N-halamine surface coating for mitigation of biofilm and microbial contamination in water systems for space travel.

A copolymer termed HASL produced from monomeric units of 2-acrylamido-2-methyl-1-(5-methylhydantoinyl)propane (HA) and of 3-(trimethoxysilyl)propyl methacrylate (SL) has been coated onto stainless steel and Inconel™ substrates, which upon halogenation with either aqueous oxidative chlorine or bromine, became antimicrobial. It has been demonstrated that the halogenated stainless steel and Inconel™ substrates were effective in producing 6 to 7 log inactivations of Staphylococcus aureus and Escherichia coli O157:H7 within about 10 min, and in prevention of Pseudomonas aeruginosa biofilm formation over a period of at least 72 h on the stainless steel substrates. Upon loss of halogen, the HASL coating could be re-charged with aqueous halogen. The HASL coating was easily applied to the substrates via a simple dip-coating method and was reasonably stable to contact with water. Both chlorinated substrates could be loaded with at least 6 × 1016 oxidative Cl atoms per cm2 and maintained a loading of greater than 1 × 1016 chlorine atoms per cm2 for a period of 3-7 days while agitated in aqueous solution. After loss of chlorine to a level below 1 × 1016 atoms per cm2, the substrates could be recharged to the 6 × 1016 Cl atoms per cm2 level for at least 5 times over a 28 day period. The new antimicrobial coating technology has potential for use in a variety of important applications, particularly for water treatment and storage on spacecraft.

Polymer-initiated photogeneration of silver nanoparticles in SPEEK/PVA films: direct metal photopatterning.

Cross-linking of sulfonated poly(ether-ether)ketone-poly(vinyl alcohol) (SPEEK-PVA) materials yields flexible polymer films, possessing high light-sensitivity and ion-exchange capabilities. Adsorbed Ag+ ions are photoreduced in the film under illumination (lambda = 350 nm), leading to metal nanoparticle formation in places where the film has been exposed to the light. Nanoparticles form via reduction of Ag+ by the polymeric alcohol radicals, generated in the system as a result of photochemical H-abstraction from PVA molecules by the excited carbonyl triplet state of SPEEK. Use of the films for direct metal photopatterning is demonstrated.