Revisiting Electronic Topological Transitions in the Silver-Palladium (AgcPd1-c) Solid Solution: An Experimental and Theoretical Investigation.

Multiple thick film samples of the AgcPd1-c solid solution were prepared using physical vapour deposition over a borosilicate glass substrate. This synthesis technique allows continuous variation in stoichiometry, while the distribution of silver or palladium atoms retains the arrangement into an on-average periodic lattice with smoothly varying unit cell parameters. The alloy concentration and geometry were measured over a set of sample points, respectively, via energy-dispersive X-ray spectroscopy and via X-ray diffraction. These results are compared with ab initio total energy and electronic structure calculations based on density functional theory, and using the coherent potential approximation for an effective medium description of disorder. The theoretically acquired lattice parameters appear in qualitative agreement with the measured trends. The numerical study of the Fermi surface also shows a variation in its topological features, which follow the change in silver concentration. These were related to the electrical resistivity of the AgcPd1-c alloy. The theoretically obtained variation exhibits a significant correlation with nonlinear changes in the resistivity as a function of composition. This combined experimental and theoretical study suggests the possibility of using resistivity measurements along concentration gradients as a way to gain some microscopic insight into the electronic structure of an alloy.

Interfacial Resistive Switching of Niobium-Titanium Anodic Memristors with Self-Rectifying Capabilities.

A broad compositional range of Nb-Ti anodic memristors with volatile and self-rectifying behaviour was studied using a combinatorial screening approach. A Nb-Ti thin-film combinatorial library was co-deposited by sputtering, serving as the bottom electrode for the memristive devices. The library, with a compositional spread ranging between 22 and 64 at.% Ti was anodically oxidised, the mixed oxide being the active layer in MIM-type structures completed by Pt discreet top electrode patterning. By studying I-U sweeps, memristors with self-rectifying and volatile behaviour were identified. Moreover, all the analysed memristors demonstrated multilevel properties. The best-performing memristors showed HRS/LRS (high resistive state/low resistive state) ratios between 4 and 6 × 105 and very good retention up to 106 successive readings. The anodic memristors grown along the compositional spread showed very good endurance up to 106 switching cycles, excluding those grown from alloys containing between 31 and 39 at.% Ti, which withstood only 10 switching cycles. Taking into consideration all the parameters studied, the Nb-46 at.% Ti composition was screened as the parent metal alloy composition, leading to the best-performing anodic memristor in this alloy system. The results obtained suggest that memristive behaviour is based on an interfacial non-filamentary type of resistive switching, which is consistent with the performed cross-sectional TEM structural and chemical characterisation.

Threshold Switching in Forming-Free Anodic Memristors Grown on Hf-Nb Combinatorial Thin-Film Alloys.

The development of novel materials with coexisting volatile threshold and non-volatile memristive switching is crucial for neuromorphic applications. Hence, the aim of this work was to investigate the memristive properties of oxides in a Hf-Nb thin-film combinatorial system deposited by sputtering on Si substrates. The active layer was grown anodically on each Hf-Nb alloy from the library, whereas Pt electrodes were deposited as the top electrodes. The devices grown on Hf-45 at.% Nb alloys showed improved memristive performances reaching resistive state ratios up to a few orders of magnitude and achieving multi-level switching behavior while consuming low power in comparison with memristors grown on pure metals. The coexistence of threshold and resistive switching is dependent upon the current compliance regime applied during memristive studies. Such behaviors were explained by the structure of the mixed oxides investigated by TEM and XPS. The mixed oxides, with HfO2 crystallites embedded in quasi amorphous and stoichiometrically non-uniform Nb oxide regions, were found to be favorable for the formation of conductive filaments as a necessary step toward memristive behavior. Finally, metal-insulator-metal structures grown on the respective alloys can be considered as relevant candidates for the future fabrication of anodic high-density in-memory computing systems for neuromorphic applications.

Impact of Electrolyte Incorporation in Anodized Niobium on Its Resistive Switching.

The aim of this study was to develop memristors based on Nb2O5 grown by a simple and inexpensive electrochemical anodization process. It was confirmed that the electrolyte selection plays a crucial role in resistive switching due to electrolyte species incorporation in oxide, thus influencing the formation of conductive filaments. Anodic memristors grown in phosphate buffer showed improved electrical characteristics, while those formed in citrated buffer exhibited excellent memory capabilities. The chemical composition of oxides was successfully determined using HAXPES, while their phase composition and crystal structure with conductive filaments was assessed by TEM at the nanoscale. Overall, understanding the switching mechanism leads towards a wide range of possible applications for Nb memristors either as selector devices or nonvolatile memories.

Comparative Behavior of Viscose-Based Supercapacitor Electrodes Activated by KOH, H2O, and CO2.

Activated carbons derived from viscose fibers were prepared using potassium hydroxide, carbon dioxide, or water vapor as activation agents. The produced activated carbon fibers were analyzed via scanning electron microscopy and energy dispersive X-ray spectroscopy, and their porosity (specific surface area, total pore volume, and pore size distribution) was calculated employing physisorption experiments. Activated carbon fibers with a specific surface area of more than 2500 m2 g-1 were obtained by each of the three methods. Afterwards, the suitability of these materials as electrodes for electrochemical double-layer capacitors (supercapacitors) was investigated using cyclic voltammetry, galvanostatic measurements, and electrochemical impedance spectroscopy. By combining CO2 and H2O activation, activated carbon fibers of high purity and excellent electrochemical performance could be obtained. A specific capacitance per electrode of up to 180 F g-1 was found. In addition, an energy density per double-layer capacitor of 42 W h kg-1 was achieved. These results demonstrate the outstanding electrochemical properties of viscose-based activated carbon fibers for use as electrode materials in energy storage devices such as supercapacitors.

Composite Memristors by Nanoscale Modification of Hf/Ta Anodic Oxides.

Composite memristors based on anodic oxidation of Hf superimposed on Ta thin films are studied. A layered structure is obtained by successive sputtering of Ta and Hf thin films. The deposition geometry ensured components' thickness gradient profiles (wedges) aligned in opposite directions. Anodization in citrate buffer electrolyte leads to a nanoscale columnar structuring of Ta2O5 in HfO2 due to the higher electrical resistance of the latter. Following the less resistive path, the ionic current forces Ta oxide to locally grow toward the electrolyte interface according to the Rayleigh-Taylor principle. The obtained composite oxide memristive properties are studied as a function of the Hf/Ta thickness ratio. One pronounced zone prominent for memristive applications is found for ratios between 4 and 5. Here, unipolar and bipolar memristors are found, with remarkable endurance and retention capabilities. This is discussed in the frame of conductive filament formation preferentially along the interfaces between oxides.

Electrolyte-Dependent Modification of Resistive Switching in Anodic Hafnia.

Anodic HfO2 memristors grown in phosphate, borate, or citrate electrolytes and formed on sputtered Hf with Pt top electrodes are characterized at fundamental and device levels. The incorporation of electrolyte species deep into anodic memristors concomitant with HfO2 crystalline structure conservation is demonstrated by elemental analysis and atomic scale imaging. Upon electroforming, retention and endurance tests are performed on memristors. The use of borate results in the weakest memristive performance while the citrate demonstrates clear superior memristive properties with multilevel switching capabilities and high read/write cycling in the range of 106. Low temperature heating applied to memristors shows a direct influence on their behavior mainly due to surface release of water. Citrate-based memristors show remarkable properties independent on device operation temperatures up to 100 °C. The switching dynamic of anodic HfO2 memristors is discussed by analyzing high resolution transmission electron microscope images. Full and partial conductive filaments are visualized, and apart from their modeling, a concurrency of filaments is additionally observed. This is responsible for the multilevel switching mechanism in HfO2 and is related to device failure mechanisms.

Gallium-Enhanced Aluminum and Copper Electromigration Performance for Flexible Electronics.

Wide range binary and ternary thin film combinatorial libraries mixing Al, Cu, and Ga were screened for identifying alloys with enhanced ability to withstand electromigration. Bidimensional test wires were obtained by lithographically patterning the substrates before simultaneous vacuum co-deposition from independent sources. Current-voltage measurement automation allowed for high throughput experimentation, revealing the maximum current density and voltage at the electrical failure threshold for each alloy. The grain boundary dynamic during electromigration is attributed to the resultant between the force corresponding to the electron flux density and the one corresponding to the atomic concentration gradient perpendicular to the current flow direction. The screening identifies Al-8 at. % Ga and Cu-5 at. % Ga for replacing pure Al or Cu connecting lines in high current/power electronics. Both alloys were deposited on polyethylene naphthalate (PEN) flexible substrates. The film adhesion to PEN is enhanced by alloying Al or Cu with Ga. Electrical testing demonstrated that Al-8 at. % Ga is more suitable for conducting lines in flexible electronics, showing an almost 50% increase in electromigration suppression when compared to pure Al. Moreover, Cu-5 at. % Ga showed superior properties as compared to pure Cu on both SiO2 and PEN substrates, where more than 100% increase in maximum current density was identified.

Electrochemical Screening of Tungsten Trioxide-Nickel Oxide Thin Film Combinatorial Library at Low Nickel Concentrations.

The electrochemical behavior of a tungsten trioxide-nickel oxide (WO3-NiO) thin film library was investigated using scanning droplet cell microscopy (SDCM) in 0.1 mol dm-3 sodium perchlorate (NaClO4) solution. The WO3-Ni film library was deposited by thermal coevaporation on an indium tin oxide (ITO)-coated glass substrate in an atomic Ni concentration range from 2.8 to 15.6 at. %. After an oxidation/crystallization heat treatment, the Ni was oxidized and the crystal structure of WO3-NiO was transformed from monoclinic WO3 (3.5 at. % Ni) to cubic WO3 (up to 7.1 at. % Ni) and again to monoclinic WO3 when the Ni amount increased (>11.8 at. %). Proton (H+) intercalation (cathodic reaction) and deintercalation (anodic reaction) into the WO3-NiO mixed phases was induced. Electrochemical impedance spectroscopy (EIS) and Mott-Schottky (M-S) analysis revealed that the WO3-NiO film has n-type bilayer capacitive property, with the outer capacitive layer having a higher defect density than the inner capacitive layer. With a Ni concentration of 7.1 at. %, the WO3-NiO film was the most defective in the library. Introduction of the Ni cation into the WO3 network was associated with changes of the semiconducting properties of the film.

Strong Volta potential change in doped zinc oxide as a photoresponse to UV irradiation.

Doped ZnO thin films on ITO substrates were prepared by reactive co-sputtering of ZnO and several dopant metals, namely Al, Mn, Ti, W or Zr. To elucidate the influence of the dopant, morphological and compositional investigations were performed applying SEM/EDX, XRD and AFM. The optical band gaps of the materials were determined by UV-VIS measurements and the subsequent analysis of the derived Tauc plots. SKP (Scanning Kelvin Probe) measurements were performed under alternating illumination periods in order to measure the CPD (contact potential difference) response on UV irradiation; effective donor concentrations were calculated from the SKP results. The obtained X-ray diffractograms revealed that W : ZnO is amorphous, whereas all other dopants form crystalline structures with diffraction angles shifted towards lower values. SEM and AFM imaging revealed a significant influence of the dopant on the film morphology. The optical band gap values are in the range of the ZnO value (∼3.30 eV), with the lowest value of 3.29 eV being measured for Mn : ZnO. An exception was found for W : ZnO, which exhibits significant band gap widening reaching 4.35 eV. The effective donor concentrations are low for all samples under dark conditions, whereas they showed enhanced values under illumination. The sensitivity of all materials towards illumination makes them promising candidates for future research activities in the field of photovoltaics.

Basic properties mapping of anodic oxides in the hafnium-niobium-tantalum ternary system.

A thin film combinatorial library deposited by co-sputtering of Hf, Nb and Ta was employed to characterise fundamental properties of the Hf-Nb-Ta system. Compositional mappings of microstructure and crystallography revealed similarities in alloy evolution. Distinct lattice distortion was observed upon addition of hexagonal Hf, leading to amorphisation of alloys containing more than 32 at.% Hf and less than 27 and 41 at.% Nb and Ta, respectively. Volta potential and open circuit potential mappings indicated minimal values for the highest Hf concentration. Localised anodisation of the library by scanning droplet cell microscopy revealed valve metal behaviour. Oxide formation factors above 2 nm V-1 were identified in compositional zones with high amounts of Nb and Ta. Fitting of electrochemical impedance spectroscopy data allowed electrical permittivity and resistivity of mixed oxides to be mapped. Their compositional behaviours were attributed to characteristics of the parent metal alloys and particularities of the pure oxides. Mott-Schottky analysis suggested n-type semiconductor properties for all Hf-Nb-Ta oxides studied. Donor density and flat-band potential were mapped compositionally, and their variations were found to be related mainly to the Nb amount. Synergetic effects were identified in mappings of Hf-Nb-Ta parent metals and their anodic oxides.

Compositionally Dependent Nonlinear Optical Bandgap Behavior of Mixed Anodic Oxides in Niobium-Titanium System.

Optical bandgap mapping of Nb-Ti mixed oxides anodically grown on a thin film parent metallic combinatorial library was performed via variable angle spectroscopic ellipsometry (VASE). A wide Nb-Ti compositional spread ranging from Nb-90 at.% Ti to Nb-15 at.% Ti deposited by cosputtering was used for this purpose. The Nb-Ti library was stepwise anodized at potentials up to 10 V SHE, and the anodic oxides optical properties were mapped along the Nb-Ti library with 2 at.% resolution. The surface dissimilarities along the Nb-Ti compositional gradient were minimized by tuning the deposition parameters, thus allowing a description of the mixed Nb-Ti oxides based on a single Tauc-Lorentz oscillator for data fitting. Mapping of the Nb-Ti oxides optical bandgap along the entire compositional spread showed a clear deviation from the linear model based on mixing individual Nb and Ti electronegativities proportional to their atomic fractions. This is attributed to the strong amorphization and an in-depth compositional gradient of the mixed oxides. A systematic optical bandgap decrease toward values as low as 2.0 eV was identified at approximately 50 at.% Nb. Mixing of Nb2O5 and TiO2 with both amorphous and crystalline phases is concluded, whereas the possibility of complex NbaTibOy oxide formation during anodization is unlikely.

Anodic oxide formation on aluminium-terbium alloys.

Aluminium terbium alloys were prepared by simultaneous thermal evaporation resulting in a thin film library covering a 5 to 25 at.% Tb compositional spread. Synchrotron x-ray diffraction (XRD) proves all of the alloys to be amorphous. Scanning electron microscopy (SEM) measurements reveal the structural changes upon increase in Tb content with the formation of small, Tb-rich segregations right before a drastic change in morphology around 25 at.% Tb. Anodic oxides were formed systematically in cyclic voltammograms using scanning droplet cell microscopy. Coulometric analysis revealed a linear thickness over formation potential behaviour with film formation factors ranging from 1.2 nm V-1 (5 at.% Tb) to 1.6 nm V-1 (25 % Tb). Electrochemical impedance spectroscopy was performed for each incremental oxidation step resulting in a linear relation between inverse capacity and formation potential with dielectric constants ranging from 8 (5 at.% Tb) to 16 (25 at.% Tb).

Photoelectrochemical scanning droplet cell microscopy for localized photovoltaic investigations on organic semiconductors.

Photoelectrochemical characterization of the regioregular poly(3-hexylthiophene) (P3HT) was performed using an adapted version of a photoelectrochemical scanning droplet cell microscope (PE-SDCM). The real and imaginary parts of the dielectric function were determined using spectroscopic ellipsometry in order to identify the absorption region of the polymer. Detailed photoelectrochemical experiments were performed for the thin polymer layer contacted with 0.1 M tetrabutylammonium hexafluorophosphate dissolved in propylene carbonate as well as with an electrolyte containing a 5.4 mM ferrocene/ferrocenium redox couple. The effect of the illumination on the P3HT covered WE in contact with both the pure electrolyte and an electrolyte containing a ferrocene/ferrocenium redox couple was studied using dark/illumination sequences. The stability of the photovoltaic effect was characterized using long term current transients. Finally, the photoelectrochemical impedance spectroscopy was applied to determine the electrical properties of the P3HT in the dark and under illumination.

Properties of anodic oxides grown on a hafnium-tantalum-titanium thin film library.

A ternary thin film combinatorial materials library of the valve metal system Hf-Ta-Ti obtained by co-sputtering was studied. The microstructural and crystallographic analysis of the obtained compositions revealed a crystalline and textured surface, with the exception of compositions with Ta concentration above 48 at.% which are amorphous and show a flat surface. Electrochemical anodization of the composition spread thin films was used for analysing the growth of the mixed surface oxides. Oxide formation factors, obtained from the potentiodynamic anodization curves, as well as the dielectric constants and electrical resistances, obtained from electrochemical impedance spectroscopy, were mapped along two dimensions of the library using a scanning droplet cell microscope. The semiconducting properties of the anodic oxides were mapped using Mott-Schottky analysis. The degree of oxide mixing was analysed qualitatively using x-ray photoelectron spectroscopy depth profiling. A quantitative analysis of the surface oxides was performed and correlated to the as-deposited metal thin film compositions. In the concurrent transport of the three metal cations during oxide growth a clear speed order of Ti > Hf > Ta was proven.

Localized photovoltaic investigations on organic semiconductors and bulk heterojunction solar cells.

Newly synthesized organic electronics materials are often available in submicrogram amounts only. Photoelectrochemical scanning droplet cell microscopy is a powerful method that allows a comprehensive characterisation of such small amounts including oxidation, reduction potentials, doping, determination of charge carriers, band gap, charge capacity, over-oxidation sensitivity and many more. Localized photoelectrochemical characterization of the poly[4,8-bis-substituted-benzo[1,2-b:4,5-b0]dithiophene-2,6-diyl-alt-4-substituted-thieno [3,4-b] thiophene-2,6-diyl] (PBDTTT-c) and PBDTTT-c:PCBM bulk heterojunction was performed using photoelectrochemical scanning droplet cell microscopy (PE-SDCM). The optical properties and the real and imaginary part of the dielectric function, of the polymer were determined using spectroscopic ellipsometry. The photoelectrochemical characterizations were performed in a three and two electrode configuration of PE-SDCM under laser and white light illumination. The effect of illumination was characterized using dark/illumination sequences. The stability of the photocurrent was studied using longer term (600 s) illumination. Finally the effect of cell configuration and illumination conditions on the photovoltage was studied.

Localized photoelectrochemistry on a tungsten oxide-iron oxide thin film material library.

A WO3-Fe2O3 thin film combinatorial library was fabricated using a vapor phase co-deposition method followed by a combined thermal annealing and oxidation process. The scanning electron microscopy (SEM) analysis of the library microstructure combined with X-ray diffraction (XRD) investigations suggested that α-Fe2O3 grains preferentially grow from boundaries of domains, containing finer grains of WO3 and Fe2WO6, forming filiform networks on the surface. The surface density of the hematite networks depends on the amount of Fe present in the library. Photocurrents measured at different applied biases using Photo Electrochemical Scanning Droplet Cell Microscopy (PE-SDCM) were analyzed and mapped along the entire compositional spread. A distinctive photocurrent peak was detected at 21.9 atom % Fe, and its appearance was correlated to the higher amount of hematite present in the library at this specific composition together with a specific WO3 crystallographic orientation ((222) orthorhombic or (400) monoclinic). This finding is confirmed by qualitative and quantitative XPS surface analysis at the photocurrent peak position in the material library. Thus the enhancement of the photocurrent cannot be exclusively attributed to certain surface modifications since only hematite was found on the library surface at the peak composition.

Photoelectrochemical scanning droplet cell microscopy (PE-SDCM).

Principles of localised photoelectrochemistry are summarised and an experimental approach is described that allows the performance of the most important photoelectrochemical experiments within a diameter of 100 µm. Various light sources, such as a continuum emitter with a monochromator, LEDs, and lasers are coupled into a multi-mode fibre to illuminate a small spot that is wetted by the electrolyte from a capillary. Reference electrode, counter electrode, and optical fibre are installed in the capillary system. The performance of this system is demonstrated by photocurrent measurements on n-doped Si and p-doped Si as model substrates. A thickness-graded aluminium thin film for partial shadowing on Si proves the applicability for material library investigations in combinatorial materials science. Further experiments demonstrate the possibility of electrical light chopping as well as impedance spectroscopy with subsequent Mott-Schottky analysis for the determination of charge-carrier concentration and type, flat-band potential, and inversion layer formation. Photoelectrochemical scanning droplet cell microscopy (PE-SDCM) is an extremely versatile tool for the screening of water splitting photoelectrodes, the characterisation of photocatalysts, and high throughput characterisation of microgram amounts of new solar cell materials.

Characterization of local electrochemical doping of high performance conjugated polymer for photovoltaics using scanning droplet cell microscopy.

The electrochemical oxidation of a next generation low bandgap high performance photovoltaic material namely poly[4,8-bis-substituted-benzo[1,2-b:4,5-b0]dithiophene-2,6-diyl-alt-4-substituted-thieno[3,4-b] thiophene-2,6-diyl] (PBDTTT-c) thin film was investigated using a scanning droplet cell microscope. Cyclic voltammetry was used for the basic characterization of the oxidation/doping of PBDTTT-c. Application of the different final potentials during the electrochemical study provides a close look to the oxidation kinetics. The electrical properties of both doped and undoped PBDTTT-c were analyzed in situ by electrochemical impedance spectroscopy giving the possibility to correlate the changes in the doping level with the subsequent changes in the resistance and capacitance. As a result one oxidation peak was found during the cyclic voltammetry and in potentiostatic measurements. From Mott-Schottky analysis a donor concentration of 2.3 × 1020 cm-3 and a flat band potential of 1.00 V vs. SHE were found. The oxidation process resulted in an increase of the conductivity by two orders of magnitude reaching a maximum for the oxidized form of 1.4 S cm-1.

Quantitative optical recognition of highly reproducible ultrathin oxide films in microelectrochemical anodization.

Automatized microelectrochemical investigations are achieved using a scanning droplet cell. The area reproducibility for a 100 mum oxide spot is found to be better than 1%, a value typically difficult to reach even in macroscopic samples. A systematic change in color appearance is seen for oxide films with a thickness ranging from 14 to 27 nm. Analysis of optical images yields a strictly linear relation between relative transmission and anodization charge and thus allows determination of the oxide thickness with a remarkable precision better than 0.5 nm at an absolute film thickness value that is at least a factor of 20 smaller than the wavelength of light.