RESUMEN
A major problem for optical systems is the polarization splitting occurring at any interface in the event of oblique light. Low-index nanostructured silica layers were produced by overcoating an initial organic structure with silica and subsequent removal of the organic constituents. The nanostructured layers can be tailored to achieve defined low effective refractive indices down to 1.05. They can also be stacked together with homogeneous layers to produce broadband antireflective coatings with very low polarization splitting. Especially thin interlayers that separate the low-index structured layers turned out to be useful to optimize the polarization properties.
RESUMEN
To increase the performance of optical systems, a good antireflective coating is required to ensure low reflectance and high transmittance of optical surfaces. Further problems, such as fogging that causes light scattering, negatively affect the image quality. This implies that other functional properties are also required. Presented here is a highly promising combination of an antireflective double nanostructure on top of an antifog coating with long-term stable properties, generated in a commercial plasma-ion-assisted coating chamber. It is demonstrated that the nanostructures do not affect the antifog properties and can be successfully used for many applications.
RESUMEN
Structural, optical, and mechanical properties of Al2O3, SiO2, and HfO2 materials prepared by plasma-enhanced atomic layer deposition (PEALD) were investigated. Residual stress poses significant challenges for optical coatings since it may lead to mechanical failure, but in-depth understanding of these properties is still missing for PEALD coatings. The tensile stress of PEALD alumina films decreases with increasing deposition temperature and is approximately 100 MPa lower than the stress in thermally grown films. It was associated with incorporation of -OH groups in the film as measured by infrared spectroscopy. The tensile stress of hafnia PEALD layers increases with deposition temperature and was related to crystallization of the film. HfO2 nanocrystallites were observed even at 100°C deposition temperature with transmission electron microscopy. Stress in hafnia films can be reduced from approximately 650 MPA to approximately 450 MPa by incorporating ultrathin Al2O3 layers. PEALD silica layers have shown moderate stress values and stress relaxation with the storage time, which was correlated to water adsorption. A complex interference coating system for a dichroic mirror (DCM) at 355 nm wavelength was realized with a total coating thickness of approximately 2 µm. Severe cracking of the DCM coating was observed, and it propagates even into the substrate material, showing a good adhesion of the ALD films. The reflectance peak is above 99.6% despite the mechanical failure, and further optimization on the material properties should be carried out for demanding optical applications.
