Regulation of RDN on Th1/ILC1 cell imbalance in HFMD patients caused by EV71 infection.

Enterovirus 71 (EV71) infection is more likely to cause hand, foot and mouth disease (HFMD) in children, which can lead to neurogenic complications and higher mortality. As a commonly used clinical medicine, Reduning injection (RDN) helps to shorten the symptoms of patients with HFMD and facilitate the early recovery of children. However, the regulatory mechanism of RDN on the HFMD immune system disorder caused by EV71 remains to be discussed. This study collected detailed treatment data of 56 children with HFMD who entered the affiliated Children's Hospital of Nanjing Medical University during 2019. Retrospective analysis of clinical data showed that the symptoms of the RDN treatment group were improved compared with the untreated group. To explore its mechanism, the relevant detection indicators were detected by flow cytometry, enzyme-linked immunosorbent assay and real-time quantitative PCR. It was found that the number and function of innate immune (ILCs) and adaptive immunity (Th1, Th2 and secreted cytokines) were reduced, suggesting that RDN plays a role by regulating cellular immunity. The in vitro differentiation inhibition test further confirmed that RDN affected Th1 differentiation by inhibiting the expression of transcription factors on the basis of Th1 cell differentiation in vitro.

Fluid-Structure Coupling Effects in a Dual U-Tube Coriolis Mass Flow Meter.

Coriolis mass flowmeters are highly customized products involving high-degree fluid-structure coupling dynamics and high-precision manufacture. The typical delay from from order to shipment is at least 4 months. This paper presents some important design considerations through simulation and experiments, so as to provide manufacturers with a more time-efficient product design and manufacture process. This paper aims at simulating the fluid-structure coupling dynamics of a dual U-tube Coriolis mass flowmeter through the COMSOL simulation package. The simulation results are experimentally validated using a dual U-tube CMF manufactured by Yokogawa Co., Ltd. in a TAF certified flow testing factory provided by FineTek Co., Ltd. Some important design considerations are drawn from simulation and experiment. The zero drift will occur when the dual U-tube structure is unbalanced and therefore the dynamic balance is very important in the manufacturing of dual U-tube CMF. The fluid viscosity can be determined from the driving current of the voice coil actuator or the pressure loss between the inlet and outlet of CMF. Finally, the authors develop a simulation application based on COMSOL's development platform. Users can quickly evaluate their design through by using this application. The present application can significantly shorten product design and manufacturing time.

Deep and alignment free patterned etching of GaN surface using an atomic force microscope.

Successful deep and alignment-free patterned etching on GaN using atomic force microscope (AFM) local oxidation followed by in-situ chemical etching is demonstrated. Oxide ridges are grown on GaN on an AFM by applying positive sample bias at 80% humidity, with the oxidation reaction expedited by UV light. The oxide ridges are then etched by HCl solution, leaving troughs in the GaN surface. A dripping strategy for the in-situ chemical etching is recommended that allows deep, alignment-free multiple AFM oxidation/etching works on the GaN surface without any need of substrate removal from the AFM platform. Repeated etching followed by AFM oxidation on a spot on a GaN surface resulting in a hole as deep as 800 nm was also demonstrated. Further, a preliminary evaluation of the porosity of the AFM-grown oxide indicates that the oxide ridges grown on GaN at an AFM cantilever moving speed of 300 nm/s are porous in structure, with an estimated porosity of 86%, which porosity could be reduced if longer resident time of the AFM cantilever on the target oxidation region was used.