RESUMEN
The property of self-imaging combined with the polarization birefringence of the angled multimode waveguide is used to design a silicon nitride (SiN) polarization splitter (PS) at λ â¼ 1550 nm. The demonstrated PS on a 450 nm thick SiN device layer (with 2.5 µm cladding oxide) has a footprint of 80 µm×13 µm and exhibits nearly wavelength independent performance over the C+L bands. Also, the device can be configured as a polarization combiner (PC) in reverse direction with similar bandwidth and performance. The measured crosstalk (CT) and insertion loss (IL) are respectively <-18 dB (<-20 dB) and â¼0.7 dB (â¼0.8 dB) for TE (TM) polarization over the measurement wavelength range of 1525 nm ≤λ ≤ 1625 nm. The measured device parameter variations suggest some tolerance to fabrication variations. Such a device is a good candidate for a photonics integrated chip (PIC) foundry-compatible, SiN PS.
RESUMEN
This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab design devices with complex curves and aggressive critical dimensions. Using parameterized shapes as building blocks, the Nanolithography Toolbox allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro- and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.
RESUMEN
Cavity optomechanical systems are being studied for their potential in areas such as metrology, communications, and quantum information science. For a number of recently proposed applications in which multiple optical and mechanical modes interact, an outstanding challenge is to develop multimode architectures that allow flexibility in the optical and mechanical sub-system designs while maintaining the strong interactions that have been demonstrated in single-mode systems. To that end, we demonstrate slot-mode optomechanical crystals, devices in which photonic and phononic crystal nanobeams separated by a narrow slot are coupled via optomechanical interactions. These nanobeam pairs are patterned to confine a mechanical breathing mode at the center of one beam and a low-loss optical mode in the slot between the beams. This architecture affords great design flexibility towards multimode optomechanics, as well as substantial optomechanical coupling rates. We show this by producing slot-mode devices in stoichiometric Si3N4, with optical modes in the 980 nm band coupled to mechanical modes at 3.4 GHz, 1.8 GHz, and 400 MHz. We exploit the Si3N4 tensile stress to achieve slot widths down to 24 nm, which leads to enhanced optomechanical coupling, sufficient for the observation of optomechanical self-oscillations at all studied frequencies. We then develop multimode optomechanical systems with triple-beam geometries, in which two optical modes couple to a single mechanical mode, and two mechanical modes couple to a single optical mode. Taken together, these results demonstrate great flexibility in the design of multimode chip-scale optomechanical systems with large optomechanical coupling.
