Influence of Physicochemical Properties of Ni/Clinoptilolite Catalysts in the Hydrogenation of Acetophenone.

Heterogeneous catalytic hydrogenation is an interesting alternative to conventional methods that use inorganic hydrides. The hydrogenation of acetophenone under heterogeneous conditions with the supported catalysts based on Ni is the most useful due to its redox properties and lower cost. As is well-known, catalyst support can significantly affect catalyst performance. We have investigated the influence of various physical-chemical parameters on the selective reaction of the hydrogenation of acetophenone by using different nickel catalysts on clinoptilolite supports, in four different forms: natural, previously modified with NH3 (Ni/Z+NH4 +), with HNO3 (Ni/Z+H+), and thermally treated (Ni/Z 500 °C). In particular, our work focuses on determining the influence of the mentioned physical-chemical parameters on the percentages of conversion and the selectivity of the catalysis. This study aims to identify the combination of parameters that allows for obtaining the best catalytic results. The identification of the physical-chemical parameters that determine the percentages of conversion and selectivity allows us to design optimal catalysts.

Determination of thickness-dependent damping constant and plasma frequency for ultrathin Ag and Au films: nanoscale dielectric function.

This paper is devoted to determine an analytical expression for the thickness dependent complex dielectric function for the case of Ag and Au thin films. Free and bound electron contributions are dealt with independently. Using Drude model for the former and taking experimental refractive index values for Ag and Au thin films, we apply a previously developed method to determine for the first time damping constant and plasma frequency parameters for specific film thicknesses. Fitting separately each one of these parameters allowed us to find an analytical expression for their dependence on arbitrary film thickness and consequently for the free electron contribution. Concerning bound electrons, its contribution for small wavelengths is the same for all analyzed thicknesses and may be set equal to the bulk bound contribution. Taking these facts into account, the complex dielectric function is rewritten analytically, in terms of bulk dielectric function plus corrective film thickness dependent terms. From the fitting process for the damping constant we determine that electron scattering at the film boundary is mainly inelastic for both silver and gold thin films. It is also shown that, in accordance with theoretical studies, plasma frequency shows a red shift as the film thickness decreases.

Textural Characterization by Using an Alternative Langmuir Isotherm and a New Thickness Function.

Samples with micropores can not be adequately described by using the Langmuir isotherm. The Langmuir expression is obtained by using the monolayer assumption, which is not valid in samples with micropores. Then, we propose to include in the isotherm a corrective parameter related to the sample porosity. We show that the modified isotherm enables us to describe the experimental values for different samples (aluminas, clays, silicas, zeolites, and zirconias) in low and full relative pressure ranges. Indeed, a new thickness function for the adsorbate layer in terms of the relative pressure is proposed. Then, a better description of the external surface areas, mesopores, and micropores of the samples can be obtained with the new thickness function. The VBS model with this new thickness shows a better pore distribution description.