Determining the Electron Scattering from Interfacial Coulomb Scatterers in Two-Dimensional Transistors.

Two-dimensional (2D) transistors are promising for potential applications in next-generation semiconductor chips. Owing to the atomically thin thickness of 2D materials, the carrier scattering from interfacial Coulomb scatterers greatly suppresses the carrier mobility and hampers transistor performance. However, a feasible method to quantitatively determine relevant Coulomb scattering parameters from interfacial long-range scatterers is largely lacking. Here, we demonstrate a method to determine the Coulomb scattering strength and the density of Coulomb scattering centers in InSe transistors by comprehensively analyzing the low-frequency noise and transport characteristics. Moreover, the relative contributions from long-range and short-range scattering in the InSe transistors can be distinguished. This method is employed to make InSe transistors consisting of various interfaces a model system, revealing the profound effects of different scattering sources on transport characteristics and low-frequency noise. Quantitatively accessing the scattering parameters of 2D transistors provides valuable insight into engineering the interfaces of a wide spectrum of ultrathin-body transistors for high-performance electronics.

Tuning interfacial two-component superconductivity in CoSi2/TiSi2 heterojunctions via TiSi2 diffusivity.

We report the observation of enhanced interfacial two-component superconductivity possessing a dominant triplet component in nonmagnetic CoSi2/TiSi2 superconductor/normal-metal planar heterojunctions. This is accomplished through the detection of odd-frequency spin-triplet even-parity Cooper pairs in the diffusive normal-metal component of T-shaped proximity junctions. We show that by modifying the diffusivity of the normal-metal part, the transition temperature enhancement can be tuned by a factor of up to 2.3 while the upper critical field increases by up to a factor of 20. Our data suggest that the C49 phase of TiSi2, which is stabilized in confined geometries, underlies this enhancement. These findings are addressed via a Ginzburg-Landau model and the quasi-classical theory. We also relate our findings to the enigmatic 3-K phase reported in Sr2 RuO4.

Low-defect-density WS2 by hydroxide vapor phase deposition.

Two-dimensional (2D) semiconducting monolayers such as transition metal dichalcogenides (TMDs) are promising channel materials to extend Moore's Law in advanced electronics. Synthetic TMD layers from chemical vapor deposition (CVD) are scalable for fabrication but notorious for their high defect densities. Therefore, innovative endeavors on growth reaction to enhance their quality are urgently needed. Here, we report that the hydroxide W species, an extremely pure vapor phase metal precursor form, is very efficient for sulfurization, leading to about one order of magnitude lower defect density compared to those from conventional CVD methods. The field-effect transistor (FET) devices based on the proposed growth reach a peak electron mobility ~200 cm2/Vs (~800 cm2/Vs) at room temperature (15 K), comparable to those from exfoliated flakes. The FET device with a channel length of 100 nm displays a high on-state current of ~400 µA/µm, encouraging the industrialization of 2D materials.

Observation of triplet superconductivity in CoSi2/TiSi2 heterostructures.

Unconventional superconductivity and, in particular, triplet superconductivity have been front and center of topological materials and quantum technology research. Here, we report our observation of triplet pairing in nonmagnetic CoSi2/TiSi2 heterostructures on silicon. CoSi2 undergoes a sharp superconducting transition at a critical temperature T c ≃ 1.5 K, while TiSi2 is a normal metal. We investigate conductance spectra of both two-terminal CoSi2/TiSi2 contact junctions and three-terminal T-shaped CoSi2/TiSi2 superconducting proximity structures. Below T c, we observe (i) a narrow zero-bias conductance peak on top of a broad hump, accompanied by two symmetric side dips in the contact junctions, (ii) a narrow zero-bias conductance peak in T-shaped structures, and (iii) hysteresis in the junction magnetoresistance. These three independent and complementary observations point to chiral p-wave pairing in CoSi2/TiSi2 heterostructures. The excellent fabrication compatibility of CoSi2 and TiSi2 with present-day silicon-based integrated-circuit technology suggests their potential use in scalable quantum-computing devices.

Ultralow 1/f Noise in a Heterostructure of Superconducting Epitaxial Cobalt Disilicide Thin Film on Silicon.

High-precision resistance noise measurements indicate that the epitaxial CoSi2/Si heterostructures at 150 and 2 K (slightly above its superconducting transition temperature Tc of 1.54 K) exhibit an unusually low 1/f noise level in the frequency range of 0.008-0.2 Hz. This corresponds to an upper limit of Hooge constant γ ≤ 3 × 10-6, about 100 times lower than that of single-crystalline aluminum films on SiO2 capped Si substrates. Supported by high-resolution cross-sectional transmission electron microscopy studies, our analysis reveals that the 1/f noise is dominated by excess interfacial Si atoms and their dimer reconstruction induced fluctuators. Unbonded orbitals (i.e., dangling bonds) on excess Si atoms are intrinsically rare at the epitaxial CoSi2/Si(100) interface, giving limited trapping-detrapping centers for localized charges. With its excellent normal-state properties, CoSi2 has been used in silicon-based integrated circuits for decades. The intrinsically low noise properties discovered in this work could be utilized for developing quiet qubits and scalable superconducting circuits for future quantum computing.

Quantum-interference transport through surface layers of indium-doped ZnO nanowires.

We have fabricated indium-doped ZnO (IZO) nanowires (NWs) and carried out four-probe electrical-transport measurements on two individual NWs with geometric diameters of ≈70 and ≈90 nm in a wide temperature T interval of 1-70 K. The NWs reveal overall charge conduction behavior characteristic of disordered metals. In addition to the T dependence of resistance R, we have measured the magnetoresistance (MR) in magnetic fields applied either perpendicular or parallel to the NW axis. Our R(T) and MR data in different T intervals are consistent with the theoretical predictions of the one- (1D), two- (2D) or three-dimensional (3D) weak-localization (WL) and the electron-electron interaction (EEI) effects. In particular, a few dimensionality crossovers in the two effects are observed. These crossover phenomena are consistent with the model of a 'core-shell-like structure' in individual IZO NWs, where an outer shell of thickness t (~15-17 nm) is responsible for the quantum-interference transport. In the WL effect, as the electron dephasing length Lφ gradually decreases with increasing T from the lowest measurement temperatures, a 1D-to-2D dimensionality crossover takes place around a characteristic temperature where Lφ approximately equals d, an effective NW diameter which is slightly smaller than the geometric diameter. As T further increases, a 2D-to-3D dimensionality crossover occurs around another characteristic temperature where Lφ approximately equals t (

Electrical conduction mechanisms in natively doped ZnO nanowires (II).

We have measured the intrinsic electrical resistivities, rho(T), of three individual single-crystalline ZnO nanowires (NWs) from 320 down to 1.3 K. The NWs were synthesized via carbon thermal chemical vapor deposition and the four-probe Pt contacting electrodes were made by the focused-ion-beam technique. Analysis of the overall temperature behavior of rho(T) confirms that the charge transport processes in natively doped ZnO NWs are due to a combination of the thermal activation conduction and the nearest-neighbor hopping conduction processes, as proposed and explained in a recent work (Chiu et al 2009 Nanotechnology 20 015203) where the ZnO NWs were grown by a different thermal evaporation method and the four-probe electrodes were made by the electron-beam lithography technique. Taken together, the observations of these two complementary studies firmly establish that the electrical conduction mechanisms in natively doped ZnO NWs are unique and now satisfactorily understood.

Electrical conduction mechanisms in natively doped ZnO nanowires.

Single-crystalline zinc oxide (ZnO) nanowires (NWs) with diameters of 90-200 nm were synthesized by the thermal evaporation method. Four-probe Ti/Au electrodes were made by the standard electron-beam lithography technique, and the intrinsic resistivities, rho(T), of individual NWs were measured over a wide range of temperature from 300 down to 0.25 K. The temperature behavior of rho(T) between 300 and 5 K reveals that the intrinsic electrical-transport mechanisms through individual ZnO NWs are due to a combination of the thermal activation conduction and the nearest-neighbor hopping conduction processes. Three distinct activation and hopping contributions with discrete characteristic activation energies are observed. Above about 100 K, the charge transport mechanism is dominated by the thermal activation of electrons from the Fermi level, mu, to the conduction band. Between approximately 20 and 100 K, the charge transport mechanism is due to the activation of electrons from mu to the upper impurity (D-) band. Between approximately 5 and 20 K, the charge transport mechanism arises from the nearest-neighbor hopping conduction within the lower impurity (D) band. Such unique electrical conduction behaviors can be explained in terms of the intricate material properties (in particular, the presence of moderately high concentrations of n-type defects accompanied with a slight self-compensation) in natively doped ZnO NWs. In one heavily doped NW, a surface-related conduction process manifesting the two-dimensional attributes of quantum-interference transport phenomena is observed. The carrier concentrations in our NWs have been estimated, and they were found to lie close to the critical concentration for the Mott metal-insulator transition.

Four-probe electrical-transport measurements on single indium tin oxide nanowires between 1.5 and 300 K.

Single-crystalline indium tin oxide (ITO) nanowires (NWs) were grown by the standard thermal evaporation method. The as-grown NWs were typically 100-300 nm in diameter and a few microm long. Four-probe submicron Ti/Au electrodes on individual NWs were fabricated by the electron-beam lithography technique. The resistivities of several single NWs have been measured from 300 down to 1.5 K. The results indicate that the as-grown ITO NWs are metallic, but disordered. The overall temperature behavior of resistivity can be described by the Bloch-Grüneisen law plus a low-temperature correction due to the scattering of electrons off dynamic point defects. This observation suggests the existence of numerous dynamic point defects in as-grown ITO NWs.

Thermal fluctuation-induced tunneling conduction through metal nanowire contacts.

The temperature behavior of how electrons propagate through an insulating electronic contact formed at the interface between a submicron Cr/Au electrode and a metallic RuO(2) nanowire (NW) has been studied between 300 and 1 K. The NWs are typically of ∼70 nm in diameter and a few microns long. The submicron electrodes were fabricated by the standard electron-beam lithography technique. By employing the two-probe method, the electronic contact resistances, R(c)(T), have been determined. We found that, in general, R(c) increases rapidly with decreasing temperature but eventually saturates at liquid-helium temperatures. Such a temperature behavior can be well described by a thermal fluctuation-induced tunneling (FIT) conduction process which considers the crossover feature from thermal activation conduction at high temperatures to simple elastic tunneling conduction at low temperatures. The wide applicability of this FIT model has further been established by employing metallic IrO(2) and Sn-doped In(2)O(3-x) NWs. This work demonstrates that the underlying physics for the charge transport properties of an insulating electronic contact can be well understood.