RESUMEN
The Aerosol Deposition (AD, also known as gas kinetic spraying or vacuum deposition) method is a rather novel coating process to produce dense thick films directly from dry ceramic (or metal) powders on a variety of substrates without any heat treatment. Because of the similarity of the up to now used powders and lunar regolith, it is imaginable to use AD systems for future in situ resource utilization missions on the Moon planned by several space agencies. To test the feasibility of such an endeavor, the processability of lunar mare simulant EAC-1 by the AD method has been examined in this study. Three regolith films with an area of 25 × 10 mm², and thicknesses between 2.50 µm and 5.36 µm have been deposited on steel substrates using a standard AD setup. Deposited films have been investigated by Laser Scanning Microscopy (LSM) and Scanning Electron Microscopy (SEM). Moreover, the roughness and Vickers hardness of the deposited films and the underlying substrates have been measured. It has been shown that dense consolidated films of regolith simulant can be produced within minutes by AD. The deposited films show a higher roughness and, on average, a higher hardness than the steel substrates. Since on the Moon, naturally available regolith powders are abundant and very dry, and since the required process vacuum is available, AD appears to be a very promising method for producing dense coatings in future Moon exploration and utilization missions.
RESUMEN
On the basis of a combination of X-ray photoelectron spectroscopy and synchrotron-based X-ray emission spectroscopy, we present a detailed characterization of the chemical structure of CdS:O thin films that can be employed as a substitute for CdS layers in thin-film solar cells. It is possible to analyze the local chemical environment of the probed elements, in particular sulfur, hence allowing insights into the species-specific composition of the films and their surfaces. A detailed quantification of the observed sulfur environments (i.e., sulfide, sulfate, and an intermediate oxide) as a function of oxygen content is presented, allowing a deliberate optimization of CdS:O thin films for their use as alternative buffer layers in thin-film photovoltaic devices.
RESUMEN
Critical prerequisites for solution-processed/printed field-effect transistors (FETs) and logics are excellent electrical performance including high charge carrier mobility, reliability, high environmental stability and low/preferably room temperature processing. Oxide semiconductors can often fulfill all the above criteria, sometimes even with better promise than their organic counterparts, except for their high process temperature requirement. The need for high annealing/curing temperatures renders oxide FETs rather incompatible to inexpensive, flexible substrates, which are commonly used for high-throughput and roll-to-roll additive manufacturing techniques, such as printing. To overcome this serious limitation, here we demonstrate an alternative approach that enables completely room-temperature processing of printed oxide FETs with device mobility as large as 12.5 cm(2)/(V s). The key aspect of the present concept is a chemically controlled curing process of the printed nanoparticle ink that provides surprisingly dense thin films and excellent interparticle electrical contacts. In order to demonstrate the versatility of this approach, both n-type (In2O3) and p-type (Cu2O) oxide semiconductor nanoparticle dispersions are prepared to fabricate, inkjet printed and completely room temperature processed, all-oxide complementary metal oxide semiconductor (CMOS) invertors that can display significant signal gain (â¼18) at a supply voltage of only 1.5 V.