Selective growth and ordering of SiGe nanowires for band gap engineering.

Selective growth and self-organization of silicon-germanium (SiGe) nanowires (NWs) on focused ion beam (FIB) patterned Si(111) substrates is reported. In its first step, the process involves the selective synthesis of Au catalysts in SiO2-free areas; its second step involves the preferential nucleation and growth of SiGe NWs on the catalysts. The selective synthesis process is based on a simple, room-temperature reduction of gold salts (Au³âºCl4⁻) in aqueous solution, which provides well-organized Au catalysts. By optimizing the reduction process, we are able to generate a bidimensional regular array of Au catalysts with self-limited sizes positioned in SiO2-free windows opened in a SiO2/Si(111) substrate by FIB patterning. Such Au catalysts subsequently serve as preferential nucleation and growth sites of well-organized NWs. Furthermore, these NWs with tunable position and size exhibit the relevant features and bright luminescence that would find several applications in optoelectronic nanodevices.

On morphology and strain field of Ge/Si(001) Islands according to TEM phase imaging method.

The mechanism driving Germanium islands nucleation and self-assembly is an important effect for opto-electronic applications, still not fully understood. We demonstrate that the new transmission electron microscopy phase imaging method provides insights on the distribution of strain and composition fields in and around the islands on rather large areas. The method consists of retrieving the phase from a focus series of plane view images. The phase image is representative of morphology, composition and strain. The results show that whatever the islands size and shape is, a maximum compressive strain is obtained at the apex of the islands compensated by a maximum tensile strain in the substrate close to the islands perimeter. The maximum compressive strain is associated to a larger Ge concentration. The distribution of tensile strain varies with the shape of the islands: for square base pyramidal "hut" islands, a maximum tensile strain is obtained at the four corners of the pyramid base and for "dome" islands, the tensile strain is less pronounced and affects almost the whole island perimeter. These results are consistent with the higher strain relaxation level of "dome" islands in comparison to those of "hut" islands.