Quantification of Carbonic Contamination of Fused Silica Surfaces at Different Stages of Classical Optics Manufacturing.

The chemical composition of ground and polished fused silica glass surfaces plays a decisive role in different applications of optics. In particular, a high level of carbon impurities is often undesirable for further processing and especially for gluing or cementing where adhesion failure may be attributed to carbonic surface-adherent contaminants. In this study, the surface carbon content at different stages of classical optics manufacturing was thus investigated. Two different standard processes-grinding and lapping with two final polishing processes using both polyurethane and pitch pads-were considered. After each process step, the chemical composition and roughness of the surface were analysed using X-ray photoelectron spectroscopy and atomic force microscopy. An obvious correlation between surface roughness and effective surface area, respectively, and the proportion of carbon contamination was observed. The lowest carbon contamination was found in case of lapped and pitch polished surfaces.

In Situ Investigation of the Formation Kinematics of Plasma-Generated Silver Nanoparticles.

In this publication, it is shown how to synthesize silver nanoparticles from silver cations out of aqueous solutions by the use of an atmospheric pressure plasma source. The use of an atmospheric pressure plasma leads to a very fast reduction of silver ions in extensive solvent volumes. In order to investigate the nanoparticle synthesis process, ultraviolet/visible (UV/VIS) absorption spectra were recorded in situ. By using transmission electron microscopy and by the analysis of UV/VIS spectra, the kinetics of silver nanoparticle formation by plasma influence can be seen in more detail. For example, there are two different sections visible in the synthesis during the plasma exposure process. The first section of the synthesis is characterized by a linear formation of small spherical particles of nearly constant size. The second section is predominated by saturation effects. Here, particle faults are increasingly formed, induced by changes in the particle shape and the fusion of those particles. The plasma exposure time, therefore, determines the shape and size distribution of the nanoparticles.

Fast, Noncontact, Wafer-Scale, Atomic Layer Resolved Imaging of Two-Dimensional Materials by Ellipsometric Contrast Micrography.

Adequate characterization and quality control of atomically thin layered materials (2DM) has become a serious challenge particularly given the rapid advancements in their large area manufacturing and numerous emerging industrial applications with different substrate requirements. Here, we focus on ellipsometric contrast micrography (ECM), a fast intensity mode within spectroscopic imaging ellipsometry, and show that it can be effectively used for noncontact, large area characterization of 2DM to map coverage, layer number, defects and contamination. We demonstrate atomic layer resolved, quantitative mapping of chemical vapor deposited graphene layers on Si/SiO2-wafers, but also on rough Cu catalyst foils, highlighting that ECM is applicable to all application relevant substrates. We discuss the optimization of ECM parameters for high throughput characterization. While the lateral resolution can be less than 1 µm, we particularly explore fast scanning and demonstrate imaging of a 4″ graphene wafer in 47 min at 10 µm lateral resolution, i.e., an imaging speed of 1.7 cm2/min. Furthermore, we show ECM of monolayer hexagonal BN (h-BN) and of h-BN/graphene bilayers, highlighting that ECM is applicable to a wide range of 2D layered structures that have previously been very challenging to characterize and thereby fills an important gap in 2DM metrology.

Investigation of nonuniform surface properties of classically manufactured fused silica windows.

We report on investigations of the spatial variations of contamination, roughness, and index of refraction of classically manufactured polished fused silica surfaces. Therefore, laser-induced breakdown spectroscopy was used to probe surface and subsurface impurities via the detection of aluminum. Measurements at different positions on the surface of the cylindrical fused silica windows evidenced an almost contamination-free center region, whereas a relatively large contamination area was found close to the edge. In-depth measurements verify the presence of aluminum atoms in the bulk until a depth of several tens of microns for the edge region. In addition, atomic force microscopic measurements show that the surface roughness is larger in the center region compared to the edge. Further, the index of refraction increases from the center region towards the edge as measured via ellipsometry. The results indicate a nonuniform impact of the grinding, lapping, and polishing tools on the surface. The findings turn out to be of specific interest for different applications, particularly for the realization of large-scale high-performance coatings.

Increase in nanosecond laser-induced damage threshold of sapphire windows by means of direct dielectric barrier discharge plasma treatment.

In this Letter we present a novel approach for increasing the nanosecond laser-induced damage threshold (LIDT) of sapphire windows. It is shown that after direct dielectric barrier discharge plasma treatment at atmospheric pressure for 90 s the LIDT is increased by a factor of 1.5 with respect to untreated samples. Several possible underlying mechanisms are introduced. For instance, organic contaminants and residues from polishing agents were removed by the plasma as ascertained by XPS measurements.

Near-surface modification of optical properties of fused silica by low-temperature hydrogenous atmospheric pressure plasma.

In this Letter, we report on the near-surface modification of fused silica by applying a hydrogenous atmospheric pressure plasma jet at ambient temperature. A significant decrease in UV-transmission due to this plasma treatment was observed. By the use of secondary ion mass spectroscopy, the composition of the plasma-modified glass surface was investigated. It was found that the plasma treatment led to a reduction of a 100 nm thick SiO2 layer to SiOx of gradual depth-dependent composition. For this plasma-induced layer, depth-resolved characteristic optical parameters, such as index of refraction and dispersion, were determined. Further, a significant plasma-induced increase of the concentration of hydrogen in the bulk material was measured. The decrease in transmission is explained by the plasma-induced near-surface formation of SiOx on the one hand and the diffusion of hydrogen into the bulk material on the other hand.