RESUMEN
Transition metal dichalcogenides (TMDs) are actively studied in various fields of optics and optoelectronics, including nonlinear optics of second-harmonic generation (SHG). By stacking two different TMD materials to form a heterobilyaer, unique optical properties emerge, with stronger SHG at a twist angle of 0° between TMDs and weaker SHG at a twist angle of 60°. In this work, we demonstrate the enhancement of SHG in a heterobilayer consisting of WSe2and WS2monolayers stacked at a twist angle of 64.1°, using a nanoparticle to induce local strain. The interatomic spacing of the heterobilayer is deformed by the nanoparticle, breaking the inversion symmetry, resulting in a substantial increase in the SHG of the heterobilayer at room temperature. The SHG increases depending on the polarization of the pump laser: 15-fold for linear polarization, 9-fold for right-circular polarization, and up to 100-fold for left-circular polarization. In addition, the SHG enhanced in the heterobilayer with local strain satisfies the same chiral selection rule as in the unstrained TMD region, demonstrating that the chiral selection rule of SHG is insensitive to local strain. Our findings will increase the applicability of TMD heterobilayers in nonlinear optoelectronics and valleytronics.
RESUMEN
We fabricated a 1 × 10 PbS QD photodiode array with multiple stacked QD layers with high-resolution patterning using a customized photolithographic process. The array showed the average responsivity of 5.54 × 10-3 A/W and 1.20 × 10-2 A/W at 0 V and -1 V under 1310- nm short-wavelength infrared (SWIR) illumination. The standard deviation of the pixel responsivity was under 10%, confirming the uniformity of the fabrication process. The response time was 2.2 ± 0.13 ms, and the bandwidth was 159.1 Hz. A prototype 1310-nm SWIR imager demonstrated that the QD photodiode-based SWIR image sensor is a cost-effective and practical alternative for III-V SWIR image sensors.
RESUMEN
Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10th of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions.
RESUMEN
Subwavelength-scale metal and dielectric nanostructures have served as important building blocks for electromagnetic metamaterials, providing unprecedented opportunities for manipulating the optical response of the matter. Recently, hyperbolic metamaterials have been drawing particular interest because of their unusual optical properties and functionalities, such as negative refraction and hyperlensing of light. Here, as a promising application of a hyperbolic metamaterial at visible frequency, we propose an invisible nanotube that consists of metal and dielectric alternating thin layers. The theoretical study of the light scattering of the layered nanotube reveals that almost-zero scattering can be achieved at a specific wavelength when the transverse-electric- or transverse-magnetic-polarized light is incident to the nanotube. In addition, the layered nanotube can be described as a radial-anisotropic hyperbolic metamaterial nanotube. The low scattering occurs when the effective permittivity of the hyperbolic nanotube in the angular direction is near zero, and thus the invisibility of the layered nanotube can be efficiently obtained by analyzing the equivalent hyperbolic nanotube. Our new method to design and tune an invisible nanostructure represents a significant step toward the practical implementation of unique nanophotonic devices such as invisible photodetectors and low-scattering near-field optical microscopes.
