dyes (rhodamine) and biomolecules (BSA) in Si NTs as long as 22 µm in length.

Three-terminal nanoelectromechanical field effect transistor with abrupt subthreshold slope.

We report the first experimental demonstration of a three-terminal nanoelectromechanical field effect transistor (NEMFET) with measurable subthreshold slope as small as 6 mV/dec at room temperature and a switching voltage window of under 2 V. The device operates by modulating drain current through a suspended nanowire channel via an insulated gate electrode, thus eliminating the need for a conducting moving electrode, and yields devices that reliably switch on/off for up to 130 cycles. Radio-frequency measurements have confirmed operation at 125 MHz. Our measurements and simulations suggest that the NEMFET design is scalable toward sub-1 V ultrahigh-frequency operation for future low-power computing systems.

Misfit-guided self-organization of anticorrelated Ge quantum dot arrays on Si nanowires.

Misfit-strain guided growth of periodic quantum dot (QD) arrays in planar thin film epitaxy has been a popular nanostructure fabrication method. Engineering misfit-guided QD growth on a nanoscale substrate such as the small curvature surface of a nanowire represents a new approach to self-organized nanostructure preparation. Perhaps more profoundly, the periodic stress underlying each QD and the resulting modulation of electro-optical properties inside the nanowire backbone promise to provide a new platform for novel mechano-electronic, thermoelectronic, and optoelectronic devices. Herein, we report a first experimental demonstration of self-organized and self-limited growth of coherent, periodic Ge QDs on a one-dimensional Si nanowire substrate. Systematic characterizations reveal several distinctively different modes of Ge QD ordering on the Si nanowire substrate depending on the core diameter. In particular, Ge QD arrays on Si nanowires of around 20 nm diameter predominantly exhibit an anticorrelated pattern whose wavelength agrees with theoretical predictions. The correlated pattern can be attributed to propagation and correlation of misfit strain across the diameter of the thin nanowire substrate. The QD array growth is self-limited as the wavelength of the QDs remains unchanged even after prolonged Ge deposition. Furthermore, we demonstrate a direct kinetic transformation from a uniform Ge shell layer to discrete QD arrays by a postgrowth annealing process.

Tunable electronic transport characteristics of surface-architecture-controlled ZnO nanowire field effect transistors.

Surface-architecture-controlled ZnO nanowires were grown using a vapor transport method on various ZnO buffer film coated c-plane sapphire substrates with or without Au catalysts. The ZnO nanowires that were grown showed two different types of geometric properties: corrugated ZnO nanowires having a relatively smaller diameter and a strong deep-level emission photoluminescence (PL) peak and smooth ZnO nanowires having a relatively larger diameter and a weak deep-level emission PL peak. The surface morphology and size-dependent tunable electronic transport properties of the ZnO nanowires were characterized using a nanowire field effect transistor (FET) device structure. The FETs made from smooth ZnO nanowires with a larger diameter exhibited negative threshold voltages, indicating n-channel depletion-mode behavior, whereas those made from corrugated ZnO nanowires with a smaller diameter had positive threshold voltages, indicating n-channel enhancement-mode behavior.

Comparison of Si doping effect on GaN nanowires and films synthesized by metal-organic chemical vapor deposition.

We investigated Si doping effect on GaN nanowires and GaN films grown by metal-organic chemical vapor deposition (MOCVD). Si as n-type dopant is incorporated to GaN nanowires and GaN films controlled by SiH4 flow rate (0, 1, 5, 8, and 10 sccm). The charge concentration and mobility of GaN films increased and decreased, respectively, as increasing the SiH4 flow rate, whereas those for GaN nanowires were not influenced by the SiH4 flow rate. Significant vacancies and impurities resulted in the intense yellow band in GaN nanowires as compared with GaN films, which leads to the large device-to-device variation and negligible dependence of Si doping and the SiH4 flux rate on the electrical properties of GaN nanowires.