RESUMEN
Here we report a technique for transferring graphene layers, one by one, from a multilayer deposit formed by epitaxial growth on the Si-terminated face of a 6H-SiC substrate. The procedure uses a bilayer film of palladium/polyimide deposited onto the graphene coated SiC, which is then mechanically peeled away and placed on a target substrate. Orthogonal etching of the palladium and polyimide leaves isolated sheets of graphene with sizes of square centimeters. Repeating these steps transfers additional sheets from the same SiC substrate. Raman spectroscopy, scanning tunneling spectroscopy, low-energy electron diffraction and X-ray photoelectron spectroscopy, together with scanning tunneling, atomic force, optical, and scanning electron microscopy reveal key properties of the materials. The sheet resistances determined from measurements of four point probe devices were found to be â¼2 kΩ/square, close to expectation. Graphene crossbar structures fabricated in stacked configurations demonstrate the versatility of the procedures.
RESUMEN
Simple galvanic reactions between highly doped n-type GaAs wafers and a pure aqueous solution of AgNO 3 at room temperature provide an easy and efficient protocol to directly deposit uniform Ag nanoplates with tunable dimensions on the GaAs substrates. The anisotropic growth of the Ag nanoplates in the absence of surfactant molecules might be partially ascribed to the codeposition of oxides of gallium and arsenic, which are revealed by extensive data from electron microscopy, X-ray photoelectron spectroscopy, and Raman spectroscopy, during the growth of the Ag nanoplates. The electron microscopic characterization shows that each Ag nanoplate has a "necked" geometry, that is, it pins on the GaAs lattices through only a tiny neck (with sizes of <10 nm). In addition, the as-grown Ag nanoplates exhibit strong enhancement toward Raman scattering of materials on (or around) their surfaces.
