RESUMEN
It is demonstrated that high-resolution energy-dispersive X-ray fluorescence mapping devices based on a micro-focused beam are not restricted to high-speed analyses of element distributions or to the detection of different grains, twins and subgrains in crystalline materials but can also be used for the detection of dislocations in high-quality single crystals. Si single crystals with low dislocation densities were selected as model materials to visualize the position of dis-locations by the spatially resolved measurement of Bragg-peak intensity fluctuations. These originate from the most distorted planes caused by the stress fields of dislocations. The results obtained by this approach are compared with laboratory-based Lang X-ray topographs. The presented methodology yields comparable results and it is of particular interest in the field of crystal growth, where fast chemical and microstructural characterization feedback loops are indispensable for short and efficient development times. The beam divergence was reduced via an aperture management system to facilitate the visualization of dislocations for virtually as-grown, non-polished and non-planar samples with a very pronounced surface profile.
RESUMEN
Gallium phosphide (GaP) is a III-V semiconductor with remarkable optoelectronic properties, and it has almost the same lattice constant as silicon (Si). However, to date, the monolithic and large-scale integration of GaP devices with silicon remains challenging. In this study, we present a nanoheteroepitaxy approach using gas-source molecular-beam epitaxy for selective growth of GaP islands on Si nanotips, which were fabricated using complementary metal-oxide semiconductor (CMOS) technology on a 200 mm n-type Si(001) wafer. Our results show that GaP islands with sizes on the order of hundreds of nanometers can be successfully grown on CMOS-compatible wafers. These islands exhibit a zinc-blende phase and possess optoelectronic properties similar to those of a high-quality epitaxial GaP layer. This result marks a notable advancement in the seamless integration of GaP-based devices with high scalability into Si nanotechnology and integrated optoelectronics.
RESUMEN
GaN nanowires (NWs) grown by molecular beam epitaxy on Ti films sputtered on Al2O3 are studied by X-ray diffraction (XRD) and grazing-incidence small-angle X-ray scattering (GISAXS). XRD, performed both in symmetric Bragg reflection mode and at grazing incidence, reveals Ti, TiN, Ti3O, Ti3Al and Ga2O3 crystallites with in-plane and out-of-plane lattice parameters intermediate between those of Al2O3 and GaN. These topotaxial crystallites in the Ti film, formed as a result of interfacial reactions and N exposure, possess little misorientation with respect to Al2O3. As a result, GaN NWs grow on the top TiN layer, possessing a high degree of epitaxial orientation with respect to the substrate. The measured GISAXS intensity distributions are modelled by the Monte Carlo method, taking into account the orientational distributions of NWs, the variety of their cross-sectional shapes and sizes, and the roughness of their side facets. The cross-sectional size distributions of the NWs and the relative fractions of the {1100} and {1120} side facets are determined.
RESUMEN
Dispersion analysis is applicable to arbitrarily cut monoclinic crystals of unknown orientation in order to find the symmetry axis. By this it is possible to differentiate between the transition moments oriented parallel and normal to the b-axis and to determine the dielectric tensor functions of those two principal directions. Dispersion analysis of arbitrarily cut monoclinic crystals is based on an extension of the evaluation scheme developed for arbitrarily cut orthorhombic crystals. We present dispersion analysis of monoclinic crystals exemplarily on spodumene (LiAl(SiO3)2) and yttrium orthosilicate (Y2SiO5).
RESUMEN
Scanning X-ray nanodiffraction on a highly periodic ferroelectric domain pattern of a strained K0.75Na0.25NbO3 epitaxial layer has been performed by using a focused X-ray beam of about 100â nm probe size. A 90°-rotated domain variant which is aligned along [1[Formula: see text]2]TSO has been found in addition to the predominant domain variant where the domains are aligned along the [[Formula: see text]12]TSO direction of the underlying (110) TbScO3 (TSO) orthorhombic substrate. Owing to the larger elastic strain energy density, the 90°-rotated domains appear with significantly reduced probability. Furthermore, the 90°-rotated variant shows a larger vertical lattice spacing than the 0°-rotated domain variant. Calculations based on linear elasticity theory substantiate that this difference is caused by the elastic anisotropy of the K0.75Na0.25NbO3 epitaxial layer.
RESUMEN
We developed a measurement and evaluation scheme to perform dispersion analysis on arbitrarily cut orthorhombic crystals based on the schemes developed for triclinic and uniaxial crystals. As byproduct of dispersion analysis the orientations of the crystal axes are found. In contrast to the spectra of arbitrarily cut uniaxial crystals, where the fit routine has to separate two independent principal spectra, the spectra of arbitrarily cut orthorhombic crystals are a combination of three independent spectra and the evaluation scheme gets more complex. Dispersion analysis is exemplary performed on two different crystals, which show different spectral features and different levels of difficulties to evaluate. Neodymium gallate (NdGaO3) has broad overlapping reflections bands while topaz (Al2SiO4 [F, OH]2) has a quite high total number of infrared active bands.
RESUMEN
The lattice parameters of three perovskite-related oxides have been measured with high precision at room temperature. An accuracy of the order of 10(-5) has been achieved by applying a sophisticated high-resolution X-ray diffraction technique which is based on the modified Bond method. The results on cubic SrTiO(3) [a = 3.905268 (98) Å], orthorhombic DyScO(3) [a = 5.442417 (54), b = 5.719357 (52) and c = 7.904326 (98) Å], and orthorhombic NdGaO(3) [a = 5.428410 (54), b = 5.498407 (55) and c = 7.708878 (95) Å] are discussed in view of possible systematic errors as well as non-stoichiometry in the crystals.
