Topology Effect on Order-Disorder Transition of High-χ Block Copolymers.

This work aims to systematically examine the topology effect on the self-assembly of block copolymers. Compositionally, symmetric polystyrene-block-polydimethylsiloxane block copolymers (BCPs) with different chain topologies (diblock, three-arm star-block, and four-arm star-block) and various molecular weights are synthesized. These purposely designed block copolymers are used as a model system to investigate the topology effect on order-to-disorder transition temperature (T ODT) by temperature-resolved small-angle X-ray scattering experiments. An increase of the T ODT is observed when the arm number of BCPs with equivalent arm length (i.e., molecular weight) is increased from one to four. Based on the random-phase approximation (RPA), Flory-Huggins interaction parameter (χ) is determined from the regression of the measured T ODT. The observation by differential scanning calorimetry also demonstrates the shifting of the endothermic peak from the order-to-disorder transition of star-blocks to the higher temperature region, consistent with the scattering experiments and the RPA prediction.

Sequential Self-Assembly of Polystyrene-block-Polydimethylsiloxane for 3D Nanopatterning via Solvent Annealing.

This study aims to develop a strategy for the fabrication of multilayer nanopatterns through sequential self-assembly of lamella-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS) block copolymer (BCP) from solvent annealing. By simply tuning the solvent selectivity, a variety of self-assembled BCP thin-film morphologies, including hexagonal perforated lamellae (HPL), parallel cylinders, and spheres, can be obtained from single-composition PS-b-PDMS. By taking advantage of reactive ion etching (RIE), topographic SiO2 monoliths with well-ordered arrays of hexagonally packed holes, parallel lines, and hexagonally packed dots can be formed. Subsequently, hole-on-dot and line-on-hole hierarchical textures can be created through a layer-by-layer process with RIE treatment as evidenced experimentally and confirmed theoretically. The results demonstrated the feasibility of creating three-dimensional (3D) nanopatterning from the sequential self-assembly of single-composition PS-b-PDMS via solvent annealing, providing an appealing process for nano-MEMS manufacturing based on BCP lithography.