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1.
Nanotechnology ; 22(21): 215302, 2011 May 27.
Artículo en Inglés | MEDLINE | ID: mdl-21451221

RESUMEN

A versatile tool for electrochemical fabrication of heteronanojunctions with nanocontacts made of a few atoms and nanogaps of molecular spacing is presented. By integrating microfluidic circuitry in a lab-on-chip approach, we keep control of the electrochemical environment in the vicinity of the nanojunction and add new versatility for exchanging and controlling the junction's medium. Nanocontacts made of various materials by successive local controlled depositions are demonstrated, with electrical properties revealing sizes reaching a few atoms only. Investigations on benchmark molecular electronics material, trapped between electrodes, reveal the possibility to create nanogaps of size matching those of molecules. We illustrate the interest of a microfluidic approach by showing that exposure of a fabricated molecular junction to controlled high solvent flows can be used as a reliability criterion for the presence of molecular entities in a gap.


Asunto(s)
Dispositivos Laboratorio en un Chip , Técnicas Analíticas Microfluídicas/instrumentación , Nanoestructuras/química , Nanotecnología/instrumentación , Técnicas Electroquímicas/instrumentación , Diseño de Equipo , Nanoestructuras/ultraestructura
2.
Nanotechnology ; 22(10): 105202, 2011 Mar 11.
Artículo en Inglés | MEDLINE | ID: mdl-21289409

RESUMEN

We report on the temperature dependent conductivity and current-voltage (I-V) properties of novel polyaniline nanowire array devices. Below 60 K, I-V measurements show a transition to non-linear behaviour, leading to the onset at 30 K of a threshold voltage, for potentials below which little current flows. By considering an intrinsic morphology of small conducting regions separated by tunnel junctions, we show that charging of the conducting regions leads to Coulomb blockade effects that can account for this behaviour.

3.
Nanotechnology ; 21(33): 335303, 2010 Aug 20.
Artículo en Inglés | MEDLINE | ID: mdl-20660957

RESUMEN

We present a simple and versatile patterning procedure for the reliable and reproducible fabrication of high aspect ratio (10(4)) electrical interconnects that have separation distances down to 20 nm and lengths of several hundreds of microns. The process uses standard optical lithography techniques and allows parallel processing of many junctions, making it easily scalable and industrially relevant. We demonstrate the suitability of these nanotrenches as electrical interconnects for addressing micro and nanoparticles by realizing several circuits with integrated species. Furthermore, low impedance metal-metal low contacts are shown to be obtained when trapping a single metal-coated microsphere in the gap, emphasizing the intrinsic good electrical conductivity of the interconnects, even though a wet process is used. Highly resistive magnetite-based nanoparticles networks also demonstrate the advantage of the high aspect ratio of the nanotrenches for providing access to electrical properties of highly resistive materials, with leakage current levels below 1 pA.

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