Preparation of Silicophosphate Alternating Hybrid Copolymers via Nonaqueous Acid-Base Reactions of Phosphoric Acid and Organo-Bridged Bis(chlorosilane).

A design of atomic and oligomer level structure in organic-inorganic hybrid materials is highly important for various applications. Nonaqueous acid-base reaction allows us to prepare silicophosphates with controlled inorganic networks (-(O-P-O-Si)n) at atomic level because phosphorous and silicon-based precursors can react directly, resulting in an alternating copolymer network. Organic functionalization in those materials has been realized so far by using organic-modified phosphorous acid and/or organo-chlorosilane as precursors. In the present study, silicophosphate oligomers exhibiting inorganic-organic hybrid chains of (-(O-P-O-Si-R-Si)n) (R: bridging organic functional groups), are prepared from phosphoric acid and organo-bridged bis(chlorosilane). The 1, 2-bis(chlorodimethylsilyl)ethane ((C2H4)(Me2SiCl)2) and 1, 4-bis(chlorodimethylsilyl)benzene ((C6H4)(Me2SiCl)2) were used as organo-bridged bis(chlorosilane). Different types of silicophosphate oligomers with different network structures and terminal groups (P-OH and/or Si-Cl) were prepared by changing the reaction temperature and molar ratio of precursors. The formation of low molecular weight oligomers of ring and cage morphologies (ring tetramer, cage pentamer, and ring hexamer) is suggested in the product prepared from phosphoric acid and (C6H4)(Me2SiCl)2 molecule at 150 °C. Those silicophosphate hybrid oligomers are expected to be used as building blocks of hybrid materials with well-defined network structures for desired functionalities.

Removal of radioactive Cs from gravel conglomerate using water containing air bubbles.

Remediation of sites contaminated with radioactive material such as Cs is important because of the risk posed to human health. Here, we report the effectiveness of water containing air bubbles with a diameter around 100 nm (nanobubbled water, NB water) for the removal of radioactive Cs. Laboratory experiments confirmed that NB water is more effective than purified water and as effective as water with neutral detergent in the removal of Cs-137 from gravel. Moreover, NB water retains its effectiveness even after storage for 7 d. Finally, NB water produced onsite from tap water was found to be effective for removal of radioactive Cs from gravel conglomerate in Fukushima, Japan.

Correlation between emission property and concentration of Sn2+ center in the SnO-ZnO-P2O5 glass.

The authors report on the correlation between the photoluminescence (PL) property and the SnO amount in SnO-ZnO-P2O5 (SZP) glass. In the PL excitation (PLE) spectra of the SZP glass containing Sn2+ emission center, two S1 states, one of which is strongly affected by SnO amount, are assumed to exist. The PLE band closely correlates with the optical band edge originating from Sn2+ species, and they both largely red-shifts with increasing amount of SnO. The emission decay time of the SZP glass decreased with increasing amount of SnO and the internal quantum efficiencies of the SZP glasses containing 1~5 mol% of SnO are comparable to that of MgWO4. It is expected that the composition-dependent S1 state (the lower energy excitation band) governs the quantum efficiency of the SZP glasses.

White light emission of Mn-doped SnO-ZnO-P2O5 glass containing no rare earth cation.

The authors have demonstrated white light emission of rare earth (RE)-free Mn-doped SnO-ZnO-P(2)O(5) glass. The RE-free glass shows white light emission with a high value of quantum efficiency (QE) comparable to conventional crystalline phosphor. It is notable that the high QE value is attained for RE-free transparent glass, and the broad emission can be continuously tuned by both the amount of activator and the composition of the glass. Since this glass possesses low-melting property, we emphasize that the glass phosphor will lead to the development of a novel inorganic white-light-emitting device in combination with a solid state UV light-emitting source.

Effects of organic groups on structure and viscoelastic properties of organic-inorganic polysiloxane hybrid system.

The structure and viscoelastic properties of an organic-inorganic hybrid system composed of an organically modified polysiloxane network were examined, and the influence of organic groups on elastic-modulus variation by heat treatment was studied. The increase in the number of phenyl (Ph) groups per silicon decelerates the increase in elastic modulus; the substitution of the Ph group for a methyl (Me) group accelerates it. The system basically consists of R4-mSi[O-]m/2 units, where R is the organic group. The 29Si magic-angle spinning (MAS) NMR and gel permeation chromatography (GPC) measurements classified the structure related with the viscoelastic behavior into two factors: the number of bridging oxygens and the distribution of molecular weight. The elastic modulus was expressed by these structural factors through a simple empirical formula, irrespective of the type and number of the organic groups. The effects of the organic groups on the variation in elastic modulus by heat treatment were found to work mostly only through the molecular-weight change, and such effects can be controlled by the type or the number of organic groups.

Template-free magnesium oxide hollow sphere inclusion in organic-inorganic hybrid films via sol-gel reaction.

Magnesium oxide hollow spheres without a template core were conveniently prepared by stabilized bubble formation in a hybrid solution containing a magnesium acetate precursor, thus avoiding the complicated preparation process using a template. The hollow sphere could be aligned along the radial striation by spin coating, and its diameter from a micrometer to submicrometer dimension could be easily modified by the solution composition. It was also possible to control the open or closed hollow sphere by changing the solvent. Thus, the produced magnesium oxide hollow sphere is envisioned to have applications in many areas such as medicine, analysis, optics, and so on.

Viscoelastic and structural properties of a phenyl-modified polysiloxane system with a three-dimensional structure.

The relationships between the viscoelastic and structural properties of glass-forming materials with polysiloxane bonds, which serve as network formers, and phenyl groups, which act as network terminators, are examined based on shear viscoelasticity, (29)Si MAS NMR, and GPC measurements during the early stages of the network-forming process. The viscosities of the present samples do not depend on the frequency at temperatures up to 200 degrees C, suggesting that the origin of the viscous flow does not include intermolecular entanglement. According to the results of the strain dependence of the elastic modulus, the bridging-oxygen number, and molecular weight, the present polysiloxane system has a complex structure, or distribution of various-sized molecules composed of a polysiloxane network with various dimensionalities, and furthermore an elementary process of the viscosity is simple flow of these molecules. The structural factors that determine the viscosity and its temperature dependence are categorized into the molecular size and the intramolecular structure by using a theory based on the free-volume model. The relationship between the viscosity and the structure around the glass transition temperature is quantitatively examined and it is concluded that introducing larger numbers of Ph groups makes the viscosity less sensitive to structural factors.

Photosensitive GeO2-SiO2 films for ultraviolet laser writing of channel waveguides and bragg gratings with Cr-loaded waveguide structure.

Irradiation with intense ultraviolet laser pulses induced a large refractive-index change in 30GeO2-70SiO2 waveguide-grade thin films prepared by the plasma-enhanced chemical vapor deposition method, which contained a large amount of photoactive Ge2+ defects. The maximum index change in the as-deposited films by KrF and XeF excimer laser irradiation was estimated to be 1.2 x 10(-3) and 0.28 x 10(-3), respectively. These results clearly indicate that the photorefractivity of GeO2-SiO2 glasses is due to a Ge2+ defect in origin. The channel waveguide and the planar Bragg gratings were directly written in the photoactive Ge(2+)-enriched GeOs-SiO2 thin films by pulsed ultraviolet laser irradiation with a Cr-metal-loaded-type waveguide structure.