RESUMEN
There has been significant research focused on the development of stretchable materials that can provide a large area with minimal material usage for use in solar cells and displays. However, most materials exhibit perpendicular shrinkage when stretched, which is particularly problematic for polymer-based substrates commonly used in stretchable devices. To address this issue, biaxial strain-controlled substrates have been proposed as a solution to increase device efficiency and conserve material resources. In this study, we present the design and fabrication of a biaxial strain-controlled substrate with a re-entrant honeycomb structure and a negative Poisson's ratio. Using a precisely machined mold with a shape error of less than 0.15%, we successfully fabricated polydimethylsiloxane substrates with a 500 µm thick re-entrant honeycomb structure, resulting in a 19.1% reduction in perpendicular shrinkage. This improvement translates to a potential increase in device efficiency by 9.44% and an 8.60% reduction in material usage for substrate fabrication. We demonstrate that this design and manufacturing method can be applied to the fabrication of efficient stretchable devices, such as solar cells and displays.
RESUMEN
The manufacturing process for an ultrawide flexible microwave absorbing meta-surface was developed and optimized experimentally. The developed replication process consists of four main steps to demonstrate double-square loop array meta-structures: (1) mechanical machining of a master mold, (2) soft mold replication and patterned film imprinting, (3) conductive ink blade filling, (4) lamination of a base flexible film to meta sheet. Based on experimental optimization of the individual steps, the manufacturing process for a large-area flexible meta-film was established successfully. The feasibility of a developed process has been demonstrated with a 200 mm × 500 mm fabricated meta-film with a focus on microwave absorbing uniformity in the X-band region.
RESUMEN
In ultra-precision planing process, the analysis of the critical depth of cut (DOC) is required to reduce the edge blunt and micro burrs produced by size effect which decreases of the effective area for high luminance retroreflector. However, since the machining characteristics are different according to cutting tool shape, machining material, and cutting condition, determine of the critical DOC is difficult without a comparison of machined surfaces under various DOC measured by ultra-high resolution measuring instrument. In this study, the critical DOC was analyzed using cutting force and tool vibration signals. The specific cutting energy was calculated by cutting force and cross-sectional area to analyze the stress variation according to DOC. Also, acceleration signals were converted to frequency spectrum that analyze dominant vibrating direction of the cutting tool by variation of cutting characteristic. It was confirmed that the method of using tool vibration more effective and accurate than specific cutting energy through validation of the comparison between results from analyze of the vibration signals and direction measuring surfaces. The master mold with area of 250 mm2 was manufactured by applying analyzed critical DOC. In addition, the high luminance characteristic of a retroreflection film press formed by the master mold was confirmed.
RESUMEN
Microwave absorbers using conductive ink are generally fabricated by printing an array pattern on a substrate to generate electromagnetic fields. However, screen printing processes are difficult to vary the sheet resistance values for different regions of the pattern on the same layer, because the printing process deposits materials at the same height over the entire surface of substrate. In this study, a promising manufacturing process was suggested for engraved resistive double square loop arrays with ultra-wide bandwidth microwave. The developed manufacturing process consists of a micro-end-milling, inking, and planing processes. A 144-number of double square loop array was precisely machined on a polymethyl methacrylate workpiece with the micro-end-milling process. After engraving array structures, the machined surface was completely covered with the developed conductive carbon ink with a sheet resistance of 15 Ω/sq. It was cured at room temperature. Excluding the ink that filled the machined double square loop array, overflowed ink was removed with the planing process to achieve full filled and isolated resistive array patterns. The fabricated microwave absorber showed a small radar cross-section with reflectance less than - 10 dB in the frequency band range of 8.0-14.6 GHz.
RESUMEN
The properties of Al-doped SnOx films deposited via reactive co-sputtering were examined in terms of their potential applications for the fabrication of transparent and flexible electronic devices. Al 2.2-atom %-doped SnOx thin-film transistors (TFTs) exhibit improved semiconductor characteristics compared to non-doped films, with a lower sub-threshold swing of ~0.68 Vdec-1, increased on/off current ratio of ~8 × 107, threshold voltage (Vth) near 0 V, and markedly reduced (by 81%) Vth instability in air, attributable to the decrease in oxygen vacancy defects induced by the strong oxidizing potential of Al. Al-doped SnOx films maintain amorphous crystallinity, an optical transmittance of ~97%, and an adhesive strength (to a plastic substrate) of over 0.7 kgf/mm; such films are thus promising semiconductor candidates for fabrication of transparent flexible TFTs.
RESUMEN
Since the ancient Egyptians had used sand as filter media for water purification, its principle has been inherited through generations and it is still being used now in industries. The sand filter consists of sand literally, and the voids within the sand bed are the pores for filtration. Here we present a filtration principle using nanoparticles, so that the voids between the nanoparticles can be considered as effective pores in nanoscale dimension. Anodic aluminum oxide (AAO) membrane has been used as the working template, and the nanoparticles have been injected and embedded within the pores of the AAO template. Nanoparticles with multiple sizes have been used in order to obtain smaller voids. Moreover, the nanoparticles have been functionalized, or electrically charged, with arginine/phenylalanine (RF) peptide group. In this way, filtration performance for charged particles or molecules, such as methylene blue, has been enhanced. Consequently, this study is expected to provide a new principle for fabrication of nano voids, or nano pores, and for filtration in nanoscale dimension.
RESUMEN
A transmission-type structure based on woodpile photonic crystal layers is proposed for use in color filters. Selective bandpass filters for red, green, and blue wavelength bands are constructed using optimally designed multilayered woodpile photonic crystals. The R/G/B color filtering for a wide range of incidence angles of light is demonstrated numerically, and the operation principle and design method are described.
Asunto(s)
Color , Colorimetría/instrumentación , Filtración/instrumentación , Modelos Teóricos , Refractometría/instrumentación , Resonancia por Plasmón de Superficie/instrumentación , Simulación por Computador , Diseño Asistido por Computadora , Diseño de Equipo , Análisis de Falla de Equipo , Luz , Dispersión de RadiaciónRESUMEN
As the desired feature size of mold-assisted lithography decreases rapidly efficient demolding process becomes more challenging due to strong adhesion between polymeric resists and fine-featured molds. We synthesized new macromolecular additives and investigated the effects of surface energy and contraction of resist materials on demolding propensity by monitoring the adhesion force between the resist and the applied mold. The resist's surface energy was controlled, as inferred from water contact angle measurements, by chemically modifying its hydroxyl functionality. The resist's degree of volume shrinkage during the photocuring procedure was also controlled by mixing in a newly developed chemical that has a multiple radical chain transfer capability. The adhesion force was proportionally reduced as the surface energy of the resist materials decreased and as the volume shrinkage was reduced. When the volume shrinkage control was applied in conjunction with the low surface energy resist material (LS-30UV), we obtained an optimized condition requiring a minimum force for releasing the mold from the cured resist layer.