ABSTRACT
To visualize the topography of thin oxide films during growth, thereby enabling to study its growth behavior quasi real-time, we have designed and integrated an atomic force microscope (AFM) in a pulsed laser deposition (PLD) vacuum setup. The AFM scanner and PLD target are integrated in a single support frame, combined with a fast sample transfer method, such that in situ microscopy can be utilized after subsequent deposition pulses. The in situ microscope can be operated from room temperature up to 700 °C and at (process) pressures ranging from the vacuum base pressure of 10-6 mbar up to 1 mbar, typical PLD conditions for the growth of oxide films. The performance of this instrument is demonstrated by resolving unit cell height surface steps and surface topography under typical oxide PLD growth conditions.
ABSTRACT
Atomic force microscopy is one of the most popular imaging tools with atomic resolution in different research fields. Here, a fast and gentle side approach for atomic force microscopy is proposed to image the same surface location and to reduce the time delay between modification and imaging without significant tip degradation. This reproducible approach to image the same surface location using atomic force microscopy shortly after, for example, any biological, chemical, or physical modification on a geometrically separated position has the potential to become widely used.
